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Journal Articles

Compositionally graded Ba_1−xSr_xTiO₃ thin film for SIMS applications

J. Scola, J. Garcia, F. Jomard, E. Loire, J. Wolfman, B. Negulescu, G. Z. Liu, M.-A. Pinault-Thaury

J. Vac. Sci. Technol. B 43, 044004 (2025)

https://doi.org/10.1116/6.0004549

Published: June 2025

View articletitled, Compositionally graded Ba1−xSrxTiO3 thin film for SIMS applications

Journal Articles

Cryomicroscopy of low melting point metals

Michael Colletta, Jamie Ford, Joseph R. Michael, David A. Muller, Lucille A. Giannuzzi

J. Vac. Sci. Technol. B 43, 044003 (2025)

https://doi.org/10.1116/6.0004361

Published: June 2025

View articletitled, Cryomicroscopy of low melting point metals

Journal Articles

Effect of glow cleaning bias voltage on microstructure and properties of ion nitriding/multiarc ion plating CrTiAlN composite coatings

Yuanhao Qi, Xiao Nan, Qiaoqin Guo, Zhong Yang

J. Vac. Sci. Technol. B 43, 044002 (2025)

https://doi.org/10.1116/6.0004631

Published: June 2025

View articletitled, Effect of glow cleaning bias voltage on microstructure and properties of ion nitriding/multiarc ion plating CrTiAlN composite coatings

Journal Articles

Effect of Ag layer thickness and annealing treatment on the transmittance and conductivity of transparent antennas fabricated using ITO/Ag/ITO structures

Yoji Yasuda, Yuka Saitou, Fukuro Koshiji, Takayuki Uchida

J. Vac. Sci. Technol. B 43, 042204 (2025)

https://doi.org/10.1116/6.0004573

Published: June 2025

View articletitled, Effect of Ag layer thickness and annealing treatment on the transmittance and conductivity of transparent antennas fabricated using ITO/Ag/ITO structures

Journal Articles

Method for monitoring high aspect ratio contact dry etching process using calibration and normalization method for optical emission spectroscopy

Jitae Park, Sejin Oh, Sung-Ho Jang, Dougyong Sung, Jin-Young Bang, Sung-Il Cho

J. Vac. Sci. Technol. B 43, 044202 (2025)

https://doi.org/10.1116/6.0004477

Published: June 2025

View articletitled, Method for monitoring high aspect ratio contact dry etching process using calibration and normalization method for optical emission spectroscopy

Journal Articles

Resistivity improvement of flexible transparent conductive films with Cu inserted intermediate layer

Nene Yoshikawa, Yukio Yoshimura, Atsushi Nitta

J. Vac. Sci. Technol. B 43, 042203 (2025)

https://doi.org/10.1116/6.0004528

Published: June 2025

View articletitled, Resistivity improvement of flexible transparent conductive films with Cu inserted intermediate layer

Journal Articles

Low-temperature Al_xGa_1−xN growth by combined electron cyclotron resonance sputtering and magnetron sputtering

Hironori Torii, Shinsuke Matsui

J. Vac. Sci. Technol. B 43, 042202 (2025)

https://doi.org/10.1116/6.0004592

Published: June 2025

View articletitled, Low-temperature AlxGa1−xN growth by combined electron cyclotron resonance sputtering and magnetron sputtering

Journal Articles

KTaO₃(001) preparation methods in vacuum: Effects on surface stoichiometry, crystallography, and in-gap states

Andrea M. Lucero Manzano, Esteban D. Cantero, Emanuel A. Martínez, F. Y. Bruno, Esteban A. Sánchez, Oscar Grizzi

J. Vac. Sci. Technol. B 43, 044001 (2025)

https://doi.org/10.1116/6.0004608

Published: May 2025

View articletitled, KTaO3(001) preparation methods in vacuum: Effects on surface stoichiometry, crystallography, and in-gap states

Journal Articles

Real-time determination of sputtered TiC film composition using optical emission spectroscopy

