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Angular resolved X-ray photoelectron spectroscopy
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Journal Articles

Indium and gallium diffusion through zirconia in the TiN/ZrO2/InGaAs stack

O. Ceballos-Sanchez, E. Martinez, C. Guedj, M. Veillerot, A. Herrera-Gomez
Journal: Applied Physics Letters
Appl. Phys. Lett. 106, 221602 (2015)
https://doi.org/10.1063/1.4921963
Published: June 2015
View article titled, Indium and gallium diffusion through zirconia in the TiN/ZrO<sub>2</sub>/InGaAs stack
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Journal Articles

Evidence of a reduction reaction of oxidized iron/cobalt by boron atoms diffused toward naturally oxidized surface of CoFeB layer during annealing

Soshi Sato, Hiroaki Honjo, Shoji Ikeda, Hideo Ohno, Tetsuo Endoh, Masaaki Niwa
Journal: Applied Physics Letters
Appl. Phys. Lett. 106, 142407 (2015)
https://doi.org/10.1063/1.4917277
Published: April 2015
View article titled, Evidence of a reduction reaction of oxidized iron/cobalt by boron atoms diffused toward naturally oxidized surface of CoFeB layer during annealing
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Journal Articles

Band alignment of HfO2/In0.18Al0.82N determined by angle-resolved x-ray photoelectron spectroscopy

Man Hon Samuel Owen, Maruf Amin Bhuiyan, Zheng Zhang, Ji Sheng Pan, Eng Soon Tok, Yee-Chia Yeo
Journal: Applied Physics Letters
Appl. Phys. Lett. 105, 031602 (2014)
https://doi.org/10.1063/1.4891195
Published: July 2014
View article titled, Band alignment of HfO<sub>2</sub>/In<sub>0.18</sub>Al<sub>0.82</sub>N determined by angle-resolved x-ray photoelectron spectroscopy
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Journal Articles

Indium diffusion through high-k dielectrics in high-k/InP stacks

H. Dong, W. Cabrera, R. V. Galatage, Santosh KC, B. Brennan, X. Qin, S. McDonnell, D. Zhernokletov, C. L. Hinkle, K. Cho, Y. J. Chabal, R. M. Wallace
Journal: Applied Physics Letters
Appl. Phys. Lett. 103, 061601 (2013)
https://doi.org/10.1063/1.4817932
Published: August 2013
View article titled, Indium diffusion through high-k dielectrics in high-k/InP stacks
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Journal Articles

Low temperature germanium to silicon direct wafer bonding using free radical exposure

Ki Yeol Byun, Isabelle Ferain, Pete Fleming, Michael Morris, Mark Goorsky, Cindy Colinge
Journal: Applied Physics Letters
Appl. Phys. Lett. 96, 102110 (2010)
https://doi.org/10.1063/1.3360201
Published: March 2010
View article titled, Low temperature germanium to silicon direct wafer bonding using free radical exposure
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Journal Articles

Indium stability on InGaAs during atomic H surface cleaning

F. S. Aguirre-Tostado, M. Milojevic, C. L. Hinkle, E. M. Vogel, R. M. Wallace, S. McDonnell, G. J. Hughes
Journal: Applied Physics Letters
Appl. Phys. Lett. 92, 171906 (2008)
https://doi.org/10.1063/1.2919047
Published: April 2008
View article titled, Indium stability on InGaAs during atomic H surface cleaning
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Journal Articles

Influence of elastic scattering of photoelectrons on angle-resolved x-ray photoelectron spectroscopy

Kenji Kimura, Kaoru Nakajima, Thierry Conard, Wilfried Vandervorst
Journal: Applied Physics Letters
Appl. Phys. Lett. 91, 104106 (2007)
https://doi.org/10.1063/1.2772769
Published: September 2007
View article titled, Influence of elastic scattering of photoelectrons on angle-resolved x-ray photoelectron spectroscopy
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Journal Articles

Depth profiling of dielectric Sr Ti O 3 thin films by angle-resolved x-ray photoelectron spectroscopy

S. Bhaskar, Dan Allgeyer, John A. Smythe, III
Journal: Applied Physics Letters
Appl. Phys. Lett. 89, 254103 (2006)
https://doi.org/10.1063/1.2410232
Published: December 2006
View article titled, Depth profiling of dielectric Sr Ti O 3 thin films by angle-resolved x-ray photoelectron spectroscopy
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Journal Articles

Graphitic features on SiC surface following oxidation and etching using surface enhanced Raman spectroscopy

Weijie Lu, L. C. Feldman, Y. Song, S. Dhar, W. E. Collins, W. C. Mitchel, J. R. Williams
Journal: Applied Physics Letters
Appl. Phys. Lett. 85, 3495–3497 (2004)
https://doi.org/10.1063/1.1804610
Published: October 2004
View article titled, Graphitic features on SiC surface following oxidation and etching using surface enhanced Raman spectroscopy
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