Journal of Vacuum Science & Technology A

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Current Issue

Volume 42,

Issue 6,

December 2024

Focus and Coverage

Journal of Vacuum Science & Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science and thin film materials science.

Editor-in-Chief

Eray Aydil

Editors

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Featured Articles

Research Article

| November 25 2024

Following the propagation of erroneous x-ray photoelectron spectroscopy peak fitting through the literature. A genealogical approach

B. Maxwell Clark, George H. Major et al.

This study considers how poor x-ray photoelectron spectroscopy (XPS) peak fitting in the scientific literature is both affected by previous precedent and affects future published work. It focuses on ...

Research Article

| November 21 2024

Oxidation behavior of TiB₂–SiC nanocomposite coatings deposited by magnetron sputtering

Yuanxing Wu, Qizhong Li et al.

TiB₂ and TiB₂-SiC coatings were deposited by magnetron sputtering using pure TiB₂ targets and TiB₂-20 mol. % SiC composite targets, and their high-temperature oxidation behavior in air was ...

Research Article

| November 12 2024

Report on laser-induced fluorescence transitions relevant for the microelectronics industry and sustainability applications

V. S. Santosh K. Kondeti, Shurik Yatom et al.

A wide variety of feed gases are used to generate low-temperature plasmas for the microelectronics and sustainability applications. These plasmas often have a complex combination of reactive and ...

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Editor's Picks

Review Article

| November 19 2024

Surface passivation approaches for silicon, germanium, and III–V semiconductors

Roel J. Theeuwes, Wilhelmus M. M. Kessels et al.

Semiconductors are key to our modern society, enabling a myriad of fields, including electronics, photovoltaics, and photonics. The performance of semiconductor devices can be significantly hampered ...

Research Article

| November 18 2024

Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride

Thorsten Lill, Mingmei Wang et al.

Etching of high aspect ratio features into alternating SiO₂ and SiN layers is an enabling technology for the manufacturing of 3D NAND flash memories. In this paper, we study a low-temperature or cryo ...

Research Article

| November 15 2024

Substrate induced composition change during Ge₂Sb₂Te₅ atomic layer deposition and study of initial reactions on SiO₂ surface

Jyoti Sinha, Laura Nyns et al.

Ge₂Sb₂Te₅ (GST) is a well-known phase change material used in nonvolatile memory devices, photonics, and nonvolatile displays. This study investigates the impact of precursor sequence during atomic ...

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Most Recent

Research Article

| November 25 2024

Silicon-air nanofilm based on the ⟨110⟩ projection of a diamond lattice to enhance radiative cooling

David Kortge, Jie Zhu et al.

Photonic crystals built with 3D diamond structures have potentially large bandgaps, which can benefit a wide range of applications, such as daytime radiative cooling, where emissivity needs to be ...

Research Article

| November 25 2024

Following the propagation of erroneous x-ray photoelectron spectroscopy peak fitting through the literature. A genealogical approach

B. Maxwell Clark, George H. Major et al.

Research Article

| November 22 2024

Generalized rate theory for void and bubble swelling and its application to δ-plutonium

P. G. Allen, W. G. Wolfer et al.

A rate theory for void and bubble swelling is derived that allows both vacancies and self-interstitial atoms to be generated by thermal activation at all sinks. In addition, they can also be produced ...

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