Journal of Vacuum Science & Technology A

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Current Issue

Volume 42,

Issue 5,

September 2024

Focus and Coverage

Journal of Vacuum Science & Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science and thin film materials science.

Editor-in-Chief

Eray Aydil

Editors

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Featured Articles

Research Article

| September 04 2024

OrbiSIMS depth profiling of semiconductor materials—Useful yield and depth resolution

Yundong Zhou, Alexis Franquet et al.

OrbiSIMS is a secondary ion mass spectrometry method with dual mass analyzers: a time-of-flight (ToF) mass spectrometer for high-speed imaging and an Orbitrap^™ for high mass resolving power and mass ...

Research Article

| July 24 2024

Immersion ellipsometry for the uncorrelated determination of ultrathin film thickness and index of refraction: Theory and examples

Samira Jafari, Blaine Johs et al.

Immersion ellipsometry can break the well-known correlation between optical constants and thicknesses of ultrathin (<5–10 nm) films, allowing both to be determined. In immersion ellipsometry, ...

Review Article

| July 23 2024

Review of actinide core-level photoemission

Alaina Thompson, William Limestall et al.

Photoelectron spectroscopy allows for the investigation of the electronic structure and chemical bonding of actinide elements and their compounds, providing insights into oxidation states, chemical ...

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Editor's Picks

Research Article

| October 01 2024

Low-loss and low-temperature Al₂O₃ thin films for integrated photonics and optical coatings

Pooya Torab Ahmadi, Michael Chesaux et al.

Amorphous aluminum oxide (Al₂O₃) is a key material in optical coatings due to its notable properties, including a broad transparency window (ultraviolet to mid-infrared) and excellent durability. ...

Research Article

| September 30 2024

Influence of hydrogen-bonded 3-mercaptopropionic acid bilayers on binary self-assembled monolayer formation

Lindsey N. Penland, H. H. Hirushan et al.

The influence of the monolayer order, defect density, and bilayer formation on the formation of binary self-assembled monolayers (SAMs) was investigated via the solution-phase displacement of ...

Research Article

| September 30 2024

Effect of Al precursor’s properties on interactions with self-assembled monolayers for area selective deposition

Eryan Gu, Jin Yan et al.

Area selective deposition (ASD) is a high-precision atomic-level manufacturing technology that enables the development of bottom-up manufacturing methods in the future semiconductor field. The area ...

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Most Recent

Research Article

| October 01 2024

Microstructure and performance of joint of Al/Cu welded by resistance element welding with an auxiliary gasket

Dongsheng Cui, Jing Wang et al.

A 1060 commercial-purity aluminum and T2 pure copper plates with a thickness of 2 mm were welded by using resistance element welding with an aluminum rivet and auxiliary gasket. The interfacial ...

Research Article

| October 01 2024

Low-loss and low-temperature Al₂O₃ thin films for integrated photonics and optical coatings

Pooya Torab Ahmadi, Michael Chesaux et al.

Research Article

| September 30 2024

Influence of hydrogen-bonded 3-mercaptopropionic acid bilayers on binary self-assembled monolayer formation

Lindsey N. Penland, H. H. Hirushan et al.

The influence of the monolayer order, defect density, and bilayer formation on the formation of binary self-assembled monolayers (SAMs) was investigated via the solution-phase displacement of ...

View All Most Recent Articles