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Journal Articles
Viability of HFO-1234ze(E) (trans-1,3,3,3-tetrafluoropropene) as a low global warming potential silicon dioxide etch gas
Available to PurchaseAaron J. Windsor, Jeremy C. Clark, George McMurdy, Eric A. Joseph, Robert G. Syvret, Ronald J. Olson, Jr., Judy J. Cha
J. Vac. Sci. Technol. B 43, 022206 (2025)
Published: February 2025
Journal Articles
J. Vac. Sci. Technol. B 43, 022803 (2025)
Published: January 2025
Journal Articles
Line wiggling due to plasma-induced film stress and prevention by surface roughness modification
Available to PurchaseAmelia Turnquist, Naoyuki Kofuji, Joseph Sebastian, Hiroshi Kou, Takahiro Arai, Hideaki Fukuda, Yoann Tomczak, Yiting Sun, Daniele Piumi, David De Roest
J. Vac. Sci. Technol. B 43, 012203 (2025)
Published: January 2025
Journal Articles
J. Vac. Sci. Technol. B 42, 064201 (2024)
Published: December 2024
Journal Articles
B. Salmond, D. D. John, W. J. Mitchell, B. J. Thibeault, T. Richter, A. Nadzeyka, P. Mazarov, F. Meyer, J. Fridmann, Y. Yu, M. Wale, W. Meredith, P. M. Smowton, D. Read, S. Shutts
J. Vac. Sci. Technol. B 42, 062214 (2024)
Published: December 2024
Journal Articles
Fabrication of double-grooved gratings using coplanar multibeam holographic lithography with a phase mask
J. Vac. Sci. Technol. B 42, 062603 (2024)
Published: November 2024
Journal Articles
Yasser Pordeli, Céline Steenge, Erwin J. W. Berenschot, Ray J. E. Hueting, Andrea Migliorini, Stuart S. P. Parkin, Niels R. Tas
J. Vac. Sci. Technol. B 42, 062805 (2024)
Published: November 2024
Journal Articles
Nanofabrication of high transition temperature superconductive electronics with focused helium ion irradiation
J. Vac. Sci. Technol. B 42, 063204 (2024)
Published: October 2024
Journal Articles
J. Vac. Sci. Technol. B 42, 062602 (2024)
Published: October 2024
Journal Articles
Scalable fabrication of vertically arranged Bi2Se3 crossbar arrays for memristive device applications
Available to Purchase
J. Vac. Sci. Technol. B 42, 063203 (2024)
Published: October 2024
Journal Articles
Constant period line gratings as a metric for patterning fidelity in electron beam lithography
J. Vac. Sci. Technol. B 42, 064001 (2024)
Published: October 2024
Journal Articles
Fabrication of hollow silicon microneedles using grayscale lithography and deep reactive ion etching
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J. Vac. Sci. Technol. B 42, 053001 (2024)
Published: August 2024
Journal Articles
Lithography mask thermal and stress effect for the machine overlay compensation
Available to Purchase
J. Vac. Sci. Technol. B 42, 042601 (2024)
Published: July 2024
Journal Articles
Science challenges and research opportunities for plasma applications in microelectronics
David B. Graves, Catherine B. Labelle, Mark J. Kushner, Eray S. Aydil, Vincent M. Donnelly, Jane P. Chang, Peter Mayer, Lawrence Overzet, Steven Shannon, Shahid Rauf, David N. Ruzic
J. Vac. Sci. Technol. B 42, 042202 (2024)
Published: June 2024
Journal Articles
Fabrication of silicon sharp nanocones using dry etch with periodic oxygen plasma shrinking and wet etch
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J. Vac. Sci. Technol. B 42, 033002 (2024)
Published: April 2024
Journal Articles
Cryogenic etching of positively tapered silicon pillars with controllable profiles
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J. Vac. Sci. Technol. B 42, 032206 (2024)
Published: April 2024
Journal Articles
Multi-step plasma etching of high aspect ratio silicon nanostructures for metalens fabrication
Available to Purchase
J. Vac. Sci. Technol. B 42, 032203 (2024)
Published: April 2024
Journal Articles
Investigation of silicon-on-insulator back-gate nano vacuum channel transistor array
Available to Purchase
J. Vac. Sci. Technol. B 42, 023201 (2024)
Published: February 2024
Journal Articles
Fabrication of blazed gratings by tilted reactive ion beam etching with the side mask for augmented reality applications
J. Vac. Sci. Technol. B 42, 013001 (2024)
Published: January 2024
Journal Articles
Novel wet transfer technology of manufacturing flexible suspended two-dimensional material devices
J. Vac. Sci. Technol. B 41, 062810 (2023)
Published: December 2023
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