Journal of Vacuum Science & Technology A

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Current Issue

Volume 42,

Issue 5,

September 2024

Focus and Coverage

Journal of Vacuum Science & Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science and thin film materials science.

Editor-in-Chief

Eray Aydil

Editors

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Featured Articles

Research Article

| September 04 2024

OrbiSIMS depth profiling of semiconductor materials—Useful yield and depth resolution

Yundong Zhou, Alexis Franquet et al.

OrbiSIMS is a secondary ion mass spectrometry method with dual mass analyzers: a time-of-flight (ToF) mass spectrometer for high-speed imaging and an Orbitrap^™ for high mass resolving power and mass ...

Research Article

| July 24 2024

Immersion ellipsometry for the uncorrelated determination of ultrathin film thickness and index of refraction: Theory and examples

Samira Jafari, Blaine Johs et al.

Immersion ellipsometry can break the well-known correlation between optical constants and thicknesses of ultrathin (<5–10 nm) films, allowing both to be determined. In immersion ellipsometry, ...

Review Article

| July 23 2024

Review of actinide core-level photoemission

Alaina Thompson, William Limestall et al.

Photoelectron spectroscopy allows for the investigation of the electronic structure and chemical bonding of actinide elements and their compounds, providing insights into oxidation states, chemical ...

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Editor's Picks

Research Article

| September 06 2024

In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using in situ spectroscopic ellipsometry

Yousra Traouli, Ufuk Kilic et al.

We investigate the time evolution of ZnO thin film growth in oxygen plasma-enhanced atomic layer deposition using in situ spectroscopic ellipsometry. The recently proposed dynamic-dual-box-model ...

Research Article

| September 04 2024

Atomic layer etching of SiO₂ using sequential exposures of Al(CH₃)₃ and H₂/SF₆ plasma

David S. Catherall, Azmain A. Hossain et al.

On-chip photonic devices based on SiO 2 are of interest for applications such as microresonator gyroscopes and microwave sources. Although SiO 2 microdisk resonators ...

Research Article

| August 21 2024

Tuning microstructural and oxidative characteristics of direct current- and high-power pulsed magnetron sputtered MoSi₂-based thin films

Sophie Richter, Ahmed Bahr et al.

A comparative study on nonreactively direct current magnetron sputtered (DCMS) and high-power pulsed magnetron sputtered (HPPMS) MoSi₂-based coatings has been implemented with the objective of ...

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Most Recent

Research Article

| September 09 2024

Examination of nonideal film growth in batch atomic layer deposition for plasma-resistant coatings

Lanxin Guo, Yixian Wang et al.

Atomic layer deposition (ALD) can be used to fabricate protective coatings including moisture barrier layers for organic light emitting diodes, anticorrosion layers for photoelectrodes, and ...

Research Article

| September 06 2024

3D hybrid simulation of postarc sheath expansion with nonuniform residual plasmas

Zhenxing Wang, Rui Li et al.

To optimize the performance of vacuum circuit breakers, it is critical to gain a comprehensive understanding of the intricate physical processes that occur during vacuum interruptions. One of these ...

Research Article

| September 06 2024

In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using in situ spectroscopic ellipsometry

Yousra Traouli, Ufuk Kilic et al.

We investigate the time evolution of ZnO thin film growth in oxygen plasma-enhanced atomic layer deposition using in situ spectroscopic ellipsometry. The recently proposed dynamic-dual-box-model ...

View All Most Recent Articles