A calibration algorithm based on one-port vector network analyzer (VNA) calibration for scanning microwave microscopes (SMMs) is presented and used to extract quantitative carrier densities from a semiconducting n-doped GaAs multilayer sample. This robust and versatile algorithm is instrument and frequency independent, as we demonstrate by analyzing experimental data from two different, cantilever- and tuning fork-based, microscope setups operating in a wide frequency range up to 27.5 GHz. To benchmark the SMM results, comparison with secondary ion mass spectrometry is undertaken. Furthermore, we show SMM data on a GaAs p-n junction distinguishing p- and n-doped layers.
REFERENCES
1.
J.
Hoffmann
, G.
Gramse
, J.
Niegemann
, M.
Zeier
, and F.
Kienberger
, “Measuring low loss dielectric substrates with scanning probe microscopes
,” Appl. Phys. Lett.
105
, 013102
(2014
).2.
A.
Imtiaz
, T. M.
Wallis
, S.-H.
Lim
, H.
Tanbakuchi
, H. P.
Huber
, A.
Hornung
, P.
Hinterdorfer
, J.
Smoliner
, F.
Kienberger
, and P.
Kabos
, “Frequency-selective contrast on variably doped p-type silicon with a scanning microwave microscope
,” J. Appl. Phys.
111
, 093727
(2012
).3.
P. J.
de Visser
, R.
Chua
, J. O.
Island
, M.
Finkel
, A. J.
Katan
, H.
Thierschmann
, H. S.
van der Zant
, and T. M.
Klapwijk
, “Spatial conductivity mapping of unprotected and capped black phosphorus using microwave microscopy
,” 2D Mater.
3
, 021002
(2016
).4.
E. Y.
Ma
, B.
Bryant
, Y.
Tokunaga
, G.
Aeppli
, Y.
Tokura
, and Z. X.
Shen
, “Charge-order domain walls with enhanced conductivity in a layered manganite
,” Nat. Commun.
6
, 7595
(2015
).5.
M. C.
Biagi
, R.
Fabregas
, G.
Gramse
, M.
Van Der Hofstadt
, A.
Juárez
, F.
Kienberger
, L.
Fumagalli
, and G.
Gomila
, “Nanoscale electric permittivity of single bacterial cells at gigahertz frequencies by scanning microwave microscopy
,” ACS Nano
10
, 280
(2016
).6.
A.
Tselev
, J.
Velmurugan
, A. V.
Ievlev
, S. V.
Kalinin
, and A.
Kolmakov
, “Seeing through walls at the nanoscale: Microwave microscopy of enclosed objects and processes in liquids
,” ACS Nano
10
, 3562
(2016
).7.
T.
Clarysse
, M.
Caymax
, P.
De Wolf
, T.
Trenkler
, W.
Vandervorst
, J. S.
McMurray
, J.
Kim
, C. C.
Williams
, J. G.
Clark
, and G.
Neubauer
, “Epitaxial staircase structure for the calibration of electrical characterization techniques
,” J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct.
16
, 394
(1998
).8.
C. C.
Williams
, J.
Slinkman
, W. P.
Hough
, and H. K.
Wickramasinghe
, “Lateral dopant profiling with 200 nm resolution by scanning capacitance microscopy
,” Appl. Phys. Lett.
55
, 1662
(1998
).9.
A. K.
Henning
, T.
Hochwitz
, J.
Slinkman
, J.
Never
, S.
Hoffmann
, P.
Kaszuba
, and C.
Daghlian
, “Two-dimensional surface dopant profiling in silicon using scanning Kelvin probe microscopy
,” J. Appl. Phys.
77
, 1888
(1995
).10.
J.
Smoliner
, H. P.
Huber
, M.
Hochleitner
, M.
Moertelmaier
, and F.
Kienberger
, “Scanning microwave microscopy/spectroscopy on metal-oxide semiconductor systems
,” J. Appl. Phys.
108
, 064315
(2010
).11.
H. P.
Huber
, I.
Humer
, M.
Hochleitner
, M.
Fenner
, M.
Moertelmaier
, C.
Rankl
, A.
Imtiaz
, T. M.
Wallis
, H.
Tanbakuchi
, P.
Hinterdorfer
, P.
Kabos
, J.
Smoliner
, J. J.
Kopanski
, and F.
Kienberger
, “Calibrated nanoscale dopant profiling using a scanning microwave microscope
,” J. Appl. Phys.
111
, 14301
(2012
).12.
P.
De Wolf
, R.
Stephenson
, T.
Trenkler
, T.
Clarysse
, T.
Hantschel
, and W.
Vandervorst
, “Status and review of two-dimensional carrier and dopant profiling using scanning probe microscopy
,” J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct.
18
, 361
(2000
).13.
Y.-T.
Cui
, E. Y.
Ma
, and Z.-X.
Shen
, “Quartz tuning fork based microwave impedance microscopy
,” Rev. Sci. Instrum.
87
, 063711
(2016
).14.
J.
Hoffmann
, M.
Wollensack
, M.
Zeier
, J.
Niegemann
, H.-P.
Huber
, and F.
Kienberger
, “A calibration algorithm for nearfield scanning microwave microscopes
,” in 12th IEEE Conference on Nanotechnology (IEEE-NANO)
(IEEE
, 2012
).15.
C.
Gao
and X.-D.
Xiang
, “Quantitative microwave near-field microscopy of dielectric properties
,” Rev. Sci. Instrum.
69
, 3846
(1998
).16.
K.
Lai
, W.
Kundhikanjana
, M. A.
Kelly
, and Z. X.
Shen
, “Calibration of shielded microwave probes using bulk dielectrics
,” Appl. Phys. Lett.
93
, 123105
(2008
).17.
G.
Gramse
, M.
Kasper
, L.
Fumagalli
, G.
Gomila
, P.
Hinterdorfer
, and F.
Kienberger
, “Calibrated complex impedance and permittivity measurements with scanning microwave microscopy
,” Nanotechnology
25
, 145703
(2014
).18.
R. W.
Beatty
, “2-port λg/4 waveguide standard of voltage standing-wave ratio
,” Electron. Lett.
9
(2
), 24
(1973
).19.
Applying Error Correction to Network Analyzer Measurements–Application Note, http://literature.cdn.keysight.com/litweb/pdf/5965-7709E.pdf.
20.
A. G.
Baca
and C. I. H.
Ashby
, Fabrication of GaAs Devices
(The Institution of Engineering and Technology
, 2009
).21.
S. M.
Sze
and K. K.
Ng
, Physics of Semiconductor Devices
(Wiley & Sons, Inc.
, Hoboken, New Jersey
, 2007
)22.
D.
Haneman
, “Photoelectric emission and work functions of InSb, GaAs, Bi2Te3 and germanium
,” J. Phys. Chem. Solids
11
, 205
(1959
).23.
U.
Celano
, T.
Hantschel
, G.
Giammaria
, R. C.
Chintala
, T.
Conard
, H.
Bender
, and W.
Vandervorst
, “Evaluation of the electrical contact area in contact-mode scanning probe microscopy
,” J. Appl. Phys.
117
, 214305
(2015
).24.
K.
Koehler
, P.
Ganser
, and M.
Maier
, “Comparison of Si δ-doping with homogeneous doping in GaAs
,” J. Crystal Growth
127
, 720
–723
(1993
).© 2018 Author(s).
2018
Author(s)
You do not currently have access to this content.