Electron attachment to sulfur oxyhalides: $SOF2$⁠, $SOCl2$⁠, $SO2F2$⁠, $SO2Cl2$⁠, and $SO2FCl$ attachment rate coefficients, 300–900 K

Electron attachment to $SOF2$⁠, $SOCl2$⁠, $SO2F2$⁠, $SO2FCl$⁠, and $SO2Cl2$ was studied with two flowing-afterglow Langmuir-probe apparatuses over the temperature range 300–900 K. Attachment rate coefficients at 300 K are $ka=2.6±0.8×10−10(SOF2)$⁠, $1.8±0.5×10−8(SOCl2)$⁠, $4.8±0.7×10−10(SO2F2)$⁠, $2.4±0.7×10−9(SO2Cl2)$⁠, and $2.0±0.6×10−7cm3s−1(SO2FCl)$⁠. Arrhenius plots of the data imply activation energies of $56±22meV(SOF2)$⁠, $92±40(SO2F2)$⁠, $44±22meV(SOCl2)$⁠, and $29±15meV(SO2Cl2)$⁠. The rate coefficients for $SO2FCl$ decrease slightly with temperature, commensurate with the decrease in the capture rate coefficient. Electron attachment to $SOF2$ and $SO2F2$ is nondissociative, while reaction with $SOCl2$⁠, $SO2FCl$⁠, and $SO2Cl2$ is dissociative. Dissociative attachment is dominated by channels arising from S–Cl bond cleavage but also includes a minor channel forming a dihalide product ion. Branching fraction data are reported for the dissociative attachment channels.