Skip to Main Content
Skip Nav Destination

Diamond deposition using a planar radio frequency inductively coupled plasma

Appl. Phys. Lett. 66, 3579–3581 (1995)
This article has been cited by the following articles in journals that are participating in CrossRef Cited-by Linking.
  • Th. Wegner
  • C. Küllig
  • J. Meichsner
Physics of Plasmas (2016) 23 (2)
  • Th. Wegner
  • C. Küllig
  • J. Meichsner
Contributions to Plasma Physics 55, 728 (2015)
  • Th Wegner
  • C Küllig
  • J Meichsner
Plasma Sources Science and Technology 24, 044001 (2015)
  • Katsuyuki Okada
Science and Technology of Advanced Materials 8, 624 (2007)
  • Y.X. Han
  • M. Zhao
  • J. Sun
  • H. Ling
  • T. Gebre
  • Y.F. Lu
Applied Surface Science 254, 1423 (2007)
  • Su Liu
  • Erqing Xie
  • Jianwei Sun
  • Changchun Ning
  • Yanfeng Jiang
Materials Letters 57, 1662 (2003)
  • Katsuyuki Okada
  • Hisao Kanda
  • Shojiro Komatsu
  • Seiichiro Matsumoto
Journal of Applied Physics 88, 1674 (2000)
  • Lingling Wu
  • Brian C Holloway
  • D.Prasad Beesabathina
  • Carol Kalil
  • Dennis M Manos
Surface and Coatings Technology 130, 207 (2000)
  • Seiichiro Matsumoto
Thin Solid Films 368, 231 (2000)
  • Katsuyuki Okada
  • Shojiro Komatsu
  • Seiichiro Matsumoto
Journal of Materials Research 14, 578 (1999)
  • Mineo Hiramatsu
  • Hideyuki Noda
  • Hisao Nagai
  • Masao Shimakura
  • Masahito Nawata
Thin Solid Films 332, 136 (1998)
  • Peter Awakowicz
  • Roland Schwefel
  • Manfred Werder
  • Wolfgang Kasper
Surface and Coatings Technology 98, 1020 (1998)
  • Peter Awakowicz
  • Roland Schwefel
  • Manfred Werder
  • Wolfgang Kasper
Diamond and Related Materials 6, 1816 (1997)
  • L. Wartski
  • C. Schwebel
  • J. Aubert
Review of Scientific Instruments 67, 895 (1996)
Close Modal

or Create an Account

Close Modal
Close Modal