Epitaxial layers of the ionic zinc blende compound CuCl are grown on the (110) surface of GaP. The growth is performed by congruent evaporation from a single CuCl source. Surface and interface properties of CuCl/GaP are studied with Auger electron spectroscopy, ultraviolet and x‐ray photoemission spectroscopy, electron energy‐loss spectroscopy, and low‐energy electron diffraction. The interface formed at 100 °C is abrupt, but undergoes a massive chemical reaction which leads to the formation of a copper phosphide layer at high temperature (≥300 °C). The valence band discontinuity is 0.85 eV ±0.15 at the abrupt CuCl/GaP interface. The CuCl(110) surface is atomically ordered and exhibits a (1×1) unit cell. Its atomic geometry is determined by multiple scattering analysis of low‐energy electron diffraction intensities. The surface is found to be relaxed in a way which is entirely compatible with the ‘‘universal’’ structure of cleavage surfaces of tetrahedrally coordinated III–V and II–VI compound semiconductors.
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July 1992
38th National Symposium of the American Vacuum Society
11−15 Nov 1991
Seattle, Washington (USA)
Research Article|
July 01 1992
Epitaxial growth and characterization of CuCl(110)/GaP(110)
W. Chen;
W. Chen
Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544
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M. Dumas;
M. Dumas
Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544
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S. Ahsan;
S. Ahsan
Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544
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A. Kahn;
A. Kahn
Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544
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C. B. Duke;
C. B. Duke
Xerox Webster Research Center, 800 Phillips Road, 0114‐38D, Webster, New York 14580
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A. Paton
A. Paton
Xerox Webster Research Center, 800 Phillips Road, 0114‐38D, Webster, New York 14580
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W. Chen
M. Dumas
S. Ahsan
A. Kahn
C. B. Duke
A. Paton
Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544
J. Vac. Sci. Technol. A 10, 2071–2076 (1992)
Article history
Received:
October 28 1991
Accepted:
December 30 1991
Citation
W. Chen, M. Dumas, S. Ahsan, A. Kahn, C. B. Duke, A. Paton; Epitaxial growth and characterization of CuCl(110)/GaP(110). J. Vac. Sci. Technol. A 1 July 1992; 10 (4): 2071–2076. https://doi.org/10.1116/1.578027
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