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Current Issue
Volume 43,
Issue 1,
January 2025

Focus and Coverage

Journal of Vacuum Science & Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science and thin film materials science.

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Editor's Picks
Research Article
Hojin Kang, Sangbae Lee et al.
A comparative study on the atomic layer etching (ALE) process window was conducted for tantalum nitride (TaN) using nitrogen trifluoride (NF3) and carbon tetrafluoride (CF4) plasmas. The TaN surface ...
Research Article
Zsófia Baji, Zsolt Fogarassy et al.
The present paper reports on the atomic layer deposition of vanadium sulfide (VS) layers from tetrakis(ethylmethylamino)vanadium and H2S. The deposition of VS layers with these precursors has proven ...
Research Article
Jay V. Swarup, Heng-Ray Chuang et al.
We have examined the atomic layer deposition (ALD) of Al2O3 using a nonpyrophoric precursor, which possesses only Al–N bonds and no Al–C bonds: Al(N(CH3)2)2(–N(C2H5)–C2H4–N(C2H5)2), which we refer to ...
Most Recent
Research Article
Tetsuya Masuda, Miya Fujita et al.
The interpretation of time-of-flight secondary ion mass spectrometry (ToF-SIMS) data is often complicated because ToF-SIMS has a high sensitivity for detecting extremely low amounts of molecules and ...
Research Article
Topias Jussila, Joona Pekkanen et al.
Metal-organic thin films fabricated through industry-feasible atomic/molecular layer deposition (ALD/MLD) routes are highly attractive materials with diverse functional properties, but they suffer ...
Research Article
Jie Zan, ZiHan Liu et al.
As an efficient surface treatment method, microarc oxidation (MAO) solves the problems of severe pollution and high cost of traditional methods such as electroplating and anodic oxidation. The ...

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