Electron attachment to SOF2, SOCl2, SO2F2, SO2FCl, and SO2Cl2 was studied with two flowing-afterglow Langmuir-probe apparatuses over the temperature range 300–900 K. Attachment rate coefficients at 300 K are ka=2.6±0.8×1010(SOF2), 1.8±0.5×108(SOCl2), 4.8±0.7×1010(SO2F2), 2.4±0.7×109(SO2Cl2), and 2.0±0.6×107cm3s1(SO2FCl). Arrhenius plots of the data imply activation energies of 56±22meV(SOF2), 92±40(SO2F2), 44±22meV(SOCl2), and 29±15meV(SO2Cl2). The rate coefficients for SO2FCl decrease slightly with temperature, commensurate with the decrease in the capture rate coefficient. Electron attachment to SOF2 and SO2F2 is nondissociative, while reaction with SOCl2, SO2FCl, and SO2Cl2 is dissociative. Dissociative attachment is dominated by channels arising from S–Cl bond cleavage but also includes a minor channel forming a dihalide product ion. Branching fraction data are reported for the dissociative attachment channels.

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