A plasma impedance probe (PIP) is a type of in situ, radio frequency (RF) probe that is traditionally used to measure plasma properties (e.g., density) in low-density environments such as the Earth's ionosphere. We believe that PIPs are underrepresented in laboratory settings, in part because PIP operation and analysis have not been optimized for signal-to-noise ratio (SNR), reducing the probe's accuracy, upper density limit, and acquisition rate. This work presents our efforts in streamlining and simplifying the PIP design, circuit-based-model, calibration, and analysis for unmagnetized laboratory plasmas, in both continuous and pulsed PIP operation. The focus of this work is a Monte Carlo uncertainty analysis, which identifies operational and analysis procedures that improve SNR by multiple orders of magnitude. Additionally, this analysis provides evidence that the sheath resonance (and not the plasma frequency as previously believed) sets the PIP's upper density limit, which likely provides an additional method for extending the PIP's density limit.

The plasma impedance probe (PIP)1–4 is an in situ plasma diagnostic that is underutilized when compared with the Langmuir probe (LP).5,6 Both probes share much in common: Both are metal electrodes, often have similar geometries (e.g., planar and spherical), and form sheaths when placed in a plasma. When the sheath is large with respect to the probe size, both probes struggle with accuracy.7,8 When electrically biased, both provide a measurement of the coupled sheath–plasma impedance, Z, around the probes, and fitting sheath–plasma models to these measurements provide many of the same plasma properties. These properties include the following: the electron plasma frequency,
(1)
electron density (n),4 electron temperature (Te),9,10 Debye length (λD), sheath thickness (tsh),7,11 and plasma potential (Vp).12 Historically, PIPs are primarily used to measure density but have also measured electron damping (ν). However, isolating the species-dependent collisional and collisionless terms within ν is still an active research topic in the PIP community.13–15 

Arguably the largest differences between PIPs and LPs are in how they are electrically operated and what they subsequently measure. LPs are biased across a range of large excitation voltages ( V exc > k b T e / e ) and swept at low rates compared with the ion and electron plasma frequencies. They therefore only measure electrical resistance, Re(Z). Due to the large voltage sweeps, LP measurements encounter three distinct sheath regimes: unsaturated, ion-saturated, and electron-saturated. The complexity of the underlying models and subsequent challenges in numerical analysis often lead to total probe errors between 10% and 50%.8 In contrast, PIPs4,7 are excited across a range of frequencies (ωexc) above the ion-plasma frequency and near the electron plasma frequency (ωp); therefore PIPs measure the complex impedance spectra, Z ( ω ) , and ignore ion contributions. Additionally, PIPs are excited at relatively low voltages, which avoids saturated sheaths and allows for linearization of the Boltzmann relation. We argue that these factors lead to a simpler PIP model, which results in improved measurement accuracy over the LP.

The PIP is one of many types of in situ radio frequency (RF) probes and is advantageous in that it is well suited for lower-density plasmas.2 Compared with other RF probes,3 the PIP is consistently more accurate with errors around 10%–20%. It is worth noting that the analysis by Kim et al.3 is based heavily on prior PIP work4 and does not appear to include the corrections we have identified in our current and previous work,7 which will further reduce the PIP's error. These corrections include but are not limited to calibrating the PIP's stem, using numerical fitting instead of locating the PIP's second resonance to calculate density, and optimizing the PIP's geometry for the thin-sheath limit.

Physically, PIPs operate by measuring the frequency response of the plasma and sheath around the probe.4,7 When placed in plasma, a sheath forms between the PIP and the bulk plasma. Both the sheath and plasma regions have their own frequency-dependent dielectrics, ε s h ( ω ) and ε p ( ω ) , respectively, which are also dependent on their respective plasma properties. These dielectrics electrically couple with the PIP and modify the PIP's electrical impedance, Z pip ( ω ) . An example of this coupling is it introduces two resonances ( ω ± ) into the PIP's impedance. Measuring Z pip ( ω ) allows us to infer the two dielectrics and their plasma properties. Experimentalists typically perform this measurement by transmitting one of two types of waveforms to the PIP: swept waveforms and pulsed waveforms. Swept waveforms,4,14–16 the traditional method, use a vector network analyzer (VNA) to transmit continuous frequency sweeps and measure both the outbound and reflected waves. This approach is generally recommended over the pulsed approach because it is simpler to set up/operate and provides a higher signal-to-noise ratio (SNR). However, it has a slower acquisition rate, typically no faster than 100 Hz. The pulsed method,7,17,18 a more modern approach, uses a signal generator to transmit a series of single, broad-spectrum pulses separated by a finite time delay and an oscilloscope to measure the voltages and currents associated with each pulse. This approach allows for >1 MHz acquisition rates but at the cost of lower SNR and higher experimental complexity.7 Although SNR has greater impact on the pulsed waveform method, it is a limiting factor for both methods.

