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Journal Articles

Influence of helium bubbles on the bulk equation of state of gold under static compression

Jason R. Jeffries, Philip C. Myint, Jesse S. Smith, Mark A. Wall, Bruce Baer, Christine J. Wu, Scott Tumey
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033205 (2025)
https://doi.org/10.1116/6.0004471
Published: March 2025
View article titled, Influence of helium bubbles on the bulk equation of state of gold under static compression
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Journal Articles

Atomic layer deposited aluminum nitride for interface protection of lithium germanium thiophosphate solid electrolytes

Sam Klueter, Yang Wang, Elias Kallon, Aidan Knab, Daniela Fontecha, Cholho Lee, Gary W. Rubloff, Sang Bok Lee, Alexander C. Kozen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032404 (2025)
https://doi.org/10.1116/6.0004419
Published: March 2025
View article titled, Atomic layer deposited aluminum nitride for interface protection of lithium germanium thiophosphate solid electrolytes
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Journal Articles

Comparison study on C–Cr and a-C coatings on titanium plates for PEMFCs applications via midfrequency magnetron sputtering

Hanzhuo He, Song Li, Saiqiang Wang, De Ning, Ming Ma, Jiao Yang, Zhi Long, Dongfeng Xue, Chunlei Yang, Weimin Li
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033101 (2025)
https://doi.org/10.1116/6.0004271
Published: March 2025
View article titled, Comparison study on C–Cr and a-C coatings on titanium plates for PEMFCs applications via midfrequency magnetron sputtering
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Journal Articles

On simulating thin-film processes at the atomic scale using machine-learned force fields

Editor’s Pick
S. Kondati Natarajan, J. Schneider, N. Pandey, J. Wellendorff, S. Smidstrup
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033404 (2025)
https://doi.org/10.1116/6.0004288
Published: March 2025
View article titled, On simulating thin-film processes at the atomic scale using machine-learned force fields
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Journal Articles

Research on the difference in etching rates of SiO2 at the top and bottom of high-aspect-ratio trench in C4F8/Ar/O2 plasma etching

Leyi Zhang, Zhihong Gao, Yongzhi Fang, Dongyu Cen, Maoxiang Liu, Yan Zhang, Chunxia Ma, Enhao Zhao, Wencan Zhu, Wenli Wu, Xudong Wei
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033003 (2025)
https://doi.org/10.1116/6.0004402
Published: March 2025
View article titled, Research on the difference in etching rates of SiO<sub>2</sub> at the top and bottom of high-aspect-ratio trench in C<sub>4</sub>F<sub>8</sub>/Ar/O<sub>2</sub> plasma etching
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Journal Articles

Trap states and hydrogenation of implanted Si in semi-insulating Ga2O3(Fe)

Editor’s Pick
A. Y. Polyakov, I. V. Schemerov, A. A. Vasilev, A. A. Romanov, P. B. Lagov, A. V. Miakonkikh, A. V. Chernykh, E. P. Romanteeva, S. V. Chernykh, O. I. Rabinovich, S. J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033403 (2025)
https://doi.org/10.1116/6.0004463
Published: March 2025
View article titled, Trap states and hydrogenation of implanted Si in semi-insulating Ga<sub>2</sub>O<sub>3</sub>(Fe)
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Journal Articles

Study of microstructure and mechanical properties of cBN coatings on nanocrystalline diamond transition layer prepared by magnetron sputtering

Shunxin Liu, Shuai Tian, Kaishan Nie, Zhengyi Zhang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033402 (2025)
https://doi.org/10.1116/6.0004340
Published: March 2025
View article titled, Study of microstructure and mechanical properties of cBN coatings on nanocrystalline diamond transition layer prepared by magnetron sputtering
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Journal Articles

X-ray photoelectron spectroscopy investigation of chemical changes to nickel oxide and iron–nickel oxide surfaces caused by monoatomic argon ion and gas cluster ion beam sputtering

Michael C. Burrell, Caleb Hustedt, Robert A. Morris
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033202 (2025)
https://doi.org/10.1116/6.0004377
Published: March 2025
View article titled, X-ray photoelectron spectroscopy investigation of chemical changes to nickel oxide and iron–nickel oxide surfaces caused by monoatomic argon ion and gas cluster ion beam sputtering
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Journal Articles

MgF2-based conformal antireflection coatings on highly curved lenses by atomic layer deposition

Yuma Sugai, Hironori Sugata, Takuya Sugawara, Safdar Muhammad, Parmish Kaur, Jani Hämäläinen, Nina Lamminmäki, Juhana Kostamo
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032403 (2025)
https://doi.org/10.1116/6.0004251
Published: March 2025
View article titled, MgF<sub>2</sub>-based conformal antireflection coatings on highly curved lenses by atomic layer deposition
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Journal Articles

Molybdenum carbonitride Schottky contacts prepared by thermal atomic layer deposition on gallium nitride

Jacob W. Clark, Chan-Wen Chiu, Bangzhi Liu, Thomas J. Larrabee, Sr., Nathan S. Banner, Nicholas D. Redwing, Jennifer Gray, Suzanne E. Mohney
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032402 (2025)
https://doi.org/10.1116/6.0004241
Published: March 2025
View article titled, Molybdenum carbonitride Schottky contacts prepared by thermal atomic layer deposition on gallium nitride
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Journal Articles

