In this work, we report on a highly variable, compact, and light high-vacuum sputter deposition unit designed for in situ experiments using synchrotron radiation facilities. The chamber can be mounted at various synchrotron beamlines for scattering experiments in grazing incidence geometry. The sample position and the large exit window allow to perform x-ray experiments up to large q values. The sputtering unit is easy to mount on existing experimental setups and can be remote-controlled. In this paper, we describe in detail the design and the performance of the new sputtering chamber and present the installation of the apparatus at different 3rd generation light sources. Furthermore, we describe the different measurement options and present some selected results. The unit has been successfully commissioned and is now available for users at PETRA III at DESY.
Skip Nav Destination
Article navigation
Research Article|
May 13 2015
A compact and low-weight sputtering unit for in situ investigations of thin film growth at synchrotron radiation beamlines
P. Walter;
P. Walter
a)
1
Deutsches Elektronen-Synchrotron
, Notkestr. 85, D-22607 Hamburg, Germany
22nd. Institute of Physics B and JARA-FIT,
RWTH Aachen University
, Otto-Blumenthal-Str. 1, D-52074 Aachen, Germany
Search for other works by this author on:
A.-C. Dippel;
A.-C. Dippel
1
Deutsches Elektronen-Synchrotron
, Notkestr. 85, D-22607 Hamburg, Germany
3Center for Materials Crystallography, Department of Chemistry,
Aarhus University
, Langelandsgade 140, 8000 Aarhus C, Denmark
Search for other works by this author on:
K. Pflaum;
K. Pflaum
1
Deutsches Elektronen-Synchrotron
, Notkestr. 85, D-22607 Hamburg, Germany
Search for other works by this author on:
J. Wernecke;
J. Wernecke
1
Deutsches Elektronen-Synchrotron
, Notkestr. 85, D-22607 Hamburg, Germany
Search for other works by this author on:
J. van den Hurk
;
J. van den Hurk
4Institut für Werkstoffe der Elektrotechnik II (IWE II) and JARA-FIT,
RWTH Aachen University
, Sommerfeldstr. 24, D-52074 Aachen, Germany
Search for other works by this author on:
J. Blume;
J. Blume
1
Deutsches Elektronen-Synchrotron
, Notkestr. 85, D-22607 Hamburg, Germany
Search for other works by this author on:
U. Klemradt
U. Klemradt
22nd. Institute of Physics B and JARA-FIT,
RWTH Aachen University
, Otto-Blumenthal-Str. 1, D-52074 Aachen, Germany
Search for other works by this author on:
a)
Electronic mail: [email protected].
Rev. Sci. Instrum. 86, 053906 (2015)
Article history
Received:
February 16 2015
Accepted:
April 07 2015
Citation
P. Walter, A.-C. Dippel, K. Pflaum, J. Wernecke, J. van den Hurk, J. Blume, U. Klemradt; A compact and low-weight sputtering unit for in situ investigations of thin film growth at synchrotron radiation beamlines. Rev. Sci. Instrum. 1 May 2015; 86 (5): 053906. https://doi.org/10.1063/1.4918620
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Overview of the early campaign diagnostics for the SPARC tokamak (invited)
M. L. Reinke, I. Abramovic, et al.
An instrumentation guide to measuring thermal conductivity using frequency domain thermoreflectance (FDTR)
Dylan J. Kirsch, Joshua Martin, et al.
Implementation of simultaneous ultraviolet/visible and x-ray absorption spectroscopy with microfluidics
Olivia McCubbin Stepanic, Christopher J. Pollock, et al.
Related Content
Anisotropic one-dimensional domain pattern in NaNbO3 epitaxial thin films grown on (110) TbScO3
Appl. Phys. Lett. (March 2013)