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Issues
15 October 2001
ISSN 0021-8979
EISSN 1089-7550
In this Issue
LASERS, OPTICS, AND OPTOELECTRONICS (PACS 42)
Generalized model for all-optical light modulation in bacteriorhodopsin
J. Appl. Phys. 90, 3679–3688 (2001)
https://doi.org/10.1063/1.1403679
PLASMAS AND ELECTRICAL DISCHARGES (PACS 51-52)
Electron diode with a large area ferroelectric plasma cathode
J. Appl. Phys. 90, 3689–3698 (2001)
https://doi.org/10.1063/1.1402149
Plasma potential in the presence of an external electric field
J. Appl. Phys. 90, 3713–3719 (2001)
https://doi.org/10.1063/1.1394901
Absorption of extreme ultraviolet light in a laser produced gas-jet plasma source
J. Appl. Phys. 90, 3726–3734 (2001)
https://doi.org/10.1063/1.1403681
Experimental study and simulations of electronegative discharges at low pressure
J. Appl. Phys. 90, 3735–3742 (2001)
https://doi.org/10.1063/1.1392967
Metallic contamination in hydrogen plasma immersion ion implantation of silicon
J. Appl. Phys. 90, 3743–3749 (2001)
https://doi.org/10.1063/1.1404422
STRUCTURAL, MECHANICAL THERMODYNAMIC, AND OPTICAL PROPERTIES OF CONDENSED MATTER (PACS 61-68, 78)
Green function method for nonlinear elastic waves in layered media
J. Appl. Phys. 90, 3762–3770 (2001)
https://doi.org/10.1063/1.1392960
Evolution of hydrogen and helium co-implanted single-crystal silicon during annealing
Xinzhong Duo; Weili Liu; Miao Zhang; Lianwei Wang; Chenglu Lin; M. Okuyama; M. Noda; Wing-Yiu Cheung; S. P. Wong; Paul K. Chu; Peigang Hu; S. X. Wang; L. M. Wang
J. Appl. Phys. 90, 3780–3786 (2001)
https://doi.org/10.1063/1.1389478
Photoemission study of the effect of thermal annealing on surfaces
J. Appl. Phys. 90, 3787–3791 (2001)
https://doi.org/10.1063/1.1405133
Simultaneous experimental evaluation of In and N concentrations in InGaAsN quantum wells
J. Appl. Phys. 90, 3792–3798 (2001)
https://doi.org/10.1063/1.1402139
Bulk diffusion measurements to study the effectiveness of barrier layers: I. Mathematical treatment
J. Appl. Phys. 90, 3799–3809 (2001)
https://doi.org/10.1063/1.1402150
Study of copper silicide retardation effects on copper diffusion in silicon
J. Appl. Phys. 90, 3822–3824 (2001)
https://doi.org/10.1063/1.1343518
Optical properties of Ag and Au nanowire gratings
J. Appl. Phys. 90, 3825–3830 (2001)
https://doi.org/10.1063/1.1404425
Characterization of holographic polymer dispersed liquid crystal transmission gratings
J. Appl. Phys. 90, 3831–3837 (2001)
https://doi.org/10.1063/1.1405821
Generalized anisotropic ellipsometry applied to an organic single crystal: Potassium acid phthalate
J. Appl. Phys. 90, 3838–3842 (2001)
https://doi.org/10.1063/1.1402967
Modification of Co/Pt multilayers by gallium irradiation—Part 1: The effect on structural and magnetic properties
J. Appl. Phys. 90, 3843–3849 (2001)
https://doi.org/10.1063/1.1401803
Wafer bonding of different III–V compound semiconductors by atomic hydrogen surface cleaning
J. Appl. Phys. 90, 3856–3862 (2001)
https://doi.org/10.1063/1.1403684
Enhanced ultraviolet photoconductivity in semiconducting thin films
J. Appl. Phys. 90, 3863–3866 (2001)
https://doi.org/10.1063/1.1396829
Damage buildup in Si under bombardment with MeV heavy atomic and molecular ions
J. Appl. Phys. 90, 3867–3872 (2001)
https://doi.org/10.1063/1.1404426
Electrical activation of ultralow energy As implants in Si
J. Appl. Phys. 90, 3873–3878 (2001)
https://doi.org/10.1063/1.1403672
Chemical vapor deposition of Si on chlorosilane-treated surfaces. I. Suppression and enhancement of Si nucleation
