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Ultrawide Bandgap Semiconductors

Research in ultra-wide-bandgap (UWBG) semiconductor materials and devices continues to progress rapidly, providing new and exciting research opportunities for a wide range of electronic, optical, sensing and quantum applications. Materials with bandgaps exceeding that of gallium nitride (3.4 eV) and silicon carbide (3.3 eV), such as gallium oxide (aluminum gallium oxide), diamond, cubic-boron nitride and aluminum gallium nitride are at the frontier of semiconductor materials research and device physics.

Guest Editors: Masataka Higashiwaki, Robert Kaplar, Julien Pernot, and Hongping Zhao

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Masataka Higashiwaki; Robert Kaplar; Julien Pernot; Hongping Zhao
V. R. Saran Kumar Chaganti; Prafful Golani; Tristan K. Truttmann; Fengdeng Liu; Bharat Jalan; Steven J. Koester
Kentaro Kaneko; Yasuhisa Masuda; Shin-ichi Kan; Isao Takahashi; Yuji Kato; Takashi Shinohe; Shizuo Fujita
Anil Kumar Rajapitamahuni; Laxman Raju Thoutam; Praneeth Ranga; Sriram Krishnamoorthy; Bharat Jalan
Tsung-Han Yang; Jesse Brown; Kai Fu; Jingan Zhou; Kevin Hatch; Chen Yang; Jossue Montes; Xin Qi; Houqiang Fu; Robert J. Nemanich; Yuji Zhao
L. Mehmel; R. Issaoui; O. Brinza; A. Tallaire; V. Mille; J. Delchevalrie; S. Saada; J. C. Arnault; F. Bénédic; J. Achard
Matthew Hilfiker; Rafał Korlacki; Riena Jinno; Yongjin Cho; Huili Grace Xing; Debdeep Jena; Ufuk Kilic; Megan Stokey; Mathias Schubert
Ashish Kumar; Saurabh Singh; Bhera Ram Tak; Ashutosh Patel; K. Asokan; D. Kanjilal
Y. Hou; H. Liang; A. Tang; X. Du; Z. Mei
D. Araujo; F. Lloret; G. Alba; M. P. Alegre; M. P. Villar
Minghui Zhang; Wei Wang; Genqiang Chen; Haris Naeem Abbasi; Fang Lin; Feng Wen; Kaiyue Wang; Jingwen Zhang; Renan Bu; Hongxing Wang
Verdad C. Agulto; Kazuhiro Toya; Thanh Nhat Khoa Phan; Valynn Katrine Mag-usara; Jiajun Li; Melvin John F. Empizo; Toshiyuki Iwamoto; Ken Goto; Hisashi Murakami; Yoshinao Kumagai; Nobuhiko Sarukura; Masashi Yoshimura; Makoto Nakajima
Yuji Hatano; Jaewon Shin; Daisuke Nishitani; Haruki Iwatsuka; Yuta Masuyama; Hiroki Sugiyama; Makoto Ishii; Shinobu Onoda; Takeshi Ohshima; Keigo Arai; Takayuki Iwasaki; Mutsuko Hatano
Che-Hao Liao; Kuang-Hui Li; Carlos G. Torres-Castanedo; Guozheng Zhang; Xiaohang Li
Ankit Sharma; Uttam Singisetti
F. Lloret; D. Eon; E. Bustarret; F. Donatini; D. Araujo
Holger Fiedler; Jérôme Leveneur; David R. G. Mitchell; Subramaniam Arulkumaran; Geok Ing Ng; Arokiaswami Alphones; John Kennedy
Man Hoi Wong; Hisashi Murakami; Yoshinao Kumagai; Masataka Higashiwaki
Takanori Hanada; Shinya Ohmagari; Junichi H. Kaneko; Hitoshi Umezawa
C. De Santi; M. Fregolent; M. Buffolo; M. H. Wong; M. Higashiwaki; G. Meneghesso; E. Zanoni; M. Meneghini
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