We report the first experiments carried out on a new chemical and magnetic imaging system, which combines the high spatial resolution of a photoemission electron microscope (PEEM) with a continuous-wave deep-ultraviolet laser. Threshold photoemission is sensitive to the chemical and magnetic structures of the surface of materials. The spatial resolution of PEEM is limited by space charging when using pulsed photon sources as well as aberrations in the electron optics. We show that the use of a continuous-wave laser enabled us to overcome such a limit by suppressing the space-charge effect, allowing us to obtain a resolution of approximately 2.6 nm. With this system, we demonstrated the imaging of surface reconstruction domains on Si(001) by linear dichroism with normal incidence of the laser beam. We also succeeded in magnetic imaging of thin films with the use of magnetic circular dichroism near the Fermi level. The unique features of the ultraviolet laser will give us fast switching of the incident angles and polarizations of the photon source, which will be useful for the characterization of antiferromagnetic materials as well as ferromagnetic materials.
Skip Nav Destination
CHORUS
Article navigation
February 2015
Research Article|
February 02 2015
Ultrahigh-spatial-resolution chemical and magnetic imaging by laser-based photoemission electron microscopy
Toshiyuki Taniuchi;
Toshiyuki Taniuchi
a)
1The Institute for Solid State Physics,
The University of Tokyo
, Kashiwa, Chiba 277-8581, Japan
2CREST,
Japan Science and Technology Agency
, Tokyo 102-0075, Japan
Search for other works by this author on:
Yoshinori Kotani;
Yoshinori Kotani
b)
1The Institute for Solid State Physics,
The University of Tokyo
, Kashiwa, Chiba 277-8581, Japan
2CREST,
Japan Science and Technology Agency
, Tokyo 102-0075, Japan
Search for other works by this author on:
Shik Shin
Shik Shin
1The Institute for Solid State Physics,
The University of Tokyo
, Kashiwa, Chiba 277-8581, Japan
2CREST,
Japan Science and Technology Agency
, Tokyo 102-0075, Japan
Search for other works by this author on:
a)
Electronic mail: taniuchi@issp.u-tokyo.ac.jp
b)
Present address: Japan Synchrotron Radiation Research Institute (JASRI), 1-1-1 Kouto, Sayo, Hyogo 679-5198, Japan.
Rev. Sci. Instrum. 86, 023701 (2015)
Article history
Received:
October 29 2014
Accepted:
January 14 2015
Citation
Toshiyuki Taniuchi, Yoshinori Kotani, Shik Shin; Ultrahigh-spatial-resolution chemical and magnetic imaging by laser-based photoemission electron microscopy. Rev. Sci. Instrum. 1 February 2015; 86 (2): 023701. https://doi.org/10.1063/1.4906755
Download citation file:
Sign in
Don't already have an account? Register
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Pay-Per-View Access
$40.00
Citing articles via
Learning from each other: Cross-cutting diagnostic development activities between magnetic and inertial confinement fusion (invited)
M. Gatu Johnson, D. Schlossberg, et al.
The QICK (Quantum Instrumentation Control Kit): Readout and control for qubits and detectors
Leandro Stefanazzi, Kenneth Treptow, et al.
Related Content
Dark field photoelectron emission microscopy of micron scale few layer graphene
Rev. Sci. Instrum. (August 2012)
Diamondoid coating enables disruptive approach for chemical and magnetic imaging with 10 nm spatial resolution
Appl. Phys. Lett. (October 2012)
Tunable deep ultraviolet laser based near ambient pressure photoemission electron microscope for surface imaging in the millibar regime
Rev. Sci. Instrum. (November 2020)
Femtosecond time-resolved photoemission electron microscopy for spatiotemporal imaging of photogenerated carrier dynamics in semiconductors
Rev. Sci. Instrum. (August 2014)
Progress on PEEM3 — An Aberration Corrected X‐Ray Photoemission Electron Microscope at the ALS
AIP Conference Proceedings (January 2007)