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Current Issue
Volume 42,
Issue 5,
September 2024

Focus and Coverage

Journal of Vacuum Science & Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science and thin film materials science.

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Editor's Picks
Research Article
Ju Eun Kang, Sang Jeen Hong
Managing the hardness, density, and residual stress of the titanium nitride (TiN) hard mask has become increasingly significant for achieving excellent selectivity in the high aspect ratio etching ...
Research Article
Antoine Ronco, F. Boulard et al.
Great interest is shown toward atomic layer etching (ALE) processes due to the better control of the etching process and higher selectivity that they can offer. In order to obtain these benefits, the ...
Research Article
Yousra Traouli, Ufuk Kilic et al.
We investigate the time evolution of ZnO thin film growth in oxygen plasma-enhanced atomic layer deposition using in situ spectroscopic ellipsometry. The recently proposed dynamic-dual-box-model ...
Most Recent
Research Article
Ju Eun Kang, Sang Jeen Hong
Managing the hardness, density, and residual stress of the titanium nitride (TiN) hard mask has become increasingly significant for achieving excellent selectivity in the high aspect ratio etching ...
Research Article
Antoine Ronco, F. Boulard et al.
Great interest is shown toward atomic layer etching (ALE) processes due to the better control of the etching process and higher selectivity that they can offer. In order to obtain these benefits, the ...
Research Article
A. Fraile, D. Cavaleiro et al.
A series of TiZrNb(V) high entropy alloy-based metallic coatings have been deposited using high-power impulse magnetron sputtering (HiPIMS), with variable V concentrations and constant ratios among ...

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