We attribute the PIP's underrepresentation in the laboratory to several factors:2,7 PIP's higher cost, complexity, relatively low upper density limit ( < 10 16 m−3), and the long heritage of LPs. This upper density limit is set by several factors, including the underlying assumptions of the PIP's model,7 but it is often attributed to the maximum resolvable frequency in a Z pip ( ω ) measurement. Historically, the community has believed that PIP measurements must resolve frequencies up to the plasma frequency for unmagnetized plasmas and up to the upper hybrid frequency for magnetized plasmas. Measuring higher densities, which scale with ω p 2 [Eq. (1)], becomes increasingly complicated as RF instrumentation cost, complexity, and sensitivity to calibration errors all increase appreciably with frequency. This, in part, is why PIPs have been historically developed for lower-density environments, specifically the ionosphere where n < 10 12 m−3. Examples include sounding rockets,17,19–24 satellites,25,26 and on the International Space Station.27–29 To a lesser extent, PIPs have also been used in lower-density laboratory plasmas, including DC discharges,7,30 Hall thruster plumes,16,31 and plasma processing applications32 where n < 10 16 m−3.

The goal of this work is to increase SNR in order to (i) improve overall measurement quality, (ii) extend the upper density limit, (iii) increase acquisition rates, and (iv) allow the unit to be more accessible in the laboratory environment. To achieve this, we present here our work in modernizing and streamlining the PIP's model, design, operation, and analysis. In Sec. II, we discuss our updated PIP-monopole design and accompanying analytical model. In Sec. III, we discuss our streamlined calibration, operation, and analysis for both the continuous and pulsed PIP methods. In Sec. IV, we perform a Monte Carlo (MC) uncertainty analysis that both quantifies the improvement in SNR from the previous two sections and provides recommendations for optimized PIP operation and analysis.

To extract meaningful results from a measurement of Zpip, we require a physical model. Below, we derive the PIP-monopole models for unmagnetized plasmas and discuss their assumptions and limitations.

The PIP-monopole model presented below is a reformulation of Blackwell's model4 and closely follows our previous derivation.7 

Similar to previous work,4,7,33–35 we begin our model by using a lumped-element circuit framework and modeling the PIP's head and surrounding environment as one or more spherical capacitors in series. To clarify, we ignore inductance within the PIP's head but not in the surrounding environment. The impedance spectra of any capacitor is Z ( ω ) = 1 / j ω C , and because of the spherical geometries, we use spherical-shell capacitor models, which have a capacitance C = 4 π ε ( 1 / r 1 1 / r 2 ) 1 with r1 and r2 being the radii of the inner and outer electrodes, respectively.

When no plasma is present [Fig. 1(a)], we model the vacuum around the PIP as a single capacitor, where the inner electrode is the PIP-monopole's head with radius rm, the outer electrode is the grounded vacuum chamber wall with approximate radius rvc, and dielectric ε = ε 0 . Recognizing that r m / r v c 0 , the PIP's vacuum impedance is therefore
(2a)
FIG. 1.

Two circuit models of the PIP-monopole. (a) The vacuum model uses a single vacuum-filled capacitor. (b) The plasma model uses two capacitors in series: a vacuum dielectric for the sheath and a plasma dielectric for the plasma ( ε = ε 0 ε p ).

FIG. 1.

Two circuit models of the PIP-monopole. (a) The vacuum model uses a single vacuum-filled capacitor. (b) The plasma model uses two capacitors in series: a vacuum dielectric for the sheath and a plasma dielectric for the plasma ( ε = ε 0 ε p ).

Close modal
We further simplify this expression to
(2b)
by introducing a normalized impedance, Z Z / Z m , a characteristic impedance of the monopole,
(3)
and a normalized frequency, ω ω / ω p .

When plasma is present [Fig. 1(b)], we model the sheath and plasma regions as two concentric capacitors in series. The inner conductor is the monopole's head, the outer conductor is the vacuum vessel, and the middle conductor is the sheath–plasma boundary with radius, rsh.

Because the sheath's density is much less than that of the bulk plasma, we approximate its dielectric as a homogeneous vacuum (e.g., ε ε 0 ) with a normalized sheath thickness,
(4)
The sheath's impedance is therefore
(5)
where we have similarly normalized the impedance.
For the bulk plasma, we model its dielectric as a plasma that is homogeneous, cold, collisional, and unmagnetized. Specifically, ε = ε 0 ε p , where
(6)
and ν ν / ω p is a normalized electron damping rate. The inclusion of j ν ω effectively introduces a damped, inductive term into this dielectric.4 The bulk plasma's impedance is
(7)
The total PIP impedance is the sum of the sheath and bulk plasma impedances,
(8)
In electrical systems, resonances occur where Im(Z) = 0, and Eq. (8) has two positive resonances,4,7
(9)
We refer to the lower resonance ( ω ) as the sheath resonance because it disappears as the sheath vanishes,
(10)
and we refer to ω + as the damped-plasma resonance because it converges to ωp as damping vanishes,
(11)
Further solving Eq. (9), we find that both resonances merge and disappear with large damping,7,36
(12)
We also create a second PIP model by subtracting the vacuum impedance from Eq. (8),
(13)
Both Eqs. (8) and (13) have the same real component. However, Eq. (13) has a resonance at
(14)
which isolates ωp from ν and t s h .

To better understand Z pip and Z diff , we plot both in Fig. 2 for t s h = 0.1 and ν = 0.4 . We choose these values because (i) they are values we have encountered experimentally and (ii) the three resonances ( ω ± and ωdiff) are distinctly visible in the imaginary components. The real components have a peak near the plasma frequency and a width that broadens with higher damping.16 

FIG. 2.

