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Journal Articles
J. Vac. Sci. Technol. B 43, 044004 (2025)
Published: June 2025
Journal Articles
Effect of glow cleaning bias voltage on microstructure and properties of ion nitriding/multiarc ion plating CrTiAlN composite coatings
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J. Vac. Sci. Technol. B 43, 044002 (2025)
Published: June 2025
Journal Articles
Effect of Ag layer thickness and annealing treatment on the transmittance and conductivity of transparent antennas fabricated using ITO/Ag/ITO structures
J. Vac. Sci. Technol. B 43, 042204 (2025)
Published: June 2025
Journal Articles
Method for monitoring high aspect ratio contact dry etching process using calibration and normalization method for optical emission spectroscopy
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J. Vac. Sci. Technol. B 43, 044202 (2025)
Published: June 2025
Journal Articles
Resistivity improvement of flexible transparent conductive films with Cu inserted intermediate layer
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J. Vac. Sci. Technol. B 43, 042203 (2025)
Published: June 2025
Journal Articles
Low-temperature AlxGa1−xN growth by combined electron cyclotron resonance sputtering and magnetron sputtering
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J. Vac. Sci. Technol. B 43, 042202 (2025)
Published: June 2025
Journal Articles
Characteristics of inductively coupled plasma radio frequency ion sources in commercial ion implanters
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J. Vac. Sci. Technol. B 43, 044201 (2025)
Published: May 2025
Journal Articles
J. Vac. Sci. Technol. B 43, 034003 (2025)
Published: May 2025
Journal Articles
Real-time determination of sputtered TiC film composition using optical emission spectroscopy
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J. Vac. Sci. Technol. B 43, 034002 (2025)
Published: May 2025
Journal Articles
Integration of in situ field-directed sputter sharpening in Scienta Omicron systems
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J. Vac. Sci. Technol. B 43, 035001 (2025)
Published: May 2025
Journal Articles
Low-temperature (<300 °C) crystalline Al2O3 thin film deposition by resistive thermal evaporation
Open Access
J. Vac. Sci. Technol. B 43, 032206 (2025)
Published: May 2025
Journal Articles
Selective wet etching of atomic layer deposited ferroelectric hafnium zirconium oxide and hafnium oxide thin films
J. Vac. Sci. Technol. B 43, 030602 (2025)
Published: April 2025
Journal Articles
Side-by-side evaluation of the outgassing rate and ultimate pressure achieved inside tubes made of low-carbon and stainless steel
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J. Vac. Sci. Technol. B 43, 034203 (2025)
Published: April 2025
Journal Articles
J. Vac. Sci. Technol. B 43, 033001 (2025)
Published: April 2025
Journal Articles
Investigation of tilted etching of Si3N4 using CF4/O2 plasma: Process development and mechanism study
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J. Vac. Sci. Technol. B 43, 032801 (2025)
Published: April 2025
Journal Articles
Bias stability enhancement of metal/Al2O3/AlN/GaN capacitors by high-temperature plasma-enhanced atomic layer deposition of thin AlN interlayer
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J. Vac. Sci. Technol. B 43, 032205 (2025)
Published: April 2025
Journal Articles
Effect of quality improvement in active region on temperature characteristics of GaN-based ultraviolet laser diode
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J. Vac. Sci. Technol. B 43, 032204 (2025)
Published: April 2025
Journal Articles
Ultrathin tantalum films for Schottky contacts on 4H silicon carbide
Available to PurchaseRenato M. Beraldo, Rodrigo R. César, Melissa Mederos, Jacilene M. Medeiros, Andrei Alaferdov, Érick A. Santos, Ednan Joanni, Thebano E. A. Santos, Ricardo C. Teixeira, Marcos V. Puydinger dos Santos, Renato A. Minamisawa, José Alexandre Diniz
J. Vac. Sci. Technol. B 43, 033202 (2025)
Published: April 2025
Journal Articles
Controlled preparation of tungsten diselenide thin films via chemical vapor deposition
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J. Vac. Sci. Technol. B 43, 030601 (2025)
Published: April 2025
Journal Articles
Synergistic regulation of device performance by structural parameters of vertical side-gate type vacuum channel field emission transistor
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J. Vac. Sci. Technol. B 43, 033201 (2025)
Published: March 2025
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