Boron pile-up at the interface between plasma enhanced chemical vapor deposited TiSi2 film and BF2-doped Si | Citedby Results | Applied Physics Letters | AIP Publishing

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Boron pile-up at the interface between plasma enhanced chemical vapor deposited ${TiSi}_{2}$ film and ${BF}_{2}$ -doped Si

Appl. Phys. Lett. 83, 494–496 (2003)

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