A device for diverting the flow of a carrier gas from the normal flow pattern of a conventional Verneuil apparatus has been fabricated and used. This improved carrier gas assembly provides a means for replenishing powder feed material or substituting an alternate material without disturbing crystal growth environment or disrupting the growth of unusually long crystals. The temperature of the growing crystal, and the liquid‐solid crystal growing interface remain stable during these operations.

1.
J. A.
Adamski
,
R. C.
Powell
, and
J. L.
Sampson
,
J. Cryst. Growth
3
,
4
(
1968
).
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© 1969 The American Institute of Physics.
1969
The American Institute of Physics
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