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Journal of Vacuum Science & Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science and thin film materials science.
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August 25 2023
Jeong Won Kim, Ansoon Kim et al.
We present the results of an interlaboratory study on work function (WF) measurements by ultraviolet photoelectron spectroscopy (UPS) conducted under the auspices of the Versailles Project on ...
Research Article
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August 18 2023
Rahel Heesemann, Isa Bettermann et al.
The fire protection of materials has an important role in our everyday life and covers a highly diverse spectrum of substances, materials, and fields of application. Important fields of application ...
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August 16 2023
Francesca Bennet, Robert Opitz et al.
Due to the extremely high specific surface area of nanoparticles and corresponding potential for adsorption, the results of surface analysis can be highly dependent on the history of the particles, ...
Editor's Picks
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September 26 2023
Azmain A. Hossain, Haozhe Wang et al.
Microwave loss in superconducting TiN films is attributed to two-level systems in various interfaces arising in part from oxidation and microfabrication-induced damage. Atomic layer etching (ALE) is ...
Research Article
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September 12 2023
Wangu Kang, Ji Sang Ahn et al.
Molybdenum carbide (MoC) and molybdenum carbonitride (MoCN) films were successfully deposited by plasma-enhanced atomic layer deposition (PEALD) using bis(isopropylcyclopentadienyl)molybdenum(IV) ...
Research Article
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September 07 2023
Satoka Aoyagi
Machine learning is a useful tool when extracting hidden information from complex measurement data obtained via surface analysis, as in secondary ion mass spectrometry. Flexible learning methods ...
Most Recent
Research Article
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September 26 2023
J. Zgheib, L. Berthelot et al.
A high-power impulse magnetron sputtering (HiPIMS) power supply, called e-HiPIMS, has been developed and used to deposit chromium thin films within an argon discharge. This power supply comprises ...
Research Article
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September 26 2023
Azmain A. Hossain, Haozhe Wang et al.
Microwave loss in superconducting TiN films is attributed to two-level systems in various interfaces arising in part from oxidation and microfabrication-induced damage. Atomic layer etching (ALE) is ...
Research Article
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September 22 2023
Hsiao-Hsuan Wan, Jian-Sian Li et al.
Two of the most common dielectrics for β-Ga2O3 are SiO2 and Al2O3 because of their large bandgaps, versatility of preparation, and thermal stability. However, because of the anisotropic properties of ...

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