The real and imaginary components of both models ( Z pip and Z diff ) are shown for t s h = 0.1 and ν = 0.4 . The three resonances are indicated.

FIG. 2.

The real and imaginary components of both models ( Z pip and Z diff ) are shown for t s h = 0.1 and ν = 0.4 . The three resonances are indicated.

Close modal

So far, we have presented two models of the PIP when plasma is present (Zpip and Zdiff), and we recommend using Zpip for most cases (discussed further in Sec. IV). However, there are two cases where Zdiff may be preferred. First, Zdiff is less dependent on ν and therefore its measurements are less susceptible to noise when damping is high ( ν  1). This dependency on ν is apparent when comparing Eqs. (8) and (13), while considering Eq. (9). The resonant frequencies ( ω ± ) are heavily dependent upon ν , which are present in Zpip but not in Zdiff. At high damping, ω + and ω merge and disappear per Eq. (12), while ωp is isolated from ν and t s h per Eq. (14). Second, we resolved Zdiff using planar and cylindrical capacitors (in addition to spherical), and all three results provide the same ω diff = ω p resonance. This suggests that this result may be independent of probe geometry (i.e., by subtracting the vacuum measurement, we may be partially calibrating out the probe's geometry.) This implies that in cases where the probe's geometry is difficult to model, it may be possible to identify ωp by locating Im ( Z diff ) = 0 in a measurement alone (i.e., without the need for a model).

Despite building our models (Zvac, Zpip, and Zdiff) in electrical impedance (Z), we instead prefer doing analysis with the reflection coefficient,37,38
(15)
In this expression, Z0 is the characteristic impedance of the transmission lines (TLs), typically 50 Ω. We convert Z to Γ using Eq. (15) for both PIP measurements (vacuum and plasma) and our three PIP models, which results in Γvac, Γpip, and Γdiff. We prefer Γ because it results in lower uncertainty (see Sec. IV). Converting from Z to Γ does not change the location of the three resonances: ω ± and ωdiff.

The physical models (Sec. II A) include a number of assumptions, which both limit its applicability and introduce potential modeling errors: (i) The probe and sheath have a spherical geometry, without consideration of the protruding stem from the PIP's head. (ii) The plasma is cold (Te = 0), non-magnetized, and homogenous. (iii) The derivation of Eq. (6) assumes small amplitude signals of Vexc, oscillating around the probe potential ( | V probe V exc | / | V probe | 1 ).39 The small amplitude signal is also necessary to maintain a consistent sheath thickness. (iv) The monopole probe is modeled as a lumped element, where the probe scale is far smaller than the wavelength ( L / λ 1 ). (v) A quasi-electrostatic assumption is made for the monopole probe to model it as a capacitor, ignoring its inductive components, so that it does not radiate and only measures the near-field. (vi) The sheath is modeled as a homogeneous vacuum and the transition to the plasma region is discontinuous. Some of the errors associated with these assumptions have been quantified in our previous work.7 

The models above are designed for a PIP-monopole antenna, which is intended for non-magnetized plasmas. Although the PIP-monopole has previously been implemented in a magnetized plasma,40 we recommend using a PIP-dipole antenna in magnetized plasmas and taking measurements both along and across the magnetic field line. Blackwell has previously created a dipole circuit model41 that is based on work by Balmain.42 Please note that a balun transformer, a device used to balance the impedance between the dipole's two conductors, is required and will have to be correctly calibrated.

With the models established in Sec. II, we next turn to PIP setup, calibration, and analysis for both swept and pulsed methods. Pulsed setup and operation are discussed in our previous work.7 Both setups, diagramed in Fig. 3, have much in common despite apparent differences, and we discuss both below.

FIG. 3.

Diagram of the PIP setup for (a) swept PIP operation using a VNA and (b) pulsed PIP operation using an AWG and oscilloscope.

FIG. 3.

Diagram of the PIP setup for (a) swept PIP operation using a VNA and (b) pulsed PIP operation using an AWG and oscilloscope.

Close modal

Figure 4 shows our recent monopole antenna design. This probe was fabricated from a Pasternack RG401 semi-rigid coax cable where the outer conductor and dielectric were trimmed back to expose the inner conductor. Constructing the PIP-monopole in this way makes its stem easier to calibrate, as discussed below. The head was a two-piece, machined SS316 hollow sphere, and the inner conductor was attached with set screws. The head for our previous design7 was a drilled aluminum sphere that was press fit onto the inner conductor. Finally, our previous work7 also provides recommendations for determining monopole dimensions, including staying within a thin-sheath limit.

FIG. 4.

(a) PIP-monopole. (b) CAD drawing. Calibration planes 2 and 3 are discussed in Sec. III C.

FIG. 4.

(a) PIP-monopole. (b) CAD drawing. Calibration planes 2 and 3 are discussed in Sec. III C.

