Cross section data are compiled from the literature for electron collisions with nitrogen trifluoride (NF3) molecules. Cross sections are collected and reviewed for total scattering, elastic scattering, momentum transfer, excitations of rotational and vibrational states, dissociation, ionization, and dissociative attachment. For each of these processes, the recommended values of the cross sections are presented. The literature has been surveyed until end of 2016.
References
1.
S.
Huang
, V.
Volynets
, J. R.
Hamilton
, S.
Lee
, I.-C.
Song
, S.
Lu
, J.
Tennyson
, and M. J.
Kushner
, “Insights to scaling remote plasma sources sustained in NF3 mixtures
,” J. Vac. Sci. Technol., A
35
, 031302
(2017
).2.
L.
Pruette
, S.
Karecki
, R.
Chatterjee
, R.
Reif
, T.
Sparks
, and V.
Vartanian
, “High density plasma oxide etching using nitrogen trifluoride and acetylene
,” J. Vac. Sci. Technol., A
18
, 2749
–2758
(2000
).3.
J. M.
Veilleux
, M. S.
El-Genk
, E. P.
Chamberlin
, C.
Munson
, and J.
FitzPatrick
, “Etching of UO2 in NF3 RF plasma glow discharge
,” J. Nucl. Mater.
277
, 315
–324
(2000
).4.
G.
Bruno
, P.
Capezzuto
, G.
Cicala
, and P.
Manodoro
, “Study of the NF3 plasma cleaning of reactors for amorphous-silicon deposition
,” J. Vac. Sci. Technol., A
12
, 690
–698
(1994
).5.
B. E. E.
Kastenmeier
, P. J.
Matsuo
, G. S.
Oehrlein
, and J. G.
Langan
, “Remote plasma etching of silicon nitride and silicon dioxide using NF3/O2 gas mixtures
,” J. Vac. Sci. Technol., A
16
, 2047
–2056
(1998
).6.
F. H. C.
Goh
, S. M.
Tan
, K.
Ng
, H. A.
Naseem
, W. D.
Brown
, and A. M.
Hermann
, in Amorphous Silicon
, edited by P. C.
Taylor
, M. J.
Thompson
, P. G.
Lecomber
, Y.
Hamakaura
, and A.
Madan
(MRS
, Pittsburgh, PA
1990
), pp. 75
–80
.7.
S.
Kurtz
, R.
Reedy
, B.
Keyes
, G.
Barber
, J.
Geisz
, D.
Friedman
, W.
McMahon
, and J.
Olson
, “Evaluation of NF3 versus dimethylhydrazine as N sources for GaAsN
,” J. Crystal Growth
234
, 323
–326
(2002
).8.
J. B.
Park
, J. S.
Oh
, E.
Gil
, S.-J.
Kyoung
, J.-S.
Kim
, and G. Y.
Yeom
, “Plasma texturing of multicrystalline silicon for solar cell using remote-type pin-to-plate dielectric barrier discharge
,” J. Phys. D: Appl. Phys.
42
, 215201
(2009
).9.
J.
Gao
, H.
Zhu
, Y.
Wang
, Z.
Wang
, F.
Guan
, J.
Ni
, J.
Yin
, L.
Lan
, Y.
Bai
, Y.
Ma
, Y.
Mai
, M.
Wan
, and Y.
Huang
, “Improvement of a-Si:H solar cell performance by SiH4 purging treatment
,” Vacuum
89
, 7
–11
(2013
).10.
M. C.
Lin
, “Chemical HF lasers from NF3–H2 and NF3–C2H6 systems
,” J. Chem. Phys.
75
, 284
–286
(1971
).11.
A. M.
Razhev
, D. S.
Churkin
, E. S.
Kargapol’tsev
, and S. V.
Demchuk
, “Pulsed inductive HF laser
,” Quantum Electron.
46
, 210
–212
(2016
).12.
N.
Posseme
, V.
Ah-Leung
, O.
Pollet
, C.
Arvet
, and M.
