Journal of Vacuum Science & Technology A

Skip Nav Destination

Current Issue

Volume 42,

Issue 5,

September 2024

Focus and Coverage

Journal of Vacuum Science & Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science and thin film materials science.

Editor-in-Chief

Eray Aydil

Editors

RSS Feed

Current Issue

Open Issues

Featured Articles

Research Article

| September 04 2024

OrbiSIMS depth profiling of semiconductor materials—Useful yield and depth resolution

Yundong Zhou, Alexis Franquet et al.

OrbiSIMS is a secondary ion mass spectrometry method with dual mass analyzers: a time-of-flight (ToF) mass spectrometer for high-speed imaging and an Orbitrap^™ for high mass resolving power and mass ...

Research Article

| July 24 2024

Immersion ellipsometry for the uncorrelated determination of ultrathin film thickness and index of refraction: Theory and examples

Samira Jafari, Blaine Johs et al.

Immersion ellipsometry can break the well-known correlation between optical constants and thicknesses of ultrathin (<5–10 nm) films, allowing both to be determined. In immersion ellipsometry, ...

Review Article

| July 23 2024

Review of actinide core-level photoemission

Alaina Thompson, William Limestall et al.

Photoelectron spectroscopy allows for the investigation of the electronic structure and chemical bonding of actinide elements and their compounds, providing insights into oxidation states, chemical ...

View All Featured Articles

Editor's Picks

Research Article

| October 04 2024

Removing defects from sputter damage on InGaP surfaces using thermal atomic layer etching

Ross Edel, Ezra Alexander et al.

Thermal atomic layer etching (ALE) was utilized to remove sputter damage from InGaP samples. Removal of sputter damage from InGaP surfaces was measured using x-ray photoelectron spectroscopy (XPS). ...

Research Article

| October 01 2024

Low-loss and low-temperature Al₂O₃ thin films for integrated photonics and optical coatings

Pooya Torab Ahmadi, Michael Chesaux et al.

Amorphous aluminum oxide (Al₂O₃) is a key material in optical coatings due to its notable properties, including a broad transparency window (ultraviolet to mid-infrared) and excellent durability. ...

Research Article

| September 30 2024

Influence of hydrogen-bonded 3-mercaptopropionic acid bilayers on binary self-assembled monolayer formation

Lindsey N. Penland, H. H. Hirushan et al.

The influence of the monolayer order, defect density, and bilayer formation on the formation of binary self-assembled monolayers (SAMs) was investigated via the solution-phase displacement of ...

View All Editor's Picks Articles

Most Recent

Research Article

| October 08 2024

Effect of plasma nitriding on microstructure and wear behavior of electrodeposited FeCoNiCr coating

Meiling Dong, Mingxin He et al.

An (FeCoNiCr)N high-entropy alloy coating with a single FCC phase was fabricated on 304 stainless steel by electrodeposition and plasma nitriding. The results indicated that the FeCoNiCr coating ...

Research Article

| October 08 2024

Fabrication of thick Cr masks for reactive ion substrate etching by electron beam lithography and lift-off techniques

Deyong Wang, Peter Kjær Kristensen et al.

Fabrication of tall Cr nanostructures of different shapes by lithography and lift-off processes is demonstrated. By varying resist thickness, metal layer thickness, and diameter of holes in the ...

Research Article

| October 04 2024

Effect of a DC gradient magnetic field on electron density in a weakly magnetized inductively coupled plasma

You He, Yi-Lang Jiang et al.

A gradient DC magnetic field was applied along the axial direction of a planar inductively coupled oxygen plasma. The gradient of the magnetic field was controlled by adjusting the currents of the ...

View All Most Recent Articles