Journal of Vacuum Science & Technology A

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Current Issue

Volume 43,

Issue 3,

May 2025

Focus and Coverage

Journal of Vacuum Science & Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science and thin film materials science.

Editor-in-Chief

Eray Aydil

Editors

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Featured Articles

Editorial

| June 17 2025

Editorial: Submitting your x-ray photoelectron spectral data to Surface Science Spectra

Richard T. Haasch

Research Article

| June 04 2025

Study on the thermocyclic protection performance of ultrahigh temperature ceramic SiC–Si–Hf(Ta)B₂ coating for static oxidation and ablation environments up to 2300 °C

Jiani Yang, Xiaoyang Guo et al.

Thermocyclic protection performance of ultrahigh temperature ceramic coatings is crucial for the reusability of carbon-based composites. In this work, the slurry method combined with vapor phase ...

Research Article

| June 03 2025

Growth and properties of Sn-doped sol-gel Ga₂O₃ thin films

Kate M. Wislang, Rodrigo Martinez-Gazoni et al.

Ga₂O₃ is an ultrawide bandgap semiconductor with a very high thermal stability and breakdown strength that is attracting significant interest for use in high-efficiency power electronics and ...

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Editor's Picks

Research Article

| June 18 2025

Infinite selectivity in dry etching process for high-aspect-ratio hole using C₇HF₇ gas plasma

Junji Kataoka, Norikatsu Sasao et al.

In the high-aspect-ratio hole etching process, there is a strong need for high selectivity of SiO₂ and SiN films against the amorphous carbon mask. To meet this demand, we conducted research on the ...

Research Article

| June 13 2025

Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning

Jianming Guo, Zhiping Mou et al.

Three-dimensional plasma etching profile evolution remains a fundamental challenge in semiconductor process engineering, especially given its complexity and computational cost. In this work, we ...

Research Article

| June 09 2025

Analysis of x-ray emission spectroscopy (XES) data using artificial intelligence techniques included in the XES Neo package

Alaina Humiston, Miu Lun Lau et al.

We have developed an artificial intelligence tool, XES Neo, for fitting x-ray emission spectroscopy (XES) data using a genetic algorithm. The Neo package has been applied to extended x-ray absorption ...

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Most Recent

Research Article

| June 20 2025

Metalorganic chemical vapor deposition epitaxy of β-Ga₂O₃ films on (001) Ga₂O₃ substrates with fast growth rates

Lingyu Meng, Dong Su Yu et al.

Background carbon incorporation and film cracking issue in (001) β-Ga₂O₃ films grown by metalorganic chemical vapor deposition (MOCVD) are investigated. Quantitative secondary ion mass spectrometry ...

Research Article

| June 20 2025

Plasma dynamics of modulated pulsed power magnetron sputtered Cr target in an Ar-He atmosphere

Y. G. Li, G. Z. Ouyang et al.

This study investigates the behavior of plasma discharge and particle transport in Modulated Pulsed Power Magnetron Sputtered Cr targets by introducing helium (He), an inert gas with the highest ...

Research Article

| June 20 2025

Kinetics model for thermal selective etching of Si_1−xGe_x in F₂/Ar

Yi Chen, Daniel Cho et al.

The selective etching of Si_1−xGe_x over Si enables the fabrication of the gate-all-around field-effect transistors. While ample experimental data have confirmed such selectivity in various ...

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