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Journal Articles

Kinetics model for thermal selective etching of Si1−xGex in F2/Ar

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Yi Chen, Daniel Cho, John Hoang, Nicholas Altieri, Ji Zhu, Samantha Tan, Jane P. Chang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 042604 (2025)
https://doi.org/10.1116/6.0004634
Published: June 2025
View articletitled, Kinetics model for thermal selective etching of Si1−xGex in F2/Ar
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Journal Articles

Isothermal-oxidation behavior of vacuum-clad CrNiFeMoCo high-entropy alloy coating at 600–800 °C

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Fang Xie, Changsheng Zhai, Guangyu Cai, Altas Emre, Xi Zhang, Hongxing Zheng, Xin Zhang, Sainan Jiang, Xingchao Li, Feifei Wu, Xijin Hua
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043108 (2025)
https://doi.org/10.1116/6.0004648
Published: June 2025
View articletitled, Isothermal-oxidation behavior of vacuum-clad CrNiFeMoCo high-entropy alloy coating at 600–800 °C
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Journal Articles

Infinite selectivity in dry etching process for high-aspect-ratio hole using C7HF7 gas plasma

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Junji Kataoka, Norikatsu Sasao, Koji Asakawa, Shuichi Kuboi, Daiki Iino, Kazuaki Kurihara, Hiroyuki Fukumizu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043008 (2025)
https://doi.org/10.1116/6.0004582
Published: June 2025
View articletitled, Infinite selectivity in dry etching process for high-aspect-ratio hole using C7HF7 gas plasma
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Journal Articles

Characterization of H2 plasma within RF-powered hollow cathode discharge equipped with hybrid multicusp magnetic field under varying inner-ring magnetic strength

Open Access
Md Hasibul Islam, Yasunori Ohtsu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043007 (2025)
https://doi.org/10.1116/6.0004690
Published: June 2025
View articletitled, Characterization of H2 plasma within RF-powered hollow cathode discharge equipped with hybrid multicusp magnetic field under varying inner-ring magnetic strength
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Journal Articles

On the way to more sustainability: Development of five Al0.25Ga0.75N atomic layer etching modes for shorter cycle times

Open Access
Christian Miersch, Sarah Seidel, Friedrich Roth, Johannes Heitmann, Franziska C. Beyer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 042603 (2025)
https://doi.org/10.1116/6.0004593
Published: June 2025
View articletitled, On the way to more sustainability: Development of five Al0.25Ga0.75N atomic layer etching modes for shorter cycle times
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Journal Articles

Effects of laser melting and surface texture on the frictional performance of medical Co–Cr–Mo alloy

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Changlong Zhao, Zice Yu, Zihao Zhang, Weilong Du, Yuyang Bai, Tianle Zhang, Lin Ma, Xiaoyu Jia
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043207 (2025)
https://doi.org/10.1116/6.0004668
Published: June 2025
View articletitled, Effects of laser melting and surface texture on the frictional performance of medical Co–Cr–Mo alloy
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Journal Articles

Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning

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Jianming Guo, Zhiping Mou, Kun Ren, Dong Ni, Dawei Gao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043005 (2025)
https://doi.org/10.1116/6.0004669
Published: June 2025
View articletitled, Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning
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Journal Articles

Study on the modification of TC11 titanium alloy microarc oxidized film layer by ZrO2 particles

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Jia Xu, Cenyi Wang, Xing Yan, Hao Li, Jiayao Liu, Mei Yang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043106 (2025)
https://doi.org/10.1116/6.0004581
Published: June 2025
View articletitled, Study on the modification of TC11 titanium alloy microarc oxidized film layer by ZrO2 particles
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Journal Articles

Growth and properties of Sn-doped sol-gel Ga2O3 thin films

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Kate M. Wislang, Rodrigo Martinez-Gazoni, Roger J. Reeves, Martin W. Allen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043410 (2025)
https://doi.org/10.1116/6.0004540
Published: June 2025
View articletitled, Growth and properties of Sn-doped sol-gel Ga2O3 thin films
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Journal Articles

Etching characteristics of tungsten and tungsten compounds by energetic fluorocarbon and argon ions

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Hojun Kang, Shunta Kawabata, Tomoko Ito, Song-Yun Kang, Dongkyu Lee, Yuna Lee, Kazuhiro Karahashi, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043004 (2025)
https://doi.org/10.1116/6.0004658
Published: June 2025
View articletitled, Etching characteristics of tungsten and tungsten compounds by energetic fluorocarbon and argon ions
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Journal Articles

Rules of triplet state electron impact neutral dissociation in plasma from molecular dynamics simulations and an electrophore model