Recent trends in thermal atomic layer deposition chemistry

Featured
Georgi Popov, Miika Mattinen, Anton Vihervaara, Markku Leskelä
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 030801 (2025)
https://doi.org/10.1116/6.0004320
Published: March 2025
View article titled, Recent trends in thermal atomic layer deposition chemistry
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Journal Articles

Improvement of data analytics techniques in reflection high-energy electron diffraction to enable machine learning

Editor’s Pick
Patrick T. Gemperline, Rajendra Paudel, Rama K. Vasudevan, Ryan B. Comes
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032701 (2025)
https://doi.org/10.1116/6.0004400
Published: March 2025
View article titled, Improvement of data analytics techniques in reflection high-energy electron diffraction to enable machine learning
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Journal Articles

SiO2 atomic-layer fluorination-passivation for dual-material molybdenum/polypyrrole area-selective deposition and strategies for surface reactivation

Editor’s Pick
Hwan Oh, Hyuenwoo Yang, Nicholas M. Carroll, Yujin Jang, Gregory N. Parsons
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032401 (2025)
https://doi.org/10.1116/6.0004298
Published: March 2025
View article titled, SiO<sub>2</sub> atomic-layer fluorination-passivation for dual-material molybdenum/polypyrrole area-selective deposition and strategies for surface reactivation
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Journal Articles

Effect of phase transition on structural, dielectric, and electrical properties of pulsed laser deposited Y doped high-k HfO2 thin films

Mangla Nand, P. S. Padhi, Shilpa Tripathi, Yogesh Kumar, Pabitra Sahu, Manvendra Kumar, Anit Dawar, Sunil Ojha, Pankaj Misra, Himanshu Srivastava, S. K. Rai
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023411 (2025)
https://doi.org/10.1116/6.0004269
Published: March 2025
View article titled, Effect of phase transition on structural, dielectric, and electrical properties of pulsed laser deposited Y doped high-k HfO<sub>2</sub> thin films
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Journal Articles

Spatial atomic layer deposition: Transport-reaction modeling and experimental validation of film geometry

Editor’s Pick
Daniel Penley, Neil P. Dasgupta
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 022415 (2025)
https://doi.org/10.1116/6.0004367
Published: March 2025
View article titled, Spatial atomic layer deposition: Transport-reaction modeling and experimental validation of film geometry
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Journal Articles

Development of single-chamber deposition equipment for organic/inorganic nanohybrid composite material

Kyungmin Yoo, Youngchan Kim, Seo Kyung Park, Sungho Park, Je Seung Lee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 022413 (2025)
https://doi.org/10.1116/6.0004213
Published: March 2025
View article titled, Development of single-chamber deposition equipment for organic/inorganic nanohybrid composite material
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Journal Articles

Role of a cyclopentadienyl ligand in Hf precursors using H2O or O3 as oxidant in atomic layer deposition

Editor’s Pick
Youngmin Song, Hui-Jin Kim, Soo Hyun Lee, Sujin Kwon, Bonggeun Shong, Il-Kwon Oh
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 022414 (2025)
https://doi.org/10.1116/6.0004358
Published: March 2025
View article titled, Role of a cyclopentadienyl ligand in Hf precursors using H<sub>2</sub>O or O<sub>3</sub> as oxidant in atomic layer deposition
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Journal Articles

Investigation on properties of the TiSiN/TiSi-diamondlike carbon multilayer coatings prepared by hybrid deposition technique

Menghui Chen, Mai Yang, Tao Huang, Yibing Su, Yuzhe Han, Qizhong Li, Meijun Yang, Song Zhang, Takashi Goto, Rong Tu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023107 (2025)
https://doi.org/10.1116/6.0004356
Published: March 2025
View article titled, Investigation on properties of the TiSiN/TiSi-diamondlike carbon multilayer coatings prepared by hybrid deposition technique
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Journal Articles

Structural, electrical, and thermal characterization of homoepitaxial close-injection showerhead metalorganic chemical vapor deposition β-Ga2O3 enhancement-mode recessed-gate MOSFETs

Hannah N. Masten, Gustavo Armando Alvarez, Corey Halverson, Joyce Christiansen-Salameh, Eugene Y. Kwon, Michael Liao, James Spencer Lundh, Audrey Rose Gutierrez, Fikadu Alema, Andrei Osinsky, Alan G. Jacobs, Mark S. Goorsky, Marc H. Weber, Zhiting Tian, Karl D. Hobart, Marko J. Tadjer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 022703 (2025)
https://doi.org/10.1116/6.0004176
Published: February 2025
View article titled, Structural, electrical, and thermal characterization of homoepitaxial close-injection showerhead metalorganic chemical vapor deposition β-Ga<sub>2</sub>O<sub>3</sub> enhancement-mode recessed-gate MOSFETs
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Journal Articles

Low-temperature ALD of metallic cobalt using the CoCOhept precursor: Simulation-assisted process development for deposition on temperature sensitive 3D-structures

Editor’s Pick
Mathias Franz, Linda Jäckel, Xiao Hu, Lysann Kaßner, Camilla Thurm, Dirk Rittrich, Christian Helke, Jörg Schuster, Marcus Daniel, Frank Stahr, Natalia Rüffer, Robert Kretschmer, Stefan E. Schulz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 022412 (2025)
https://doi.org/10.1116/6.0004248
Published: February 2025
View article titled, Low-temperature ALD of metallic cobalt using the CoCOhept precursor: Simulation-assisted process development for deposition on temperature sensitive 3D-structures
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