Summary Abstract: Surface‐etching kinetics of hydrogen plasma on III‐V compound semiconductors

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Dissertation| April 01 1983

C. W. Tu;

C. W. Tu

Bell Laboratories, Murray Hill, New Jersey 07974

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R. P. H. Chang;

R. P. H. Chang

Bell Laboratories, Murray Hill, New Jersey 07974

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A. R. Schlier

Bell Laboratories, Murray Hill, New Jersey 07974

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J. Vac. Sci. Technol. A 1, 637–638 (1983)

https://doi.org/10.1116/1.572197

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