Close modal
The most notable feature of the swept PIP setup [Fig. 3(a)] is that it uses a VNA as both the stimulus and the measuring device, which simplifies PIP operation. Typical VNA acquisition rates are relatively slow and are determined by several factors, including hardware limits and the amount of averaging required to achieve a reasonable SNR. As a rough approximation, a higher-end VNA will have a maximum sweep rate of order 100 Hz assuming no averaging and measuring 103 samples.43 A VNA operates by transmitting low-voltage frequency sweeps to the PIP through a series of transmission lines (TLs). Upon arriving at the PIP, the voltage is attenuated, partially reflected, and phase shifted due, in part, to the dielectric properties of the sheath and plasma regions. The VNA measures both the reflected (Vrefl) to transmitted (Vtrans) voltages, and the ratio is the definition of the reflection coefficient,37,38
(16)

In this setup, the TLs include a DC-blocking filter, which protects the VNA from DC voltages and allows the PIP's head to electrically float. The coaxial cabling is RG316 with SMA connectors, securely routed, and kept at a constant temperature. Small changes in cable routing and temperature can result in calibration drift and therefore measurement error, especially at higher frequencies.44 

The TLs between the VNA and PIP add unwanted attenuation and phase shift to the PIP measurement. Calibration is the process of removing the contribution of the TLs and isolating the contribution of the PIP and surrounding dielectrics. In the RF engineering community, this is referred to as “moving the calibration plane.” PIP calibration consists of two steps and therefore has three calibration planes (cal. planes) shown in Figs. 3 and 4.

To assist with calibration, we intentionally built our PIP-monopole (Sec. III A) from a commercial, semi-rigid, coaxial cable, which provides two benefits. (i) It provides a convenient connector (e.g., SMA) that makes calibrating from cal. plane 1 to cal. plane 2 relatively simple. (ii) The stem of the PIP (the intact portion of the semi-rigid cable) can be modeled as a lossless transmission line, using the cable's published dielectric properties for calibrating from cal. plane 2 to cal. plane 3.

The first step (cal. plane 1 to 2) calibrates the transmission lines between the VNA and PIP's SMA connector. In this work, we use a 1-port error model7,45 which requires measurements of 3 RF standards at both cal. plane 1 (we refer to these as the “truth” measurements) and at cal. plane 2. Modern VNAs have built-in one-port error calibration procedures, but for our work, we perform the measurements manually and use scikit-rf 's OnePort calibration function.46 

The second step (cal. plane 2 to 3) calibrates the PIP's stem. Because there is no convenient connector (e.g., SMA) at cal. plane 3 to connect RF standards, we instead model the PIP's stem using a two-port, lossless transmission line model7,37 and the published dielectric constant of the stem. For our work, we build the model in scikit-rf and invert the model to de-embed (calibrate) the stem as described in  Appendix A.

 Appendix B shows an example calibration using both steps.

After acquiring and calibrating a Γpip measurement, the next step is to fit the model to the measurement in order to solve for the model's three unknowns: ωp, ν, and tsh. This requires several steps. First, we normalize ωp in Eq. (8) so that its value is roughly the same order as ν and t s h , and therefore the fitting routine weights each parameter more equally. Second, we convert our Zpip model [Eq. (8)] into Γpip by applying Eq. (15) to the model. Third, we trim our calibrated measurement to a finite frequency range, which is discussed in Sec. IV. Fourth, we fit our Γpip model to our Γpip measurement using a minimization function (specifically, scipy's minimize or least_squares functions) with a residual function that includes both the real and imaginary components of Γ. We use the same procedure above when fitting with Zdiff.

Figure 5 shows an example of the Γpip model fit to a calibrated, swept Γpip measurement. We attribute discrepancies between the model and the fit to the simplicity of model, which includes ignoring plasma gradients, ignoring nearby electrical conductors (i.e., the PIP's stem), and using a simplistic sheath model.

FIG. 5.

An example swept measurement is fit with the Γpip model. The calculated plasma parameters are ω p / 2 π = 373  MHz, n = 1.73 × 10 15 m−3, ν = 0.151 ( ν = 353 × 10 6 s 1 ), and t s h = 0.126 (tsh = 0.91 mm).

FIG. 5.

An example swept measurement is fit with the Γpip model. The calculated plasma parameters are ω p / 2 π = 373  MHz, n = 1.73 × 10 15 m−3, ν = 0.151 ( ν = 353 × 10 6 s 1 ), and t s h = 0.126 (tsh = 0.91 mm).

Close modal

The pulsed PIP setup, shown in Fig. 3(b), uses an AWG (arbitrary waveform generator) to transmit sequential, preprogrammed waveform pulses to the PIP. A custom circuit board (RFIV board)7 isolates signals proportional to the pulsed voltage (VRF) and currents (IRF), which are measured by an oscilloscope in the time domain. Because we are using a single, broad-spectrum pulse to measure the PIP's impedance (instead of a frequency sweep), we are able to achieve significantly higher acquisition rates (>1 MHz) but at the cost of lower SNR.

For our work, the AWG transmits a Gaussian monopulse,
(17)
which is the time derivative of a Gaussian distribution. Here, a and σmp are the amplitude and width of the Gaussian distribution, respectively. Figure 6(a) shows an example measurement of both measured outbound and reflected monopulses for both VRF and IRF. The measured impedance of a single pulse at the scope is
(18)
where FFT {   } is the fast Fourier transform. Z ( ω ) is then converted to Γ ( ω ) with Eq. (15). Figure 6(b) shows the calibrated Γpip measurement and subsequent fit (discussed in Sec. III G).
FIG. 6.

