Journal of Vacuum Science & Technology A

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Current Issue

Volume 41,

Issue 5,

September 2023

Focus and Coverage

Journal of Vacuum Science & Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science and thin film materials science.

Editor-in-Chief

Eray Aydil

Editors

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Featured Articles

Research Article

| August 25 2023

Work function measurement by ultraviolet photoelectron spectroscopy: Versailles project on advanced materials and standards interlaboratory study

Jeong Won Kim, Ansoon Kim et al.

We present the results of an interlaboratory study on work function (WF) measurements by ultraviolet photoelectron spectroscopy (UPS) conducted under the auspices of the Versailles Project on ...

Research Article

| August 18 2023

Development of a process for flame retardant coating of textiles with bio-hybrid anchor peptides

Rahel Heesemann, Isa Bettermann et al.

The fire protection of materials has an important role in our everyday life and covers a highly diverse spectrum of substances, materials, and fields of application. Important fields of application ...

Research Article

| August 16 2023

VAMAS TWA2 interlaboratory comparison: Surface analysis of TiO₂ nanoparticles using ToF-SIMS

Francesca Bennet, Robert Opitz et al.

Due to the extremely high specific surface area of nanoparticles and corresponding potential for adsorption, the results of surface analysis can be highly dependent on the history of the particles, ...

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Editor's Picks

Research Article

| September 26 2023

Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF₆/H₂ plasma

Azmain A. Hossain, Haozhe Wang et al.

Microwave loss in superconducting TiN films is attributed to two-level systems in various interfaces arising in part from oxidation and microfabrication-induced damage. Atomic layer etching (ALE) is ...

Research Article

| September 12 2023

Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H₂/N₂/Ar plasma

Wangu Kang, Ji Sang Ahn et al.

Molybdenum carbide (MoC) and molybdenum carbonitride (MoCN) films were successfully deposited by plasma-enhanced atomic layer deposition (PEALD) using bis(isopropylcyclopentadienyl)molybdenum(IV) ...

Research Article

| September 07 2023

Application of machine learning to spectrum and image data

Satoka Aoyagi

Machine learning is a useful tool when extracting hidden information from complex measurement data obtained via surface analysis, as in secondary ion mass spectrometry. Flexible learning methods ...

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Most Recent

Research Article

| September 26 2023

Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge

J. Zgheib, L. Berthelot et al.

A high-power impulse magnetron sputtering (HiPIMS) power supply, called e-HiPIMS, has been developed and used to deposit chromium thin films within an argon discharge. This power supply comprises ...

Research Article

| September 26 2023

Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF₆/H₂ plasma

Azmain A. Hossain, Haozhe Wang et al.

Research Article

| September 22 2023

β-Ga₂O₃ orientation dependence of band offsets with SiO₂ and Al₂O₃

Hsiao-Hsuan Wan, Jian-Sian Li et al.

Two of the most common dielectrics for β-Ga₂O₃ are SiO₂ and Al₂O₃ because of their large bandgaps, versatility of preparation, and thermal stability. However, because of the anisotropic properties of ...

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