Recent developments in instrumentation for low‐energy electron diffraction (LEED) are reviewed. After a summary of the major types of measurements in LEED, the properties of LEED instruments that are important in performing these measurements are described. A detailed discussion is presented on the major components of a LEED diffractometer. LEED is compared briefly to some other techniques that are sensitive to surface structure.
REFERENCES
1.
2.
3.
4.
J. J.
Lander
, J.
Morrison
, and F.
Unterwald
, Rev. Sci. Instrum.
33
, 782
(1962
).5.
6.
R. L.
Park
and H. E.
Farnsworth
, Rev. Sci. Instrum.
35
, 1592
(1964
).7.
For a recent review, see
M. G.
Lagally
, Appl. Surf. Sci.
13
, 260
(1982
).8.
(b) J. B. Pendry, Low‐Energy Electron Diffraction (Academic), New York, (1974);
(c) J. A. Strozier, D. W. Jepsen, and F. Jona, in Surface Physics of Materials, edited by J. M. Blakely (Academic, New York, 1975);
(d) M. A. van Hove and S. Y. Tong, Surface Crystallography by LEED (Springer, Berlin, 1979);
(e) M. A. van Hove, in The Nature of the Surface Chemical Bond, edited by T. N. Rhodin and G. Ertl (North‐Holland, Amsterdam, 1979).
9.
See, for example, W. W. Beeman, P. Kaesberg, J. W. Anderegg, and M. B. Webb, in Handbuch der Physik, edited by S. Flügge (Springer, Berlin, 1957), Vol. 32;
(b) A. Guinier, X‐Ray Diffraction (Freeman, San Francisco, 1963);
(c) B. E. Warren, X‐Ray Diffraction (Addison‐Wesley, Reading, MA, 1969).
10.
(a) M. Henzler, in Electron Spectroscopy for Surface Analysis, edited by H. Ibach (Springer, Berlin, 1977);
(c) M. G. Lagally and D. G. Welkie, in Advanced Techniques for Characterizing Microstructures, edited by F. W. Wiffen and J. A. Spitznagel (The Metallurgical Society of AIME, Warrendale, PA, 1982);
(d) M. G. Lagally, in Chemistry and Physics of Solid Surfaces, Vol. IV, edited by R. Vanselow, and R. Howe, Springer Series in Chemical Physics (Springer, Heidelberg, 1982), Vol. 20;
(i)
S.
Semancik
and P. J.
Estrup
, J. Vac. Sci. Technol.
18
, 541
(1981
);11.
R. L.
Park
, J. E.
Houston
, and D. G.
Schreiner
, Rev. Sci. Instrum.
42
, 60
(1971
).12.
13.
See, for example, K. R. Spangenberg, Fundamentals of Electron Devices, (McGraw‐Hill, New York, 1957);
R. L. Park, in Experimental Methods in Catalytic Research, edited by M. Dawson and C. A. Anderson (Academic, New York, 1976), Vol. III.
14.
For a lucid discussion of the proper interpretation of instrument response functions and “coherence widths” in LEED, see
G.
Comsa
, Surf. Sci.
81
, 57
(1979
).15.
16.
T.‐M.
Lu
, M. G.
Lagally
, and G.‐C.
Wang
, Surf. Sci.
104
, L229
(1981
).17.
18.
H. M. Clearfield (unpublished).
19.
For reviews, see R. F. Wallis, in Progress in Surface Science, edited by S. G. Davison (Pergamon, New York, 1973), Vol. 4;
M. G. Lagally, in Surface Physics of Materials, edited by J. M. Blakely (Academic, New York, 1975).
20.
Cliftronics, Model 406‐S, Clifton, NJ.
21.
J. A.
Martin
and M. G.
Lagally
, J. Vac. Sci. Technol.
18
, 58
(1981
).22.
J. A. Martin (unpublished).
23.
W. N. Unertl (private communication).
24.
25.
R. L. Dennis, Ph.D. dissertation, University of Wisconsin‐Madison, 1972 (unpublished);
26.
P. I. Cohen, Ph.D. dissertation, University of Wisconsin‐Madison, 1975 (unpublished);
27.
F.‐W. Wulfert, Ph.D. dissertation, University of Hannover, 1982 (unpublished);
Ref. 10b.
28.
J. A.
Martin
and M. G.
Lagally
, J. Vac. Sci. Technol. A
1
, 1210
(1983
).29.
K. G.
Predko
and M. P.
Znachenok
, J. Appl. Spectrosc. (USSR)
10
, 694
(1969
);30.