An example pulsed measurement and fit using the Γpip model. (a) Raw oscilloscope measurements of IRF and VRF. The outbound pulses occur at 0 ns, and the reflected pulses, due to line length, occur 25 ns later. (b) Processed and calibrated Γpip measurement and fit. Fit results: ω p / 2 π = 194  MHz, n = 4.67 × 10 14 m−3, ν = 0.185 ( ν = 225 × 10 6 s−1), and t s h = 0.148 (tsh = 1.60 mm).

FIG. 6.

An example pulsed measurement and fit using the Γpip model. (a) Raw oscilloscope measurements of IRF and VRF. The outbound pulses occur at 0 ns, and the reflected pulses, due to line length, occur 25 ns later. (b) Processed and calibrated Γpip measurement and fit. Fit results: ω p / 2 π = 194  MHz, n = 4.67 × 10 14 m−3, ν = 0.185 ( ν = 225 × 10 6 s−1), and t s h = 0.148 (tsh = 1.60 mm).

Close modal
The monopulse has two important parameters. The first is the inverse of the width, ω m p 1 / σ m p , which sets both the center frequency and frequency resolution of the pulse. This concept is most easily understood by plotting the monopulse's magnitude spectrum,
(19)
in Fig. 7. Here, F {   } is the Fourier transform. This plot shows that Eq. (19) is a distribution with a peak at ω = ω m p and a finite width. SNR is roughly defined as the ratio of this distribution to a noise floor, and SNR  1 is roughly required to resolve the monopulse. If the noise floor were, for example, 10% of the spectrum's peak, then the resolvable frequency range would be approximately 0.06 < ω / ω m p < 2.8 (shown in Fig. 7) with the highest SNR at ω / ω m p = 1 . By default, we typically choose ωmp ωp as discussed further in Sec. IV.
FIG. 7.

Magnitude spectrum of the Gaussian monopulse, normalized to its peak amplitude. The monopulse's resolvable frequency range is roughly defined as the frequencies where this distribution is greater than the noise floor. The highest SNR occurs at the peak ( ω / ω m p = 1 ) and falls off on either side.

FIG. 7.

Magnitude spectrum of the Gaussian monopulse, normalized to its peak amplitude. The monopulse's resolvable frequency range is roughly defined as the frequencies where this distribution is greater than the noise floor. The highest SNR occurs at the peak ( ω / ω m p = 1 ) and falls off on either side.

Close modal

The second important parameter is τ, which is the time between sequential pulses. The inverse of τ is the acquisition rate of the pulsed PIP system. The primary factor limiting the lower bound of τ is the time between the pulse and the settled reflected signal.7,18 Without sufficient time between pulses, new outbound pulses would overlap with the reflection (or their ringdowns) from previous pulses. A method of addressing this is to install the RFIV board in close proximity to the PIP in order to reduce the time delay between transmitted and reflected signals.

The calibration process for the swept and pulsed PIP approaches effectively uses the same calibration steps but with some additional nuance. First, the truth measurements of the 3 RF standards are measured directly by the VNA. The standards then are connected to the SMA connector at cal. plane 2 and measured by the oscilloscope. The impedance measurement from the oscilloscope, using Eq. (18), and the impedance measurement from the VNA are fed into the python scikit-rf OnePort calibration library.46 Using the apply_cal method from this library, we move the calibration plane from cal. plane 1 to cal. plane 2. Interpolation is likely required to ensure that the frequency bases for the two measurements match, as one measurement was made by the VNA and the other by the scope. The same approach described in Sec. III B is used to remove the effects of the probe stem and move the calibration plane from cal. plane 2 to cal. plane 3. When measuring the RF calibration standards, SNR can be improved by averaging over multiple pulses. As the precise value of ωp is not typically known in advance, we often mitigate this unknown by calibrating and then operating with multiple values of ωmp.

Because of the inherent trade-off between time resolution and SNR when using the pulsed method, careful analysis of the measurements is particularly important. There are several notable differences between the swept and pulsed methods.

The first is the careful selection of τ and ωmp as discussed in Secs. III E and III F. The second is using windowing functions. Before applying Eq. (18) to the raw measurements of V R F ( t ) and I R F ( t ) , we typically apply a Hann window with a width on order of 10 2   σ m p 10 3   σ m p to each measured pulse to suppress the noise floor between the sequential pulses. Optionally, sequential pulses can also be averaged.

Figure 6(b) shows the calibrated Γpip measurement and fit resulting from the raw data in Fig. 6(a).

In this work, we are arguing that our historical PIP analysis has not been optimized for SNR, and this has artificially lowered the PIP's upper density limit, decreased measurement quality, and reduced acquisition rates. In this section, we use a Monte Carlo (MC) uncertainty analysis47 to quantify improvements in SNR due to our updated model (Sec. II) and methods (Sec. III) and make recommendations for optimized PIP operation and analysis.

In summary, our MC uncertainty analysis takes the following form. (i) We develop a model for PIP measurements that includes Gaussian noise. (ii) We simulate a noisy PIP measurement for a fixed set of parameters and (iii) perform a fit to calculate its plasma properties. (iv) We repeat steps ii and iii a statistically significant number of times (e.g., 104), which allows the Gaussian distribution in the noise to propagate to each plasma parameter. (v) We quantify the uncertainty in each plasma parameter by taking the standard deviation of each parameter across the multiple fits. We then repeat this analysis for each set of desired hyperparameters (e.g., α and ωmp). Throughout the remainder of this section, we detail.

