Knowledge of the thermal conductivity of phase-change materials is essential for accurate modeling of nonvolatile memory devices that incorporate them. The “ method” is a well-established and sensitive technique for measuring this property. We report two new extensions of the technique that feature in situ monitoring of the phase-change material as it transitions from the as-deposited amorphous phase to the crystalline phase. One technique crystallizes the entire sample in a vacuum oven, while using the voltage to monitor the phase transition. The other technique uses the heater to crystallize only the material in the region of measurement.
REFERENCES
1.
Y. C.
Chen
, C. T.
Rettner
, S.
Raoux
, G. W.
Burr
, S. H.
Chen
, R. M.
Shelby
, M.
Salinga
, W. P.
Risk
, T. D.
Happ
, G. M.
McClelland
, M.
Breitwisch
, A.
Schrott
, J. B.
Philipp
, M. H.
Lee
, R.
Cheek
, T.
Nirschl
, M.
Lamorey
, C. F.
Chen
, E.
Joseph
, S.
Zaidi
, B.
Yee
, H. L.
Lung
, R.
Bergmann
, and C.
Lam
, Tech. Dig. - Int. Electron Devices Meet.
2006
, 1
.2.
S.
Kim
and H. S.
Philip
, IEEE Electron Device Lett.
28
, 697
(2007
).3.
D. G.
Cahill
, Rev. Sci. Instrum.
61
, 802
(1990
);D. G.
Cahill
, Rev. Sci. Instrum.
73
, 3701
(E) (2002
).4.
D. G.
Cahill
, W. K.
Ford
, K. E.
Goodson
, G. D.
Mahan
, A.
Majumdar
, H. J.
Maris
, R.
Merlin
, and S. R.
Phillpot
, J. Appl. Phys.
93
, 793
(2003
).5.
D. G.
Cahill
, Rev. Sci. Instrum.
75
, 5119
(2004
).6.
B. W.
Olson
, S.
Graham
, and K.
Chen
, Rev. Sci. Instrum.
76
, 053901
(2005
).7.
D. G.
Cahill
, M.
Katiyar
, and J. R.
Abelson
, Phys. Rev. B
50
, 6077
(1994
).8.
I.
Friedrich
, V.
Weidenhof
, W.
Njoroge
, P.
Franz
, and M.
Wuttig
, J. Appl. Phys.
87
, 4130
(2000
).9.
E.-K.
Kim
, S.-I.
Kwun
, S.-M.
Lee
, H.
Seo
, and J.-G.
Yoon
, Appl. Phys. Lett.
76
, 3864
(2000
).10.
V.
Giraud
, J.
Cluzel
, V.
Sousa
, A.
Jacquot
, A.
Dauscher
, B.
Lenoir
, H.
Scherrer
, and S.
Romer
, J. Appl. Phys.
98
, 013520
(2005
).11.
J. P.
Reifenberg
, M. A.
Panzer
, S.-B.
Kim
, A. M.
Gibby
, Y.
Zhang
, S.
Wong
, H.-S.
Philip Wong
, E.
Pop
, and K. E.
Goodson
, Appl. Phys. Lett.
91
, 111904
(2007
).12.
H.-K.
Lyeo
, D. G.
Cahill
, B.-S.
Lee
, J. R.
Abelson
, M.-H.
Kwon
, K.-B.
Kim
, S. G.
Bishop
, and B.-K.
Cheong
, Appl. Phys. Lett.
89
, 151904
(2006
).13.
T.
Yamane
, N.
Nagai
, S.
Katayama
, and M.
Todoki
, J. Appl. Phys.
91
, 9772
(2002
).© 2008 American Institute of Physics.
2008
American Institute of Physics
You do not currently have access to this content.