Garcia-Barros
, “Thin layer etching of silicon nitride: A comprehensive study of selective removal using NH3/NF3 remote plasma
,” J. Vac. Sci. Technol., A
34
, 061301
(2016
).13.
K.-C.
Yang
, S.-W.
Park
, and G.-Y.
Yeom
, “Low global warming potential alternative gases for plasma chamber cleaning
,” Sci. Adv. Mater.
8
, 2253
–2259
(2016
).14.
C.
Szmytkowski
, A.
Domaracka
, P.
Możejko
, E.
Ptasińska-Denga
, Ł.
Kłosowski
, M.
Piotrowicz
, and G.
Kasperski
, “Electron collisions with nitrogen trifluoride NF3 molecules
,” Phys. Rev. A
70
, 032707
(2004
).15.
L.
Boesten
, Y.
Tachibana
, Y.
Nakano
, T.
Shinohara
, H.
Tanaka
, and M.
Dillon
, “Vibrationally inelastic and elastic cross sections for e−-NF3 collisions
,” J. Phys. B: At., Mol. Opt. Phys.
29
, 5475
–5492
(1996
).16.
V.
Tarnovsky
, A.
Levin
, K.
Becker
, R.
Basner
, and M.
Schmidt
, “Electron impact ionization of the NF3 molecule
,” Int. J. Mass Spectrom.
133
, 175
–185
(1994
).17.
P. D.
Haaland
, C. Q.
Jiao
, and A.
Garscadden
, “Ionization of NF3 by electron impact
,” Chem. Phys. Lett.
340
, 479
(2001
).18.
M.
Rahman
, S.
Gangopadhyay
, C.
Limbachiya
, K.
Joshipura
, and E.
Krishnakumar
, “Electron ionization of NF3
,” Int. J. Mass Spectrom.
319
, 48
–54
(2012
).19.
P. W.
Harland
and J. L.
Franklin
, “Partitioning of excess energy in dissociative resonance capture processes
,” J. Chem. Phys.
61
, 1621
–1636
(1974
).20.
D.
Nandi
, S. A.
Rangwala
, S. V. K.
Kumar
, and E.
Krishnakumar
, “Absolute cross sections for dissociative electron attachment to NF3
,” Int. J. Mass Spectrom.
205
, 111
–117
(2001
).21.
P.
Chantry
, “Dissociative attachment cross-section measurements in F2 and NF3
,” Bull. Am. Phys. Soc.
24
, 134
(1979
).22.
T. N.
Rescigno
, “Low-energy electron collision processes in NF3
,” Phys. Rev. A
52
, 329
–333
(1995
).23.
E.
Joucoski
and M. H. F.
Bettega
, “Elastic scattering of low-energy electrons by NF3
,” J. Phys. B: At., Mol. Opt. Phys.
35
, 783
–793
(2002
).24.
B.
Goswami
, R.
Naghma
, and B.
Antony
, “Cross sections for electron collisions with NF3
,” Phys. Rev. A
88
, 032707
(2013
).25.
J. R.
Hamilton
, J.
Tennyson
, S.
Huang
, and M. J.
Kushner
, “Calculated cross sections for electron collisions with NF3, NF2 and NF
,” Plasma Sources Sci. Technol.
26
, 065010
(2017
).26.
V.
Lisovskiy
, V.
Yegorenkov
, P.
Ogloblina
, J.-P.
Booth
, S.
Martins
, K.
Landry
, D.
Douai
, and V.
Cassagne
, “Electron transport parameters in NF3
,” J. Phys. D: Appl. Phys.
47
, 115203
(2014
).27.
R. D.
Johnson
, “NIST computational chemistry comparison and benchmark database, NIST standard reference database number 101,” Release 17b, III (2015
).28.
S. E.
Novick
, W.
Chen
, M. R.
Munrow
, and K. J.
Grant
, “Hyperfine structure in the microwave spectrum of NF3
,” J. Mol. Spectrosc.
179
, 219
–222
(1996
).29.