In developing our model for a noisy PIP measurement, we start with the definition of the reflection coefficient [Eq. (16)], which is the ratio of the reflected signal (Vrefl) from the PIP to the transmitted (Vtrans) signal to the PIP. We assume that only Vrefl is susceptible to noise as Vtrans is measured at the VNA before being transmitted. Therefore, a noisy measurement of Γ has the form
(20)
which includes the ideal PIP measurement ( Γ ideal V refl / V trans ) plus noise ( Γ noise V noise / V trans ). For Γideal, this analysis uses Eqs. (8) or (13). This analysis models Vnoise, the numerator of Γnoise, as a complex noise floor with the form
(21)
This expression's amplitude is a Gaussian or normal distribution, N ( 0 , α ) , with a zero mean and standard deviation, α. Equation (21) has a uniformly random phase shift, U ( 0 , 2 π ) , between 0 and 2 π with respect to Vtrans. For the swept method, we assume V trans ( ω ) = a , i.e., the transmitted signal has a constant amplitude, and therefore the noisy swept PIP model is
(22)
where α α / a is our adjustable noise parameter and 1 / α is effectively the SNR. For the pulsed method, we assume that V trans ( ω ) is a Gaussian monopulse and therefore equal to Eq. (19). The noisy pulsed PIP model is therefore
(23)
Note that Eq. (22) is dependent on a single parameter, α , and Eq. (23) is dependent on two: α and ωmp.

To better justify these models, we next attempt to isolate an experimental, pulsed measurement of Γnoise and compare it with our pulsed noise model [Eq. (23)]. Note that isolating a measurement of Γnoise is difficult because Eq. (20) more realistically has the form Γ meas = Γ model + Γ noise + Γ calibration _ error + Γ missing _ physics , where Γ missing _ physics includes physics not included in the model (e.g., density gradients and a more realistic sheath model). To minimize Γ missing _ physics and Γ calibration _ error , we start with a freshly calibrated, pulsed measurement (Γmeas) of the PIP in vacuum, instead of plasma. The measurement was performed with ω m p / 2 π = 100  MHz. We then subtract the fit of Γmeas [using Eq. (2a)] from our measurement to get our experimental measurement of Γnoise, which is shown in Fig. 8. To compare with the model, we replace the numerator in Eq. (23) with the fixed amplitude, 0.15 ( 1 + 1 j ) , and the result is an envelope that appears to reasonably capture the noise measurement distribution, including the minimum of variance at ωmp.

FIG. 8.

Comparison of an experimental, pulsed measurement of Γnoise with the envelope of the Γnoise model.

FIG. 8.

Comparison of an experimental, pulsed measurement of Γnoise with the envelope of the Γnoise model.

Close modal

With the noisy PIP models established, the next step is to simulate them. For both swept and pulsed approaches, we define frequency, ω, as a uniform set of N discrete frequencies with step size Δ ω = ( ω f ω i ) / ( N 1 ) , where ωi and ωf are the initial and final frequencies of the sweep, respectively. Unless otherwise specified, we use the following as default values for calculating Γmeas in the MC analysis: ω p / 2 π = 100  MHz, ν = 0.10 , t s = 0.10 , r m = 0.5  in. (12.7 mm), ω f = ω p , ω i = Δ ω = ω f / N , N = 10 3 , α = 10 4 , and ω m p = ω p . We choose these values because they are similar to our previous experimental measurements.

Next, we fit our simulated Γmeas with our models (Γpip or Γdiff) to provide measurements of density (n), electron damping (ν), and the sheath thickness (tsh). For fitting to Zpip, we convert Γmeas to Z with Eq. (15). Figure 9 shows an example simulated measurement and fit.

FIG. 9.

Example of a single simulation of a noisy, swept PIP measurement (Γmeas) with fit. N = 316 and α = 10 1 .

FIG. 9.

Example of a single simulation of a noisy, swept PIP measurement (Γmeas) with fit. N = 316 and α = 10 1 .

Close modal
Next, we repeat the previous two steps M = 10 4 times to generate M fit values for n, ν, and tsh. For each, we calculate the standard deviation (σ) and divide by their ideal value to get the normalized uncertainty, σ . For density, this takes the form
(24)
where nideal is the ideal density value used to generate Γideal. In addition to uncertainty, we also calculate a normalized bias error, β , for each plasma parameter. For density, this would be
(25)
where n is the average density from the fit results. For our work, β is consistently multiple orders of magnitude smaller than σ , and we therefore focus our analysis exclusively on σ .

In this and our previous work,7 we have alluded to several methods for extracting plasma properties from PIP measurements, which include fitting with Γpip (our recommended method), fitting with Zpip, fitting with Γdiff , and identifying the resonance at Im ( Γ diff ) = 0 (for density only). Our MC analysis allows us to compare the uncertainties associated with each method, and Fig. 10 shows the results. Note that for the Im ( Γ diff ) = 0 method, we identified the zero intercept by iteratively applying a low-pass, forward–backward, Butterworth filter to our noisy Γdiff measurement with a decreasing corner frequency until a single zero intercept remained. For this analysis, ω f = 1.5 ω p .

FIG. 10.

