A large volume (hundreds of cm3) plasma is created by a 193 nm laser ionizing an organic vapor, tetrakis(dimethyl-amino)ethylene (TMAE). The plasma is characterized as high electron density and low electron temperature (∼0.1 eV). To investigate the plasma decay processes, a fast Langmuir probe technique is developed, including detailed considerations of probe structure, probe surface cleaning, shielding, frequency response of the detection system, physical processes in probe measurement, dummy probe corrections as well as noise analysis. The mechanisms for the plasma decay are studied and a delayed ionization process following the laser pulse is found to be important. This mechanism is also supported by optical emission measurements which show that nitrogen enhances the delayed emission from TMAE plasma. A model combining electron–ion recombination and delayed ionization is utilized together with experimental results to order the terms and calculate the relaxation times for delayed ionization. The relaxation times are longer for lower TMAE pressures and lower electron densities.
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January 2001
Research Article|
January 01 2001
Diagnostics and analyses of decay process in laser produced tetrakis(dimethyl-amino)ethylene plasma
Guowen Ding;
Guowen Ding
Department of Electrical and Computer Engineering, University of Wisconsin—Madison, Wisconsin 53706-1687
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John E. Scharer;
John E. Scharer
Department of Electrical and Computer Engineering, University of Wisconsin—Madison, Wisconsin 53706-1687
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Kurt L. Kelly
Kurt L. Kelly
Department of Electrical and Computer Engineering, University of Wisconsin—Madison, Wisconsin 53706-1687
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Phys. Plasmas 8, 334–342 (2001)
Article history
Received:
January 03 2000
Accepted:
October 04 2000
Citation
Guowen Ding, John E. Scharer, Kurt L. Kelly; Diagnostics and analyses of decay process in laser produced tetrakis(dimethyl-amino)ethylene plasma. Phys. Plasmas 1 January 2001; 8 (1): 334–342. https://doi.org/10.1063/1.1329154
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