J. Appl. Phys. 90, 3879–3886 (2001)
https://doi.org/10.1063/1.1402977
Origin of point defects in epilayer obtained from photoluminescence measurement
J. Appl. Phys. 90, 3894–3898 (2001)
https://doi.org/10.1063/1.1405132
Initial formation and growth of an amorphous phase in Al–Pt thin films and multilayers: Role of diffusion
J. Appl. Phys. 90, 3899–3904 (2001)
https://doi.org/10.1063/1.1403682
Strong localization of Bloch photons in dual-periodic dielectric multilayer structures
J. Appl. Phys. 90, 3905–3909 (2001)
https://doi.org/10.1063/1.1405832
Quantitative C lattice site distributions in epitaxial layers
J. Appl. Phys. 90, 3910–3918 (2001)
https://doi.org/10.1063/1.1402137
Switchable yttrium–hydride mirrors grown on A x-ray photoelectron spectroscopy and diffraction study
J. Appl. Phys. 90, 3925–3933 (2001)
https://doi.org/10.1063/1.1405835
ELECTRONIC STRUCTURE AND TRANSPORT (PACS 71-73)
Amplification of transverse acoustic phonons in quantum well heterostructures with piezoelectric interaction
J. Appl. Phys. 90, 3934–3941 (2001)
https://doi.org/10.1063/1.1402145
Enhancement of electrical conductivity in crystals doped with magnesium
J. Appl. Phys. 90, 3942–3951 (2001)
https://doi.org/10.1063/1.1402669
Dispersion-related assessments of temperature dependences for the fundamental band gap of hexagonal GaN
J. Appl. Phys. 90, 3956–3964 (2001)
https://doi.org/10.1063/1.1402147
Spectroscopic properties of as a saturable absorber
John B. Gruber; Dhiraj K. Sardar; Larry D. Merkle; Bahram Zandi; Richard Jarman; J. Andrew Hutchinson
J. Appl. Phys. 90, 3965–3972 (2001)
https://doi.org/10.1063/1.1396833
Relaxation dynamics of hot carriers and phonons in semiconductors: Influence of the excitation conditions
J. Appl. Phys. 90, 3973–3978 (2001)
https://doi.org/10.1063/1.1402138
N-type negative differential conductance in quasiballistic single-barrier heterostructures
J. Appl. Phys. 90, 3979–3983 (2001)
https://doi.org/10.1063/1.1404420
Interface photoluminescence in type II broken-gap single heterostructures
J. Appl. Phys. 90, 3988–3992 (2001)
https://doi.org/10.1063/1.1402968
Effect of impurity band conduction on the electrical characteristics of n-type
J. Appl. Phys. 90, 3993–3997 (2001)
https://doi.org/10.1063/1.1403666
Contribution of injection in current noise due to generation and recombination of carriers in junctions
J. Appl. Phys. 90, 3998–4006 (2001)
https://doi.org/10.1063/1.1403676
Tuning the hopping conductivity of films by ion bombardment at different temperatures
J. Appl. Phys. 90, 4007–4018 (2001)
https://doi.org/10.1063/1.1380215
Current crowding and noise in polycrystalline silicon thin film transistors
J. Appl. Phys. 90, 4019–4026 (2001)
https://doi.org/10.1063/1.1404418
Electronic states in modulation doped p-AlGaN/GaN superlattices
A. Y. Polyakov; N. B. Smirnov; A. V. Govorkov; A. V. Osinsky; P. E. Norris; S. J. Pearton; J. Van Hove; A. M. Wowchack; P. P. Chow
J. Appl. Phys. 90, 4032–4038 (2001)
https://doi.org/10.1063/1.1405819
MAGNETISM AND SUPERCONDUCTIVITY (PACS 74-76)
Magnetic properties and x-ray photoelectron spectroscopy study of NiO/NiFe films prepared by magnetron sputtering
J. Appl. Phys. 90, 4039–4043 (2001)
https://doi.org/10.1063/1.1401804
Role of crystallographic structure on magnetization reversal of (101̄0) and (112̄0) textured thin film media
J. Appl. Phys. 90, 4056–4062 (2001)
https://doi.org/10.1063/1.1400101
Current injection into high temperature superconductors: Does spin matter?
