Characterization of individual junctions within a multilayered semiconductor structure is beneficial to understanding overall performance. Ion beam milling with masks to profile selected areas, followed by metallization, is used to make internal contacts to multilayered photovoltaic structures. Junctions deep within the structure may be analyzed using a straightforward model tested previously on the nSi/SnO2/CdSe/electrolyte tandem solar cell. Internal contacts are made to the CdS/CuInSe2/Mo thin film solar cell. In this type of cell, an undesirable Schottky barrier may occur at the CuInSe2/Mo interface; its effects should be separated from those of the primary CdS/CuInSe2 barrier. In addition to specific results, problems and limitations of the technique are discussed.
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April 1983
Research Article|
April 01 1983
Internal contacts to photovoltaic structures using ion beam milling
R. R. Potter;
R. R. Potter
Department of Physics, Colorado State University, Fort Collins, Colorado 80523
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J. R. Sites
J. R. Sites
Department of Physics, Colorado State University, Fort Collins, Colorado 80523
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J. Vac. Sci. Technol. A 1, 331–333 (1983)
Article history
Received:
September 20 1982
Accepted:
October 06 1982
Citation
R. R. Potter, J. R. Sites; Internal contacts to photovoltaic structures using ion beam milling. J. Vac. Sci. Technol. A 1 April 1983; 1 (2): 331–333. https://doi.org/10.1116/1.572126
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