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Journal of Vacuum Science & Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science and thin film materials science.
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Featured Articles
Research Article
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September 04 2024
Yundong Zhou, Alexis Franquet et al.
OrbiSIMS is a secondary ion mass spectrometry method with dual mass analyzers: a time-of-flight (ToF) mass spectrometer for high-speed imaging and an Orbitrap™ for high mass resolving power and mass ...
Research Article
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July 24 2024
Samira Jafari, Blaine Johs et al.
Immersion ellipsometry can break the well-known correlation between optical constants and thicknesses of ultrathin (<5–10 nm) films, allowing both to be determined. In immersion ellipsometry, ...
Review Article
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July 23 2024
Alaina Thompson, William Limestall et al.
Photoelectron spectroscopy allows for the investigation of the electronic structure and chemical bonding of actinide elements and their compounds, providing insights into oxidation states, chemical ...
Editor's Picks
Research Article
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September 13 2024
Ju Eun Kang, Sang Jeen Hong
Managing the hardness, density, and residual stress of the titanium nitride (TiN) hard mask has become increasingly significant for achieving excellent selectivity in the high aspect ratio etching ...
Research Article
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September 13 2024
Antoine Ronco, F. Boulard et al.
Great interest is shown toward atomic layer etching (ALE) processes due to the better control of the etching process and higher selectivity that they can offer. In order to obtain these benefits, the ...
Research Article
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September 06 2024
Yousra Traouli, Ufuk Kilic et al.
We investigate the time evolution of ZnO thin film growth in oxygen plasma-enhanced atomic layer deposition using in situ spectroscopic ellipsometry. The recently proposed dynamic-dual-box-model ...
Most Recent
Research Article
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September 13 2024
Ju Eun Kang, Sang Jeen Hong
Managing the hardness, density, and residual stress of the titanium nitride (TiN) hard mask has become increasingly significant for achieving excellent selectivity in the high aspect ratio etching ...
Research Article
|
September 13 2024
Antoine Ronco, F. Boulard et al.
Great interest is shown toward atomic layer etching (ALE) processes due to the better control of the etching process and higher selectivity that they can offer. In order to obtain these benefits, the ...
Research Article
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September 11 2024
A. Fraile, D. Cavaleiro et al.
A series of TiZrNb(V) high entropy alloy-based metallic coatings have been deposited using high-power impulse magnetron sputtering (HiPIMS), with variable V concentrations and constant ratios among ...
Many routes to ferroelectric HfO2: A review of current deposition methods
Hanan Alexandra Hsain, Younghwan Lee, et al.
Low-resistivity molybdenum obtained by atomic layer deposition
Kees van der Zouw, Bernhard Y. van der Wel, et al.
Observation of an abrupt 3D-2D morphological transition in thin Al layers grown by MBE on InGaAs surface
A. Elbaroudy, B. Khromets, et al.
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