J. Appl. Phys. 90, 4063–4077 (2001)
https://doi.org/10.1063/1.1404427
Enhancement of magnetic surface anisotropy of Pd/Co/Pd trilayers by the addition of Sm
J. Appl. Phys. 90, 4085–4088 (2001)
https://doi.org/10.1063/1.1405817
DIELECTRICS AND FERROELECTRICITY (PACS 77)
Structure dependence of ferroelectric properties of bismuth layer-structured ferroelectric single crystals
J. Appl. Phys. 90, 4089–4094 (2001)
https://doi.org/10.1063/1.1389476
and as high-k gate dielectrics on SiGe: A comparative study
J. Appl. Phys. 90, 4103–4107 (2001)
https://doi.org/10.1063/1.1405134
Spectroscopy of a ferroelectric plasma cathode
J. Appl. Phys. 90, 4108–4114 (2001)
https://doi.org/10.1063/1.1404421
Chemical order influence on the phase transition in the relaxor
J. Appl. Phys. 90, 4115–4121 (2001)
https://doi.org/10.1063/1.1405140
Room temperature aging behavior of thermally imprinted ferroelectric thin film capacitors
J. Appl. Phys. 90, 4130–4133 (2001)
https://doi.org/10.1063/1.1402663
NANOSCALE SCIENCE AND DESIGN
Effect of purification of the electrical conductivity and complex permittivity of multiwall carbon nanotubes
J. Appl. Phys. 90, 4134–4137 (2001)
https://doi.org/10.1063/1.1400100
Factors responsible for the stability and the existence of a clean energy gap of a silicon nanocluster
J. Appl. Phys. 90, 4143–4151 (2001)
https://doi.org/10.1063/1.1402672
Thermal evolution of the magnetization in nanocrystalline Fe particles investigated by electron holography
J. Appl. Phys. 90, 4152–4158 (2001)
https://doi.org/10.1063/1.1401797
(Fe–Co)–(Mg-fluoride) insulating nanogranular system with enhanced tunnel-type giant magnetoresistance
J. Appl. Phys. 90, 4159–4162 (2001)
https://doi.org/10.1063/1.1376415
Nanoscale selective growth of GaAs by molecular beam epitaxy
J. Appl. Phys. 90, 4163–4168 (2001)
https://doi.org/10.1063/1.1401805
Crystal size and temperature measurements in nanostructured silicon using Raman spectroscopy
J. Appl. Phys. 90, 4175–4183 (2001)
https://doi.org/10.1063/1.1398601
DEVICE PHYSICS (PACS 85)
Electrical properties of structures with thin porous silicon layer
J. Appl. Phys. 90, 4184–4190 (2001)
https://doi.org/10.1063/1.1402670
INTERDISCIPLINARY AND GENERAL PHYSICS (PACS 1-41, 43-47, 79, 81-84, 89-99)
Second-order sound field during megasonic cleaning of patterned silicon wafers: Application to ridges and trenches
J. Appl. Phys. 90, 4211–4218 (2001)
https://doi.org/10.1063/1.1398595
Selective etching of GaN polar surface in potassium hydroxide solution studied by x-ray photoelectron spectroscopy
J. Appl. Phys. 90, 4219–4223 (2001)
https://doi.org/10.1063/1.1402966
Direct heteroepitaxy of crystalline on Si (001) for high-k gate dielectric applications
J. Appl. Phys. 90, 4224–4230 (2001)
https://doi.org/10.1063/1.1403678
Production of calcium phosphate coatings on Ti6Al4V obtained by Nd:yttrium–aluminum–garnet laser cladding
F. Lusquiños; J. Pou; J. L. Arias; M. Boutinguiza; B. León; M. Pérez-Amor; F. C. M. Driessens; J. C. Merry; I. Gibson; S. Best; W. Bonfield
J. Appl. Phys. 90, 4231–4236 (2001)
https://doi.org/10.1063/1.1402975
Ion beam deposition of fluorinated amorphous carbon
C. Ronning; M. Büttner; U. Vetter; H. Feldermann; O. Wondratschek; H. Hofsäss; W. Brunner; Frederick C. K. Au; Quan Li; S. T. Lee
J. Appl. Phys. 90, 4237–4245 (2001)
https://doi.org/10.1063/1.1404419
ZnO–CoO solid solution thin films
J. Appl. Phys. 90, 4246–4250 (2001)
https://doi.org/10.1063/1.1402142
Chemical and thermal reduction of thin films of copper (II) oxide and copper (I) oxide
J. Appl. Phys. 90, 4256–4264 (2001)
https://doi.org/10.1063/1.1403675
COMMUNICATIONS
Extraordinarily wide optical gain spectrum in 2.2–2.5 μm In(Al)GaAsSb/GaSb quantum-well ridge-waveguide lasers
J. Appl. Phys. 90, 4281–4283 (2001)
https://doi.org/10.1063/1.1391421
Evidence for hole and electron trapping in plasma deposited thin films
J. Appl. Phys. 90, 4284–4286 (2001)
https://doi.org/10.1063/1.1401796
Electrodeposition of compound semiconductors in polymer channels of 100 nm diameter
J. Appl. Phys. 90, 4287–4289 (2001)
https://doi.org/10.1063/1.1403668
Ge/Si interdiffusion in the GeSi dots and wetting layers
J. Appl. Phys. 90, 4290–4292 (2001)
https://doi.org/10.1063/1.1403667
Diffusion of ion-implanted boron in germanium
Suresh Uppal; Arthur F. W. Willoughby; Janet M. Bonar; Alan G. R. Evans; Nick E. B. Cowern; Richard Morris; Mark G. Dowsett
J. Appl. Phys. 90, 4293–4295 (2001)
https://doi.org/10.1063/1.1402664
ADDENDA
Re-examination of important defect complexes in silicon: From microelectronics to quantum computing
P. P. Filippatos, A. Chroneos, et al.
Tutorial: Simulating modern magnetic material systems in mumax3
Jonas J. Joos, Pedram Bassirian, et al.
Piezoelectric thin films and their applications in MEMS: A review
Jinpeng Liu, Hua Tan, et al.