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Journal of Vacuum Science & Technology A Cover Image for Volume 43, Issue 3
Current Issue
Volume 43,
Issue 3,
May 2025

Focus and Coverage

Journal of Vacuum Science & Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science and thin film materials science.

Read more about the journal

Editor's Picks
Research Article
Tiffany C. Kaspar, Sarah Akers et al.
Thin film deposition is a fundamental technology for the discovery, optimization, and manufacturing of functional materials. Deposition by molecular beam epitaxy (MBE) typically employs reflection ...
Research Article
S. Kondati Natarajan, J. Schneider et al.
Atomistic modeling of thin-film processes provides an avenue not only for discovering key chemical mechanisms of the processes but also to extract quantitative metrics on the events and reactions ...
Research Article
A. Y. Polyakov, I. V. Schemerov et al.
The electrical properties and deep trap spectra of semi-insulating Ga2O3(Fe) implanted with Si ions and subsequently annealed at 1000 °C were investigated. A significant discrepancy was observed ...
Most Recent
Research Article
Hibiki Takeda, Haruto Suzuki et al.
A roll-to-roll system to continuously remove Cs ions from radioactive water requires cation absorbers deposited on flexible films. To deposit a cation absorber, aluminum silicate, on the polyethylene ...
Research Article
T. Oppelstrup, N. Bertin et al.
We have developed a first-passage kinetic Monte Carlo approach for materials aging to investigate the sensitivity of void swelling to model parameters, including helium bubble density and size ...
Research Article
Hsiao-Hsuan Wan, Fan Ren et al.
The correlation between the carrier removal rate (CRR) in n-type Ga2O3 and the nonionizing energy loss (NIEL) by MeV protons during irradiation of rectifier structures is reported. A dependence of ...

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