Uncertainty results for four analysis methods, as a function of α . Fitting with Γpip results in the lowest uncertainty in all three plasma properties (n, ν , and t ) compared with the other three methods.

FIG. 10.

Uncertainty results for four analysis methods, as a function of α . Fitting with Γpip results in the lowest uncertainty in all three plasma properties (n, ν , and t ) compared with the other three methods.

Close modal

Figure 10 shows that, of the four methods, fitting with Γpip consistently provides the lowest uncertainty, by up to 2 orders of magnitude (for density and damping) and up to 4 orders of magnitude (for sheath thickness). Note that the Zpip results are incomplete because low SNR caused fitting to become inconsistent above α 10 3 .

In the case of higher damping ( ν  1.0), fitting with Γdiff results in lower uncertainty than Γpip as shown in Fig. 11. This is because the magnitude of Im(Zdiff) is less dependent on ν than Im(Zpip) (see the discussion in Sec. II).

FIG. 11.

When damping is large ( ν 1 ), fitting with Γdiff results in lower uncertainties than fitting with Γpip.

FIG. 11.

When damping is large ( ν 1 ), fitting with Γdiff results in lower uncertainties than fitting with Γpip.

Close modal

When fitting swept and pulsed measurements with Γpip, there are a number of notable experimental and post-processing hyperparameters that impact measurement uncertainty: N, α , ωmp, ωi, and ωf. To investigate their impact, we perform the MC uncertainty analysis across a range of values for each hyperparameter.

Figure 12 shows the swept MC analysis for N and α with several notable results. First, the magnitude of the three uncertainties is consistently ordered: σ n σ t σ ν . Second, the uncertainties are linear in the log –log plot, meaning that each takes the form of a power function ( σ xb) where b is a scalar and x is either α or N. We performed fits for all three plasma parameters and found that the exponent, b, is 1.00 and −0.50 for α and N , respectively. We also determined that these dependencies were independent of each other, and therefore the uncertainties for σ n , σ ν , and σ t are all proportional to
(26)
FIG. 12.

MC uncertainty analysis provides the uncertainty results of n, ν , and t for variable α , and N, respectively, while holding the other values constant. Power function fits show good agreement for most of the domains.

FIG. 12.

MC uncertainty analysis provides the uncertainty results of n, ν , and t for variable α , and N, respectively, while holding the other values constant. Power function fits show good agreement for most of the domains.

Close modal

The α and N dependencies are intuitive because uncertainty should decrease with lower α (e.g., using more averaging) and with higher N (adding additional measurement points). Finally, we find the same relation in Eq. (26) for both swept and pulsed approaches.

The pulsed method introduces an additional parameter, ωmp, that sets the frequency resolution of the Gaussian monopulse. Figure 13 shows the uncertainty results across a range of ω m p / ω p and reveals that the uncertainties have a minimum at ω m p 2   ω p and also that there is a steep increase in uncertainty at ω m p 3   ω p . As ωp is generally not precisely known before taking a measurement, we recommend choosing ω m p ω p . These results are consistent across other values of ν and t s h .

FIG. 13.

Pulse peak uncertainty analysis. For the pulsed method, uncertainties have a minimum around ω m p 2   ω p but also a steep rise around ω m p 3   ω p .

FIG. 13.

Pulse peak uncertainty analysis. For the pulsed method, uncertainties have a minimum around ω m p 2   ω p but also a steep rise around ω m p 3   ω p .

Close modal

When using a VNA (i.e., the swept approach), we have independent control of ωi and ωf. Figure 14 shows the uncertainty analysis of σ n while varying both frequencies, and the two resonant frequencies, ( ω ,   ω + )  = (0.318, 0.994), are indicated. The results reveal two minima in σ n .

FIG. 14.

Uncertainty of n over a range of ωi and ωf for a fixed N and α. The lowest minimum is the rectangular region ( 0 < ω i < ω , ω < ω f < ω p ) and suggests that fitting only around ω is required.

FIG. 14.

Uncertainty of n over a range of ωi and ωf for a fixed N and α. The lowest minimum is the rectangular region ( 0 < ω i < ω , ω < ω f < ω p ) and suggests that fitting only around ω is required.

Close modal

The less prominent (higher) minimum occurs around ( ω i , ω f ) (1.0, 1.0) but for σn only. This is somewhat intuitive because ω + [Eq. (11)] has a strong dependence on ωp, which relates to density [Eq. (1)].

The more prominent (lower) minimum is roughly bounded by the rectangular region ( ω i < ω and ω f > ω ) for σ n . Analysis of σ ν and σ t shows this same minima. The location and depth of this minima indicates that the best fit occurs when the measured sweep straddles ω . This strongly suggests that ω sets the frequency resolution of the PIP rather than ωp as previously believed. We believe that this is likely due to the fact that ω is the location of Im(Γpip) = 0, the minimum of Re(Γpip), and is surrounded by several inflection points and the largest magnitude of curvature (see Fig. 9). Arguably, it is fitting to these features, in addition to normalizing with Γ, that leads to the most accurate results.