31.
P. A. Bennett and M. B. Webb (private communication).
32.
A. G.
Schrott
, M. D.
Chinn
, C. G.
Shaw
, and S. C.
Fain
, Jr., J. Vac. Sci. Technol.
21
, 101
(1982
).33.
P. C.
Stair
, T. J.
Kaminska
, L. L.
Kesmodel
, and G. A.
Somorjai
, Phys. Rev. B
11
, 623
(1975
).34.
D. C.
Frost
, K. A. R.
Mitchell
, F. R.
Shepherd
, and P. R.
Watson
, J. Vac. Sci. Technol.
13
, 1196
(1976
);T. N.
Tommet
, G. B.
Olszewski
, P. A.
Chadwick
, and S. L.
Bernasek
, Rev. Sci. Instrum.
50
, 147
(1979
).35.
P.
Heilman
, E.
Lang
, K.
Heinz
, and K.
Müller
, Appl. Phys.
9
, 247
(1976
).36.
E.
Lang
, P.
Heilman
, G.
Hanke
, K.
Heinz
, and K.
Müller
, Appl. Phys.
19
, 287
(1979
).37.
R. L.
Lamberts
, G.‐C.
Higgins
, and R. N.
Wolfe
, J. Opt. Soc. Am.
48
, 487
(1958
);38.
39.
40.
41.
42.
C.
Martin
, P.
Jelinsky
, M.
Lampton
, R. F.
Malina
, and H. O.
Anger
, Rev. Sci. Instrum.
52
, 1068
(1981
).43.
44.
P. A. Bennett, Ph.D. dissertation, University of Wisconsin‐Madison, 1980 (unpublished);
45.
Tran C.
Ngoc
, M. G.
Lagally
, and M. B.
Webb
, Surf. Sci.
35
, 117
(1973
).46.
W.
Heiland
, Appl. Surf. Sci.
13
, 282
(1982
). This review contains a list of additional reviews.W. Heiland and E. Taglauer, in Methods of Experimental Physics: Surfaces edited by R. L. Park and M. G. Lagally (in press).
47.
S. H.
Overbury
, W.
Heiland
, D. M.
Zehner
, S.
Datz
, and R. S.
Thoe
, Surf. Sci.
109
, 239
(1981
).48.
49.
N.
Osakabe
, Y.
Tanashiro
, K.
Yagi
, and G.
Honjo
, Surf. Sci.
97
, 393
(1980
);N.
Osakabe
, K.
Yagi
, and G.
Honjo
, Jpn. J. Appl. Phys.
19
, L309
(1980
);J. M.
Cowley
, J. L.
Albain
, G. G.
Hembree
, P. E.
Hojlund‐Nielsen
, F. A.
Koch
, J. D.
Landry
, and H.
Schumann
, Rev. Sci. Instrum.
46
, 826
(1975
).For additional references and a brief discussion, see J. A. Venables, in Chemistry and Physics of Solid Surfaces, Vol. IV, edited by R. Vanselow and R. Howe, Springer Series in Chemical Physics iSpringer, Heidelberg, (1982), Vol. 20.
See also papers in
J. M.
Cowley
, J. L.
Albain
, G. G.
Hembree
, P. E.
Hojlund‐Nielsen
, F. A.
Koch
, J. D.
Landry
, and H.
Schumann
, Ultramicroscopy
8
(1983
).50.
51.
Osakabee et al., Ref. 49.
52.
53.
J. M.
Van Hove
, P.
Pukite
, P. I.
Cohen
, and C. S.
Lent
, J. Vac. Sci. Technol. A
1
, 609
(1983
).54.
55.
J. M.
Van Hove
, C. S.
Lent
, P. R.
Pukite
, and P. I.
Cohen
, J. Vac. Sci. Technol. B
1
, 741
(1983
).56.
W. C.
Marra
, P. E.
Eisenberger
, and A. Y.
Cho
, J. Appl. Phys.
50
, 6927
(1979
);W. C.
Marra
, P. H.
Fuoss
, and P. E.
Eisenberger
, Phys. Rev. Lett.
49
, 1169
(1982
);57.
A. Bok, in Modern Diffraction and Imaging Techniques in Material Science, edited by S. Amelinckx, R. Gevers, G. Remaut, and J. Van Landuyt (North‐Holland, Amsterdam, 1970).
This content is only available via PDF.
© 1983 American Institute of Physics.
1983
American Institute of Physics
You do not currently have access to this content.