We report a homebuilt ultra-high-vacuum (UHV) rotating sample manipulator with cryogenic cooling. The sample holder is thermally anchored to a built-in cryogenic cold head through flexible copper beryllium strips, permitting continuous sample rotation. A similar contact mechanism is implemented for electrical wiring to the sample holder for thermometry. The apparatus thus enables continuous sample rotation at regulated cryogenic temperatures in a UHV environment. We discuss applications of this apparatus for cryogenic sputtering.
REFERENCES
1.
H.
Frey
and H. R.
Khan
, in Handbook of Thin-Film Technology
, edited by H.
Frey
and H. R.
Khan
(Springer-Verlag Berlin Heidelberg
, 2015
).2.
D.
Depla
, S.
Mahieu
, and J. E.
Greene
, in Handbook of Deposition Technologies for Films and Coatings
, 3rd ed., edited by P. M.
Martin
(Elsevier
, 2010
), pp. 253
–296
.3.
H.
Adachi
, T.
Hata
, and K.
Wasa
, in Handbook of Sputter Deposition Technology
, 2nd ed., edited by K.
Wasa
, I.
Kanno
, and H.
Kotera
(Elsevier
, 2012
), pp. 295
–359
.4.
D. L.
Chambers
, C. T.
Wan
, G. T.
Susi
, and K. A.
Taylor
, “Sputtering deposition of thin films at cryogenic temperatures
,” Surf. Coat. Technol.
36
, 893
(1988
).5.
M.
Schneider
, A.
Rahman
, and I. K.
Schuller
, “Role of relaxation in epitaxial growth: A molecular-dynamics study
,” Phys. Rev. Lett.
55
, 604
(1985
).6.
W.-C.
Chen
and S.-T.
Wu
, “Epitaxial growth of TiN on Al2O3 at cryogenic temperature
,” Jpn. J. Appl. Phys., Part 2
42
, L192
(2003
).7.
Y.
Saito
and T.
Anayama
, “The effects of the substrate temperature on sputter-deposited niobium films
,” J. Low Temp. Phys.
21
, 169
(1975
).8.
K.
Foreman
, C.
Labedz
, M.
Shearer
, and S.
Adenwalla
, “Organic ferroelectric evaporator with substrate cooling and in situ transport capabilities
,” Rev. Sci. Instrum.
85
, 043902
(2014
).9.
V. K.
Jayaraman
, Y. M.
Kuwabara
, A. M.
Álvarez
, and M.
de la luz OlveraAmador
, “Importance of substrate rotation speed on the growth of homogeneous ZnO thin films by reactive sputtering
,” Mater. Lett.
169
, 1
(2016
).10.
M. M.
Hawkeye
and M. J.
Brett
, “Glancing angle deposition: Fabrication, properties, and applications of micro- and nanostructured thin films
,” J. Vac. Sci. Technol., A
25
, 1317
(2007
).11.
R. M.
Josephs
, R. A.
Flowers
, and P. L.
Young
, “Rotating liquid nitrogen cooled substrate holder
,” U.S. patent No. 4459823 (July 17, 1984
).12.
D.
Lubomirsky
and K. H.
Floyd
, “Rotating temperature controlled substrate pedestal for film uniformity
,” U.S. patent No. US 2009/0120368 A1 (May 14, 2009
).© 2020 Author(s).
2020
Author(s)
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