CRC Handbook of Chemistry and Physics
, edited by F.
Macdonald
and D.
Lide
(CRC Press
, Boca Raton
, 2003-2004
).30.
D. H.
Shi
, J. F.
Sun
, Z. L.
Zhu
, and Y. F.
Liu
, “Total cross sections of electron scattering by molecules NF3, PF3, N(CH3)3, P(CH3)3, NH(CH3)2, PH(CH3)2, NH2CH3 and PH2CH3 at 30-5000 eV
,” Eur. Phys. J. D
57
, 179
–186
(2010
).31.
G.
Karwasz
, T.
Wróblewski
, R.
Brusa
, and E.
Illenberger
, “Electron scattering on triatomic molecules: The need for data
,” Jpn. J. Appl. Phys., Part 1
45
, 8192
(2006
).32.
M. H. F.
Bettega
, C.
Winstead
, and V.
McKoy
, “Low-energy electron scattering by N2O
,” Phys. Rev. A
74
, 022711
(2006
).33.
M.-Y.
Song
, J.-S.
Yoon
, H.
Cho
, Y.
Itikawa
, G. P.
Karwasz
, V.
Kokoouline
, Y.
Nakamura
, and J.
Tennyson
, “Cross sections for electron collisions with methane
,” J. Phys. Chem. Ref. Data
44
, 023101
(2015
).34.
A.
Zecca
, G.
Karwasz
, R.
Brusa
, and R.
Grisenti
, “Absolute total cross section measurements for intermediate-energy electron scattering. IV. Kr and Xe
,” J. Phys. B: At., Mol. Opt. Phys.
24
, 2737
(1999
).35.
A.
Zecca
, G. P.
Karwasz
, and R. S.
Brusa
, “Electron scattering by Ne, Ar and Kr at intermediate and high energies, 0.5-10 keV
,” J. Phys. B: At., Mol. Opt. Phys.
33
, 843
(2000
).36.
J.
Tennyson
, D. B.
Brown
, J. J.
Munro
, I.
Rozum
, H. N.
Varambhia
, and N.
Vinci
, “Quantemol-N: An expert system for performing electron molecule collision calculations using the R-matrix method
,” J. Phys. Conf. Series
86
, 012001
(2007
).37.
J. M.
Carr
, P. G.
Galiatsatos
, J. D.
Gorfinkiel
, A. G.
Harvey
, M. A.
Lysaght
, D.
Madden
, Z.
Masin
, M.
Plummer
, and J.
Tennyson
, “UKRmol: A low-energy electron- and positron-molecule scattering suite
,” Eur. Phys. J. D
66
, 58
(2012
).38.
D. T.
Stibbe
and J.
Tennyson
, “Near-threshold electron impact dissociation of H2
,” New J. Phys.
1
, 2
(1998
).39.
V. I.
Vedeneyev
, L. V.
Gurvich
, V. N.
Kondrat'ev
, V. A.
Medvedev
, and E. L.
Frankevich
, “Chemical Bond Energies, Ionization Potentials and Electron Affinities
” (Edward Arnold, Ltd.
, London
, 1966
), translation of 1962 Russian edition.40.
A.
Kennedy
and C. B.
Colburn
, “Strength of the N–F bonds in NF3 and of N–F and N–N bonds in N2F4
,” J. Chem. Phys.
35
, 1892
–1893
(1961
).41.
W. J.
Brigg
, J.
Tennyson
, and M.
Plummer
, “R-matrix calculations of low-energy electron collisions with methane
,” J. Phys. B: At., Mol. Opt. Phys.
47
, 185203
(2014
).42.
S.-I.
Chu
and A.
Dalgarno
, “Rotational excitation of CH+ by electron impact
,” Phys. Rev. A
10
, 788
–792
(1974
).43.
K. L.
Baluja
, N. J.
Mason
, L. A.
Morgan
, and J.
Tennyson
, “Electron scattering from ClO using the R-matrix method
,” J. Phys. B: At., Mol. Opt. Phys.
