Gas aggregation is a well known method used to produce clusters of different materials with good size control, reduced dispersion, and precise stoichiometry. The cost of these systems is relatively high and they are generally dedicated apparatuses. Furthermore, the usual sample production speed of these systems is not as fast as physical vapor deposition devices posing a problem when thick samples are needed. In this paper we describe the development of a multipurpose gas aggregation system constructed as an adaptation to a magnetron sputtering system. The cost of this adaptation is negligible and its installation and operation are both remarkably simple. The gas flow for flux in the range of 60–130 SCCM (SCCM denotes cubic centimeter per minute at STP) is able to completely collimate all the sputtered material, producing spherical nanoparticles. Co nanoparticles were produced and characterized using electron microscopy techniques and Rutherford back-scattering analysis. The size of the particles is around 10 nm with around 75 nm/min of deposition rate at the center of a Gaussian profile nanoparticle beam.
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Research Article| March 17 2010
High density flux of Co nanoparticles produced by a simple gas aggregation apparatus
G. T. Landi;
S. A. Romero;
G. T. Landi, S. A. Romero, A. D. Santos; High density flux of Co nanoparticles produced by a simple gas aggregation apparatus. Rev. Sci. Instrum. 1 March 2010; 81 (3): 033908. https://doi.org/10.1063/1.3355075
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