In this work, a novel laser-produced plasma source is presented which delivers pulsed broadband soft X-radiation in the range between 100 and 1200 eV. The source was designed in view of long operating hours, high stability, and cost effectiveness. It relies on a rotating and translating metal target and achieves high stability through an on-line monitoring device using a four quadrant extreme ultraviolet diode in a pinhole camera arrangement. The source can be operated with three different laser pulse durations and various target materials and is equipped with two beamlines for simultaneous experiments. Characterization measurements are presented with special emphasis on the source position and emission stability of the source. As a first application, a near edge X-ray absorption fine structure measurement on a thin polyimide foil shows the potential of the source for soft X-ray spectroscopy.
Skip Nav Destination
Article navigation
March 2015
Research Article|
March 30 2015
High average power, highly brilliant laser-produced plasma source for soft X-ray spectroscopy
Rev. Sci. Instrum. 86, 035116 (2015)
Article history
Received:
October 27 2014
Accepted:
March 12 2015
Citation
Ioanna MantouvalouKatharina WitteDaniel GrötzschMichael NeitzelSabrina GüntherJonas BaumannRobert JungHolger StielBirgit KanngießerWolfgang Sandner; High average power, highly brilliant laser-produced plasma source for soft X-ray spectroscopy. Rev. Sci. Instrum. 1 March 2015; 86 (3): 035116. https://doi.org/10.1063/1.4916193
Download citation file:
