Summary Abstract: Trench isolation technology: Processing and implementation

Wenocur, D. W.; Chiang, S. Y.; Rung, R. D.; Cham, K. M.

doi:10.1116/1.571988

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Dissertation| April 01 1983

Summary Abstract: Trench isolation technology: Processing and implementation

D. W. Wenocur;

D. W. Wenocur

Hewlett–Packard Laboratories, Palo Alto, California 94304

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S. Y. Chiang;

S. Y. Chiang

Hewlett–Packard Laboratories, Palo Alto, California 94304

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R. D. Rung;

R. D. Rung

Hewlett–Packard Laboratories, Palo Alto, California 94304

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K. M. Cham

Hewlett–Packard Laboratories, Palo Alto, California 94304

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J. Vac. Sci. Technol. A 1, 719–720 (1983)

https://doi.org/10.1116/1.571988

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