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Current Issue
Volume 42,
Issue 3,
May 2024

Focus and Coverage

Journal of Vacuum Science & Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science and thin film materials science.

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Editor's Picks
Research Article
Ying Rui, Sumeet Pandey et al.
The cyclic two-step process, comprised of energetic H2 plasma followed by HF wet clean or in situ NF3 plasma, demonstrates Si3N4 layer-by-layer removal capability exceeding 10 nm per cycle, ...
Research Article
Nicholas McDowell, Ritchie Scott-McCabe et al.
Thermal atomic layer etching (ALE) is one promising method to achieve atomic level precision and high conformality over three-dimensional structures that can further enable the manufacturing of ...
Research Article
L. B. Varela, P. R. T. Avila et al.
Ti-Al-N coatings were prepared by cathodic arc deposition on Inconel 718 substrates at different values of constant substrate bias voltage, aiming to produce samples with different self-developed ...
Most Recent
Research Article
Simon Ruel, Patricia Pimenta-Barros et al.
Reducing plasma-induced damage (PID) is one of the most challenging goals for the fabrication of GaN-based MOS-HEMT. In this paper, we propose a performance evaluation of a Cl2-based etching ...
Research Article
Xinglei Cui, Long Li et al.
Insulating ceramics are widely used in power systems, but their high polarity makes them prone to wet and pollution flashover. In this paper, an Ar/polydimethylsiloxane dielectric barrier discharge ...
Research Article
S. C. Olsen, D. D. Allred et al.
Hollow cathodes are a common type of vacuum ultraviolet (VUV) light source with a wide range of design and application. We determined the VUV (58.4 nm) intensity distribution of a hollow cathode as a ...

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