33
, L677
–L684
(2000
).44.
D. P.
Seccombe
, R. P.
Tuckett
, H.-W.
Jochims
, and H.
Baumgärtel
, “The observation of fluorescence from excited states of NF2 and NF following the photodissociation of NF3 in the 11–30 eV range
,” Chem. Phys. Lett.
339
, 405
–412
(2001
).45.
Y.-K.
Kim
and M. E.
Rudd
, “Binary-encounter-dipole model for electron-impact ionization
,” Phys. Rev. A
50
, 3954
–3967
(1994
).46.
M. T.
Elford
, in Photon and Electron Interactions with Atoms, Molecules, and Ions, Landolt-Börnstein: Numerical Data and Functional Relationships in Science and Technology/Elementary Particles, Nuclei and Atoms
, edited by W.
Martinenssen
(Springer
, New York
, 2003
), Vol. 17.47.
V.
Tarnovsky
, A.
Levin
, and K.
Becker
, “Absolute cross sections for the electron impact ionization of the NF2 and NF free radicals
,” J. Chem. Phys.
100
, 5626
–5630
(1994
).48.
R. C.
Wetzel
, F. A.
Baiocchi
, T. R.
Hayes
, and R. S.
Freund
, “Absolute cross sections for electron-impact ionization of the rare-gas atoms by the fast-neutral-beam method
,” Phys. Rev. A
35
, 559
–577
(1987
).49.
E.
Krishnakumar
and S. K.
Srivastava
, “Ionisation cross sections of rare-gas atoms by electron impact
,” J. Phys. B: At., Mol. Opt. Phys.
21
, 1055
–1082
(1988
).50.
M. R.
Bruce
and R. A.
Bonham
, “On the partial ionization cross-sections for CF4 by use of the pulsed-electron-beam time-of-flight method
,” Int. J. Mass Spectrom.
123
, 97
–100
(1993
).51.
W. M.
Huo
, V.
Tarnovsky
, and K. H.
Becker
, “Total electron-impact ionization cross-sections of CFx and NFx (x = 1–3)
,” Chem. Phys. Lett.
358
, 328
–336
(2002
).52.
G. P.
Karwasz
, P.
Możejko
, and M.-Y.
Song
, “Electron-impact ionization of fluoromethanes—Review of experiments and binary-encounter models
,” Int. J. Mass Spectrom.
365
, 232
–237
(2014
).53.
R. M.
Reese
and V. H.
Dibeler
, “Ionization and dissociation of nitrogen trifluoride by electron impact
,” J. Chem. Phys.
24
, 1175
–1177
(1956
).54.
K.
Nygaard
, H.
Brooks
, and S.
Hunter
, “Negative ion production rates in rare gas-halide lasers
,” IEEE J. Quantum Electron.
15
, 1216
–1223
(1979
).55.
V. K.
Lakdawala
and J. L.
Moruzzi
, “Measurements of attachment coefficients in NF3 -nitrogen and NF3 -rare gas mixtures using swarm techniques
,” J. Phys. D: Appl. Phys.
13
, 377
–386
(1980
).56.
N.
Ruckhaberle
, L.
Lehmann
, S.
Matejcik
, E.
Illenberger
, Y.
Bouteiller
, V.
Periquet
, L.
Museur
, C.
Desfrançois
, and J.-P.
Schermann
, “Free electron attachment and Rydberg electron transfer to NF3 molecules and clusters
,” J. Phys. Chem. A
101
, 9942
–9947
(1997
).57.
M.-Y.
Song
, J.-S.
Yoon
, H.
Cho
, Y.
Itikawa
, G. P.
Karwasz
, V.
Kokoouline
, Y.
Nakamura
, and J.
Tennyson
, “Cross sections for electron collisions with acetylene
,” J. Phys. Chem. Ref. Data
46
, 013106
(2017
).© 2017 AIP Publishing LLC for the National Institute of Standards and Technology.
2017
AIP Publishing LLC for the National Institute of Standards and Technology
You do not currently have access to this content.