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Journal Articles
Kinetics model for thermal selective etching of Si1−xGex in F2/Ar
Available to Purchase
J. Vac. Sci. Technol. A 43, 042604 (2025)
Published: June 2025
Journal Articles
Isothermal-oxidation behavior of vacuum-clad CrNiFeMoCo high-entropy alloy coating at 600–800 °C
Available to PurchaseFang Xie, Changsheng Zhai, Guangyu Cai, Altas Emre, Xi Zhang, Hongxing Zheng, Xin Zhang, Sainan Jiang, Xingchao Li, Feifei Wu, Xijin Hua
J. Vac. Sci. Technol. A 43, 043108 (2025)
Published: June 2025
Journal Articles
Infinite selectivity in dry etching process for high-aspect-ratio hole using C7HF7 gas plasma
Junji Kataoka, Norikatsu Sasao, Koji Asakawa, Shuichi Kuboi, Daiki Iino, Kazuaki Kurihara, Hiroyuki Fukumizu
J. Vac. Sci. Technol. A 43, 043008 (2025)
Published: June 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 043007 (2025)
Published: June 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 042603 (2025)
Published: June 2025
Journal Articles
Effects of laser melting and surface texture on the frictional performance of medical Co–Cr–Mo alloy
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J. Vac. Sci. Technol. A 43, 043207 (2025)
Published: June 2025
Journal Articles
Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning
J. Vac. Sci. Technol. A 43, 043005 (2025)
Published: June 2025
Journal Articles
Study on the modification of TC11 titanium alloy microarc oxidized film layer by ZrO2 particles
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J. Vac. Sci. Technol. A 43, 043106 (2025)
Published: June 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 043410 (2025)
Published: June 2025
Journal Articles
Etching characteristics of tungsten and tungsten compounds by energetic fluorocarbon and argon ions
Available to PurchaseHojun Kang, Shunta Kawabata, Tomoko Ito, Song-Yun Kang, Dongkyu Lee, Yuna Lee, Kazuhiro Karahashi, Satoshi Hamaguchi
J. Vac. Sci. Technol. A 43, 043004 (2025)
Published: June 2025
Journal Articles
Ryan Brook, Oliver Bramley, Dmitry V. Makhov, Anna Nelson, Gregory Armstrong, Joseph Yong, Ezri Saunders, Johnny de Viggiani, Jonathan Tennyson, Dmitrii V. Shalashilin
J. Vac. Sci. Technol. A 43, 043003 (2025)
Published: May 2025
Journal Articles
High surface quality Y2SiO5 silicate-crystal waveguides etched by chlorine-based inductive coupled plasma reactive ion etching
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J. Vac. Sci. Technol. A 43, 043002 (2025)
Published: May 2025
Journal Articles
Effect of reactive ion etching on the photoluminescence intensity of nitrogen-vacancy color centers in microwave plasma chemical vapor deposition diamond films
Available to PurchaseYuan Liu, Feng Xu, Chenxukun Lou, Yue Yan, Xianqing Shi, Wenxuan Zhao, Wang Ma, Hailong Zhang, Dunwen Zuo
J. Vac. Sci. Technol. A 43, 043403 (2025)
Published: May 2025
Journal Articles
In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma
Terrick McNealy-James, Ruthlyn Mangroo, S. Novia Berriel, Luis Tomar, Eric Bissell, Taylor M. Currie, Justin Moore, Titel Jurca, Parag Banerjee
J. Vac. Sci. Technol. A 43, 042602 (2025)
Published: May 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 042601 (2025)
Published: May 2025
Journal Articles
Precise control of ion energy distributions by high frequency pulsed voltage waveforms in inductively coupled plasmas
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J. Vac. Sci. Technol. A 43, 043001 (2025)
Published: May 2025
Journal Articles
Atomic layer deposition of entropy stabilized Zr2Ta2O9 and light activated self-rectifying resistive switching
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J. Vac. Sci. Technol. A 43, 042402 (2025)
Published: May 2025
Journal Articles
Compatibility of molten plutonium with wrought and additively manufactured metal crucibles
Available to PurchaseMichelle M. Greenough, Alexander E. Wilson-Heid, R. Joey Griffiths, Donya R. Servando-Williams, Ryan M. Kissinger, W. Preston Cole, Debra L. Rosas, Andrew J. Swift, Jason E. Schnackenberg, Tien T. Roehling, Aiden A. Martin, Kiel S. Holliday, Jason R. Jeffries
J. Vac. Sci. Technol. A 43, 043101 (2025)
Published: May 2025
Journal Articles
Thermal annealing and radiation effects on structural and electrical properties of NbN/GaN superconductor/semiconductor junction
Available to PurchaseStephen Margiotta, Binzhi Liu, Saleh Ahmed Khan, Gabriel Calderon Ortiz, Ahmed Ibreljic, Jinwoo Hwang, A. F. M. Anhar Uddin Bhuiyan
J. Vac. Sci. Technol. A 43, 042701 (2025)
Published: May 2025
Journal Articles
Plasma enhanced atomic layer deposition of silicon nitride and silicon carbonitride using a single source precursor and different plasmas
Available to PurchaseSamuel M. Johnson, Jianping Zhao, Tsung-Hsuan Yang, Toshihiko Iwao, Charles Schlechte, John Carroll, Gabriel Blankemeyer, Peter L. G. Ventzek, Joaquin Resasco, Gyeong S. Hwang, John G. Ekerdt
J. Vac. Sci. Technol. A 43, 032409 (2025)
Published: May 2025
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