Open Access
Ryan Brook, Oliver Bramley, Dmitry V. Makhov, Anna Nelson, Gregory Armstrong, Joseph Yong, Ezri Saunders, Johnny de Viggiani, Jonathan Tennyson, Dmitrii V. Shalashilin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043003 (2025)
https://doi.org/10.1116/6.0004454
Published: May 2025
View articletitled, Rules of triplet state electron impact neutral dissociation in plasma from molecular dynamics simulations and an electrophore model
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Journal Articles

High surface quality Y2SiO5 silicate-crystal waveguides etched by chlorine-based inductive coupled plasma reactive ion etching

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A. Talneau, M. Chan, F. Laourine, F. Maillard, S. Welinski, P. Berger, A. Ferrier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043002 (2025)
https://doi.org/10.1116/6.0004314
Published: May 2025
View articletitled, High surface quality Y2SiO5 silicate-crystal waveguides etched by chlorine-based inductive coupled plasma reactive ion etching
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Journal Articles

Effect of reactive ion etching on the photoluminescence intensity of nitrogen-vacancy color centers in microwave plasma chemical vapor deposition diamond films

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Yuan Liu, Feng Xu, Chenxukun Lou, Yue Yan, Xianqing Shi, Wenxuan Zhao, Wang Ma, Hailong Zhang, Dunwen Zuo
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043403 (2025)
https://doi.org/10.1116/6.0004405
Published: May 2025
View articletitled, Effect of reactive ion etching on the photoluminescence intensity of nitrogen-vacancy color centers in microwave plasma chemical vapor deposition diamond films
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Journal Articles

In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma

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Terrick McNealy-James, Ruthlyn Mangroo, S. Novia Berriel, Luis Tomar, Eric Bissell, Taylor M. Currie, Justin Moore, Titel Jurca, Parag Banerjee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 042602 (2025)
https://doi.org/10.1116/6.0004417
Published: May 2025
View articletitled, In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma
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Journal Articles

Surface effects in quasiatomic layer etching of silicon

Open Access
Oscar Danielsson, Amin Karimi, Yoana Ilarionova, Jørgen Garnæs, Sabbir A. Khan, Ivan Maximov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 042601 (2025)
https://doi.org/10.1116/6.0004257
Published: May 2025
View articletitled, Surface effects in quasiatomic layer etching of silicon
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Journal Articles

Precise control of ion energy distributions by high frequency pulsed voltage waveforms in inductively coupled plasmas

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Gang Wei, Dongyu Li, Jinrong Zhao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043001 (2025)
https://doi.org/10.1116/6.0004572
Published: May 2025
View articletitled, Precise control of ion energy distributions by high frequency pulsed voltage waveforms in inductively coupled plasmas
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Journal Articles

Atomic layer deposition of entropy stabilized Zr2Ta2O9 and light activated self-rectifying resistive switching

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Shane M. W. Witsell, Konner E. K. Holden, Dustin Z. Austin, John F. Conley, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 042402 (2025)
https://doi.org/10.1116/6.0004512
Published: May 2025
View articletitled, Atomic layer deposition of entropy stabilized Zr2Ta2O9 and light activated self-rectifying resistive switching
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Journal Articles

Compatibility of molten plutonium with wrought and additively manufactured metal crucibles

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Michelle M. Greenough, Alexander E. Wilson-Heid, R. Joey Griffiths, Donya R. Servando-Williams, Ryan M. Kissinger, W. Preston Cole, Debra L. Rosas, Andrew J. Swift, Jason E. Schnackenberg, Tien T. Roehling, Aiden A. Martin, Kiel S. Holliday, Jason R. Jeffries
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043101 (2025)
https://doi.org/10.1116/6.0004524
Published: May 2025
View articletitled, Compatibility of molten plutonium with wrought and additively manufactured metal crucibles
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Journal Articles

Thermal annealing and radiation effects on structural and electrical properties of NbN/GaN superconductor/semiconductor junction

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Stephen Margiotta, Binzhi Liu, Saleh Ahmed Khan, Gabriel Calderon Ortiz, Ahmed Ibreljic, Jinwoo Hwang, A. F. M. Anhar Uddin Bhuiyan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 042701 (2025)
https://doi.org/10.1116/6.0004539
Published: May 2025
View articletitled, Thermal annealing and radiation effects on structural and electrical properties of NbN/GaN superconductor/semiconductor junction
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Journal Articles

Plasma enhanced atomic layer deposition of silicon nitride and silicon carbonitride using a single source precursor and different plasmas

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Samuel M. Johnson, Jianping Zhao, Tsung-Hsuan Yang, Toshihiko Iwao, Charles Schlechte, John Carroll, Gabriel Blankemeyer, Peter L. G. Ventzek, Joaquin Resasco, Gyeong S. Hwang, John G. Ekerdt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032409 (2025)
https://doi.org/10.1116/6.0004510
Published: May 2025
View articletitled, Plasma enhanced atomic layer deposition of silicon nitride and silicon carbonitride using a single source precursor and different plasmas
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