Susumu Imashuku

J. Vac. Sci. Technol. B 43, 034002 (2025)

https://doi.org/10.1116/6.0004474

Published: May 2025

View articletitled, Real-time determination of sputtered TiC film composition using optical emission spectroscopy

Journal Articles

Integration of in situ field-directed sputter sharpening in Scienta Omicron systems

Stephanie D. Lough, Megan Cowie, Adam Bottomley, Brandon Blue, Masahiro Ishigami

J. Vac. Sci. Technol. B 43, 035001 (2025)

https://doi.org/10.1116/6.0004517

Published: May 2025

View articletitled, Integration of in situ field-directed sputter sharpening in Scienta Omicron systems

Journal Articles

Study of zinc doped In_0.53Ga_0.47As/InP/InAlAs/InP heterostructures by time-of-flight; magnetic secondary ion spectrometry and high-energy x-ray photoelectron spectroscopy

G. Tsamo Tagougue, M. Veillerot, E. Martinez, V. Thoréton, M. Martin, T. Baron, G. Lefevre, S. Cavalaglio, F. Bassani

J. Vac. Sci. Technol. B 43, 033204 (2025)

https://doi.org/10.1116/6.0004489

Published: May 2025

View articletitled, Study of zinc doped In0.53Ga0.47As/InP/InAlAs/InP heterostructures by time-of-flight; magnetic secondary ion spectrometry and high-energy x-ray photoelectron spectroscopy

Journal Articles

Low-temperature (<300 °C) crystalline Al₂O₃ thin film deposition by resistive thermal evaporation

Kunal Kumar, Marc Cahay

J. Vac. Sci. Technol. B 43, 032206 (2025)

https://doi.org/10.1116/6.0004424

Published: May 2025

View articletitled, Low-temperature (<300 °C) crystalline Al2O3 thin film deposition by resistive thermal evaporation

Journal Articles

Selective wet etching of atomic layer deposited ferroelectric hafnium zirconium oxide and hafnium oxide thin films

Rushi Jani, David MacMahon, Santosh K. Kurinec

J. Vac. Sci. Technol. B 43, 030602 (2025)

https://doi.org/10.1116/6.0004562

Published: April 2025

View articletitled, Selective wet etching of atomic layer deposited ferroelectric hafnium zirconium oxide and hafnium oxide thin films

Journal Articles

Side-by-side evaluation of the outgassing rate and ultimate pressure achieved inside tubes made of low-carbon and stainless steel

Aiman H. Al-Allaq, Md Abdullah Mamun, Matt Poelker, Abdelmageed Elmustafa

J. Vac. Sci. Technol. B 43, 034203 (2025)

https://doi.org/10.1116/6.0004446

Published: April 2025

View articletitled, Side-by-side evaluation of the outgassing rate and ultimate pressure achieved inside tubes made of low-carbon and stainless steel

Journal Articles

Compact vacuum setup for laser induced plasma etching with optical emission spectrum monitoring

Lukáš Šilhan, Jon Ander Arregi, Tomáš Plichta, Ondřej Vaculík, Jan Novotný, Mojmír Šerý

J. Vac. Sci. Technol. B 43, 034202 (2025)

https://doi.org/10.1116/6.0004296

Published: April 2025

View articletitled, Compact vacuum setup for laser induced plasma etching with optical emission spectrum monitoring

Journal Articles

Investigation of tilted etching of Si₃N₄ using CF₄/O₂ plasma: Process development and mechanism study

Zhihong Gao, Leyi Zhang, Yongzhi Fang, Dongyu Cen, Maoxiang Liu, Wenli Wu, Yan Ding

J. Vac. Sci. Technol. B 43, 032801 (2025)

https://doi.org/10.1116/6.0004412

Published: April 2025

View articletitled, Investigation of tilted etching of Si3N4 using CF4/O2 plasma: Process development and mechanism study

Journal Articles

Novel inspection technology for detecting via open using parallel e-beam scanning and graphic design system

