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Current Issue
Volume 41,
Issue 5,
September 2023

Focus and Coverage

Journal of Vacuum Science & Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science and thin film materials science.

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Editor's Picks
Research Article
Azmain A. Hossain, Haozhe Wang et al.
Microwave loss in superconducting TiN films is attributed to two-level systems in various interfaces arising in part from oxidation and microfabrication-induced damage. Atomic layer etching (ALE) is ...
Research Article
Wangu Kang, Ji Sang Ahn et al.
Molybdenum carbide (MoC) and molybdenum carbonitride (MoCN) films were successfully deposited by plasma-enhanced atomic layer deposition (PEALD) using bis(isopropylcyclopentadienyl)molybdenum(IV) ...
Research Article
Satoka Aoyagi
Machine learning is a useful tool when extracting hidden information from complex measurement data obtained via surface analysis, as in secondary ion mass spectrometry. Flexible learning methods ...
Most Recent
Research Article
J. Zgheib, L. Berthelot et al.
A high-power impulse magnetron sputtering (HiPIMS) power supply, called e-HiPIMS, has been developed and used to deposit chromium thin films within an argon discharge. This power supply comprises ...
Research Article
Azmain A. Hossain, Haozhe Wang et al.
Microwave loss in superconducting TiN films is attributed to two-level systems in various interfaces arising in part from oxidation and microfabrication-induced damage. Atomic layer etching (ALE) is ...
Research Article
Hsiao-Hsuan Wan, Jian-Sian Li et al.
Two of the most common dielectrics for β-Ga2O3 are SiO2 and Al2O3 because of their large bandgaps, versatility of preparation, and thermal stability. However, because of the anisotropic properties of ...

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