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Current Issue
Volume 42,
Issue 4,
July 2024

Focus and Coverage

Journal of Vacuum Science & Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science and thin film materials science.

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Editor's Picks
Research Article
Lena N. Majer, Sander Smink et al.
We have developed and optimized a method to grow ruthenium films of unprecedented quality. Our three-step process is reminiscent of solid-phase epitaxy. First, c-cut sapphire substrates are ...
Research Article
Fatima Jenina Arellano, Minoru Kusaba et al.
Optical emission spectroscopy (OES) is a highly valuable tool for plasma characterization due to its nonintrusive and versatile nature. The intensities of the emission lines contain information about ...
Letter
J. Patouillard, M. Bernard et al.
Aluminum nitride (AlN) is a wide bandgap material used in acoustic devices, piezo- micro-electromechanical system and is promising for other electronic applications. However, for most applications, ...
Most Recent
Research Article
I. Campos-Silva, J. Cedeño-Velázquez et al.
In this study, novel findings were obtained regarding the influence of a 10 A current intensity on the growth of an FeB–Fe2B layer during pulsed-DC powder-pack boriding. Boride layer formation was ...
Research Article
Kazuki Denpoh, Taiki Kato et al.
The ion-neutral reactive collision model DNT+, which generates comprehensive ion-neutral collision cross section (CS) data sets for atoms and nonpolar molecules, has been extended to polar molecules. ...
Research Article
Aneta S. Stodolna, Shyama Ramankutty et al.
The knowledge of atomic hydrogen recombination coefficient (γ) is essential for plasma simulations to calculate accurate atomic hydrogen fluxes. However, γ is a complex material property, and it is ...

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