Jaewon Hwang, Chihoon Lee, Kyu Lee, Younghun Kwon, Wonjo Woo, Seho Kim, Keunhyuk Yang, Youngwoon Yoon

J. Vac. Sci. Technol. B 43, 034001 (2025)

https://doi.org/10.1116/6.0004425

Published: April 2025

View articletitled, Novel inspection technology for detecting via open using parallel e-beam scanning and graphic design system

Journal Articles

Controlled preparation of tungsten diselenide thin films via chemical vapor deposition

Pingfan Ning, Xuerong Li, Feifei Lan, Xiangyu Li, Yingmin Wang, Hongjuan Cheng, Yujian Wang

J. Vac. Sci. Technol. B 43, 030601 (2025)

https://doi.org/10.1116/6.0004352

Published: April 2025

View articletitled, Controlled preparation of tungsten diselenide thin films via chemical vapor deposition

Journal Articles

Quantum efficiency characteristics of low-threading-dislocation-density InGaN photocathode grown on GaN substrate

Mikiya Idei, Daiki Sato, Atsushi Koizumi, Tomohiro Nishitani, Yoshio Honda, Hiroshi Amano

J. Vac. Sci. Technol. B 43, 032202 (2025)

https://doi.org/10.1116/6.0004199

Published: March 2025

View articletitled, Quantum efficiency characteristics of low-threading-dislocation-density InGaN photocathode grown on GaN substrate

Journal Articles

TiN and TaN cointegration for 300 mm superconducting back end of line

T. Chêne, R. Segaud, F. Nemouchi, P. Gergaud, S. Minoret, F. Gustavo, J. Garrione, T. Chevolleau

J. Vac. Sci. Technol. B 43, 022216 (2025)

https://doi.org/10.1116/6.0004316

Published: March 2025

View articletitled, TiN and TaN cointegration for 300 mm superconducting back end of line

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Compositionally graded Ba_1−xSr_xTiO₃ thin film for SIMS applications

Cryomicroscopy of low melting point metals

Effect of glow cleaning bias voltage on microstructure and properties of ion nitriding/multiarc ion plating CrTiAlN composite coatings

Effect of Ag layer thickness and annealing treatment on the transmittance and conductivity of transparent antennas fabricated using ITO/Ag/ITO structures

Method for monitoring high aspect ratio contact dry etching process using calibration and normalization method for optical emission spectroscopy

Resistivity improvement of flexible transparent conductive films with Cu inserted intermediate layer

Low-temperature Al_xGa_1−xN growth by combined electron cyclotron resonance sputtering and magnetron sputtering

KTaO₃(001) preparation methods in vacuum: Effects on surface stoichiometry, crystallography, and in-gap states

Real-time determination of sputtered TiC film composition using optical emission spectroscopy

Integration of in situ field-directed sputter sharpening in Scienta Omicron systems

Study of zinc doped In_0.53Ga_0.47As/InP/InAlAs/InP heterostructures by time-of-flight; magnetic secondary ion spectrometry and high-energy x-ray photoelectron spectroscopy

Low-temperature (<300 °C) crystalline Al₂O₃ thin film deposition by resistive thermal evaporation

Selective wet etching of atomic layer deposited ferroelectric hafnium zirconium oxide and hafnium oxide thin films

Side-by-side evaluation of the outgassing rate and ultimate pressure achieved inside tubes made of low-carbon and stainless steel

Compact vacuum setup for laser induced plasma etching with optical emission spectrum monitoring

Investigation of tilted etching of Si₃N₄ using CF₄/O₂ plasma: Process development and mechanism study

Novel inspection technology for detecting via open using parallel e-beam scanning and graphic design system

Controlled preparation of tungsten diselenide thin films via chemical vapor deposition

Quantum efficiency characteristics of low-threading-dislocation-density InGaN photocathode grown on GaN substrate

TiN and TaN cointegration for 300 mm superconducting back end of line

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