Journal of Vacuum Science & Technology A

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Current Issue

Volume 42,

Issue 5,

September 2024

Focus and Coverage

Journal of Vacuum Science & Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science and thin film materials science.

Editor-in-Chief

Eray Aydil

Editors

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Featured Articles

Research Article

| September 04 2024

OrbiSIMS depth profiling of semiconductor materials—Useful yield and depth resolution

Yundong Zhou, Alexis Franquet et al.

OrbiSIMS is a secondary ion mass spectrometry method with dual mass analyzers: a time-of-flight (ToF) mass spectrometer for high-speed imaging and an Orbitrap^™ for high mass resolving power and mass ...

Research Article

| July 24 2024

Immersion ellipsometry for the uncorrelated determination of ultrathin film thickness and index of refraction: Theory and examples

Samira Jafari, Blaine Johs et al.

Immersion ellipsometry can break the well-known correlation between optical constants and thicknesses of ultrathin (<5–10 nm) films, allowing both to be determined. In immersion ellipsometry, ...

Review Article

| July 23 2024

Review of actinide core-level photoemission

Alaina Thompson, William Limestall et al.

Photoelectron spectroscopy allows for the investigation of the electronic structure and chemical bonding of actinide elements and their compounds, providing insights into oxidation states, chemical ...

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Editor's Picks

Research Article

| September 13 2024

Effect of NH₃ flow rate to titanium nitride as etch hard mask in thermal atomic layer deposition

Ju Eun Kang, Sang Jeen Hong

Managing the hardness, density, and residual stress of the titanium nitride (TiN) hard mask has become increasingly significant for achieving excellent selectivity in the high aspect ratio etching ...

Research Article

| September 13 2024

Process stability of SiO₂ atomic layer etching in C₄F₆/Ar chemistry

Antoine Ronco, F. Boulard et al.

Great interest is shown toward atomic layer etching (ALE) processes due to the better control of the etching process and higher selectivity that they can offer. In order to obtain these benefits, the ...

Research Article

| September 06 2024

In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using in situ spectroscopic ellipsometry

Yousra Traouli, Ufuk Kilic et al.

We investigate the time evolution of ZnO thin film growth in oxygen plasma-enhanced atomic layer deposition using in situ spectroscopic ellipsometry. The recently proposed dynamic-dual-box-model ...

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Most Recent

Research Article

| September 13 2024

Effect of NH₃ flow rate to titanium nitride as etch hard mask in thermal atomic layer deposition

Ju Eun Kang, Sang Jeen Hong

Research Article

| September 13 2024

Process stability of SiO₂ atomic layer etching in C₄F₆/Ar chemistry

Antoine Ronco, F. Boulard et al.

Research Article

| September 11 2024

Ti-Zr-Nb-(V) refractory alloy coatings deposited by high-power impulse magnetron sputtering: Structure, mechanical properties, oxidation resistance, and thermal stability

A. Fraile, D. Cavaleiro et al.

A series of TiZrNb(V) high entropy alloy-based metallic coatings have been deposited using high-power impulse magnetron sputtering (HiPIMS), with variable V concentrations and constant ratios among ...

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