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Journal of Vacuum Science & Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science and thin film materials science.
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Featured Articles
Editorial
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June 17 2025
Research Article
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June 04 2025
Jiani Yang, Xiaoyang Guo et al.
Thermocyclic protection performance of ultrahigh temperature ceramic coatings is crucial for the reusability of carbon-based composites. In this work, the slurry method combined with vapor phase ...
Research Article
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June 03 2025
Kate M. Wislang, Rodrigo Martinez-Gazoni et al.
Ga2O3 is an ultrawide bandgap semiconductor with a very high thermal stability and breakdown strength that is attracting significant interest for use in high-efficiency power electronics and ...
Editor's Picks
Research Article
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June 18 2025
Junji Kataoka, Norikatsu Sasao et al.
In the high-aspect-ratio hole etching process, there is a strong need for high selectivity of SiO2 and SiN films against the amorphous carbon mask. To meet this demand, we conducted research on the ...
Research Article
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June 13 2025
Jianming Guo, Zhiping Mou et al.
Three-dimensional plasma etching profile evolution remains a fundamental challenge in semiconductor process engineering, especially given its complexity and computational cost. In this work, we ...
Research Article
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June 09 2025
Alaina Humiston, Miu Lun Lau et al.
We have developed an artificial intelligence tool, XES Neo, for fitting x-ray emission spectroscopy (XES) data using a genetic algorithm. The Neo package has been applied to extended x-ray absorption ...
Most Recent
Research Article
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June 20 2025
Lingyu Meng, Dong Su Yu et al.
Background carbon incorporation and film cracking issue in (001) β-Ga2O3 films grown by metalorganic chemical vapor deposition (MOCVD) are investigated. Quantitative secondary ion mass spectrometry ...
Research Article
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June 20 2025
Y. G. Li, G. Z. Ouyang et al.
This study investigates the behavior of plasma discharge and particle transport in Modulated Pulsed Power Magnetron Sputtered Cr targets by introducing helium (He), an inert gas with the highest ...
Research Article
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June 20 2025
Yi Chen, Daniel Cho et al.
The selective etching of Si1−xGex over Si enables the fabrication of the gate-all-around field-effect transistors. While ample experimental data have confirmed such selectivity in various ...
What more can be done with XPS? Highly informative but underused approaches to XPS data collection and analysis
Donald R. Baer, Merve Taner Camci, et al.
Low-resistivity molybdenum obtained by atomic layer deposition
Kees van der Zouw, Bernhard Y. van der Wel, et al.
Perspective on improving the quality of surface and material data analysis in the scientific literature with a focus on x-ray photoelectron spectroscopy (XPS)
George H. Major, Joshua W. Pinder, et al.

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