This finding has two interesting implications. (i) This suggests that the community has been spectrally over-resolving PIP measurements. Resolving only up to ω (and not up to ωp) may effectively extend the PIP's upper density limit. In this example, ω is roughly half an order of magnitude less than ωp, which relates to a full order of magnitude in density resolution [Eq. (1)]. Note that ω is strongly dependent on t s h [Eq. (10)], and therefore this potential benefit only applies when the sheath is thin. (ii) Further reducing ω by deliberately decreasing t s h [Eq. (4)] has the potential to increase the PIP's density limit. Possible methods to do this include using a larger probe radius and electrically DC biasing the PIP at or near the plasma potential.

In summary, we recommend the following best practices to maximize PIP SNR. We recommend fitting Γpip to measurements if ν < 1 but fitting with Γdiff if ν > 1 . For N with the swept method, we recommend using a reasonably large number (e.g., 103 or 104) that still provides an adequate acquisition rate. While we do not have direct control over noise, α , we can use techniques such as averaging to reduce it. For ωmp, we nominally recommend ω m p = ω p and also recommend using multiple values to safeguard against an uncertain ωp.

An interesting result from this section is that ω appears to be the frequency that sets the upper density limit of the PIP and not ωp as previously believed. This effectively extends the PIP's density limit, particularly when the sheath is “thin.” Therefore, when choosing ωi and ωf, we recommend values that straddle ω while also adjusting these values appropriately to safeguard against variability in ω .

The goal of this work has been to provide an approach to PIP analysis that increases measurement SNR in order to improve overall measurement quality, extend the upper density limit, increase acquisition rates, and allow the probe to be more accessible in the laboratory environment. To achieve this, we presented our PIP design and model, our approach to PIP operation, calibration, and analysis, and finally a Monte Carlo uncertainty analysis that identified a number of operational and analysis steps that collectively improve SNR by multiple orders of magnitude. We additionally provided evidence that the sheath resonance (and not the plasma frequency as previously believed) effectively sets the PIP's upper density limit, which has implications in additionally extending the PIP's upper density limit.

In this work, we have also identified several paths for future work. These include identifying the new value of the PIP's upper density limit and actively reducing the normalized sheath thickness to further increase the upper density limit. While this work focuses on DC discharges, the PIP is also applicable to RF plasmas, with sources operating at ωRF. Specifically, we think that operating the PIP with the pulsed method at ω m p ω R F in conjunction with high-pass filters ( ω R F < ω filter ω m p ) would allow the PIP to investigate RF-oscillating sheaths without interference from the RF source. Alternatively, the PIP could be operated with continuous sweeps to capture time-averaged sheaths in an RF plasma. Finally, we believe that PIPs are an ideal candidate for educational plasma laboratories, particularly with the availability of commercial VNAs on the internet that are under $100 and capable of resolving frequencies >1 GHz.

This work was supported by NRL base funding and M.C.P was specifically funded by the 2023-2024 Karle Fellowship. J.W.B. wishes to thank his mentors, Mike McDonald and Erik Tejero, for their assistance, without which this work would not be possible. J.W.B. wishes to thank Jeffrey Bynum for his assistance with technical drawings. J.W.B. also wishes to thank his late teacher, Dr. Hugh W. Coleman,47 for teaching him the importance of quantifying measurement uncertainty.

The authors have no conflicts to disclose.

J. W. Brooks: Conceptualization (equal); Data curation (equal); Formal analysis (equal); Investigation (equal); Methodology (equal); Software (equal); Validation (equal); Visualization (equal); Writing – original draft (equal); Writing – review & editing (equal). M. C. Paliwoda: Formal analysis (equal); Investigation (equal); Validation (equal); Writing – original draft (equal); Writing – review & editing (equal).

The data that support the findings of this study are openly available in Zenodo, Ref. 48.

In order to calibrate the PIP's stem, we construct a two-port model of the stem using an ideal, lossless transmission line (TL) model,37,38 which is expressed in S (scattering) parameters in the following form:
(A1)
Here, L is the length of the TL, j is the imaginary number, ω is the angular frequency, v p = c / ε r is the velocity of propagation of the transmission line, εr is the published relative dielectric constant of the TL, and c is the speed of light in vacuum. The resulting matrix can then be passed to scikit-rf 's Network function.46 Note that Eq. (A1) is only accurate when L is much smaller than the attenuation scale length of the TL's dielectric. If this condition is violated, an attenuation (i.e., loss) term could be inserted into Eq. (A1).

Figure 15 shows an uncalibrated PIP measurement and how the measurement visually changes as each calibration step is applied. Cal. plane 1 is the raw, uncalibrated PIP measurement. Its “oscillatory” appearance is due to the phase shift caused by the length of transmission line between the VNA and the PIP-monopole. Cal. plane 2 is the partially calibrated PIP measurement that still contains contributions from the PIP and its stem and shows a small phase shift ( < 2 π ). Cal. plane 3 shows the fully calibrated measurement, where both ω ± are apparent. The calibration process is detailed in Sec. III C.

FIG. 15.

Example measured signals at each calibration plane (cal. plane): the uncalibrated PIP measurement (cal. plane 1), partially calibrated measurement (cal. plane 2), and fully calibrated measurement (cal. plane 3).

FIG. 15.

Example measured signals at each calibration plane (cal. plane): the uncalibrated PIP measurement (cal. plane 1), partially calibrated measurement (cal. plane 2), and fully calibrated measurement (cal. plane 3).

Close modal
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