A new x-ray technique to determine temperature dependencies of macroscopic stresses in thin films by characterizing the substrate curvature is introduced. The technique is demonstrated on polycrystalline TiN and Al thin films deposited on Si(100) wafers. The structures are thermally cycled in the temperature range of using a newly developed heating chamber attached to a commercial x-ray diffractometer. The curvature of the freestanding samples was determined by the rocking curve measurement of substrate Si 400 reflections at different lateral positions of the samples, and the stresses are calculated using Stoney’s formula. The results show that the magnitude of the stress is in good agreement with the results obtained by other techniques. For the practical application of the technique, the sample mounting and the temperature control are of great importance.
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March 2007
Brief Report|
March 14 2007
High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method
J. Keckes;
J. Keckes
a)
Erich Schmid Institute of Materials Science
, Austrian Academy of Sciences, Department of Materials Physics, University of Leoben
, Jahnstrasse 12, A-8700 Leoben, Austria and Materials Center Leoben
, Forschung GmbH, Franz-Josef-Straýe 13, A-8700 Leoben, Austria
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E. Eiper;
E. Eiper
Erich Schmid Institute of Materials Science
, Austrian Academy of Sciences, Department of Materials Physics, University of Leoben
, Jahnstrasse 12, A-8700 Leoben, Austria and Materials Center Leoben
, Forschung GmbH, Franz-Josef-Straýe 13, A-8700 Leoben, Austria
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K. J. Martinschitz;
K. J. Martinschitz
Erich Schmid Institute of Materials Science
, Austrian Academy of Sciences, Department of Materials Physics, University of Leoben
, Jahnstrasse 12, A-8700 Leoben, Austria and Materials Center Leoben
, Forschung GmbH, Franz-Josef-Straýe 13, A-8700 Leoben, Austria
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H. Köstenbauer;
H. Köstenbauer
Department of Physical Metallurgy and Materials Testing,
University of Leoben
and Christian-Doppler Laboratory for Advanced Coatings, University of Leoben
, Franz-Josef-Strasse 18, A-8700 Leoben, Austria
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R. Daniel;
R. Daniel
Department of Physical Metallurgy and Materials Testing,
University of Leoben
and Christian-Doppler Laboratory for Advanced Coatings, University of Leoben
, Franz-Josef-Strasse 18, A-8700 Leoben, Austria
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C. Mitterer
C. Mitterer
Department of Physical Metallurgy and Materials Testing,
University of Leoben
and Christian-Doppler Laboratory for Advanced Coatings, University of Leoben
, Franz-Josef-Strasse 18, A-8700 Leoben, Austria
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a)
Author to whom correspondence should be addressed; Fax: ++43-3842-804-116; electronic mail: keckes@unileoben.ac.at
Rev. Sci. Instrum. 78, 036103 (2007)
Article history
Received:
July 27 2006
Accepted:
January 15 2007
Citation
J. Keckes, E. Eiper, K. J. Martinschitz, H. Köstenbauer, R. Daniel, C. Mitterer; High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method. Rev. Sci. Instrum. 1 March 2007; 78 (3): 036103. https://doi.org/10.1063/1.2535857
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