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Heat resistance of Mo/Si, MoSi2/Si, and Mo5Si3/Si multilayer soft x‐ray mirrors
J. Appl. Phys. 78, 5227–5230 (1995)
https://doi.org/10.1063/1.359698
Free electron laser dynamics, evolution of the bunching coefficients, and coherent harmonic generation
J. Appl. Phys. 78, 5231–5243 (1995)
https://doi.org/10.1063/1.359699
Effect of phase shifter on the characteristics of the distributed feedback laser
J. Appl. Phys. 78, 5244–5252 (1995)
https://doi.org/10.1063/1.359700
Characterization of reflective cholesteric liquid‐crystal displays
J. Appl. Phys. 78, 5253–5265 (1995)
https://doi.org/10.1063/1.359701
Measurements of the electrohydrodynamic instability in planar geometry using gallium
J. Appl. Phys. 78, 5270–5276 (1995)
https://doi.org/10.1063/1.360697
Phosphorescence from tungsten clusters during laser‐assisted chemical‐vapor deposition of tungsten
J. Appl. Phys. 78, 5277–5282 (1995)
https://doi.org/10.1063/1.359703
Magnetic field distribution measurements in a low‐pressure inductive discharge
J. Appl. Phys. 78, 5296–5301 (1995)
https://doi.org/10.1063/1.359706
Structural properties of a‐C:H deposited using saddle‐field glow‐discharge decomposition of methane
J. Appl. Phys. 78, 5307–5312 (1995)
https://doi.org/10.1063/1.359707
Consistent quantitative model for the spatial extent of point defect interactions in silicon
J. Appl. Phys. 78, 5313–5319 (1995)
https://doi.org/10.1063/1.359708
Synthesis of actinide carbides encapsulated within carbon nanoparticles
J. Appl. Phys. 78, 5320–5324 (1995)
https://doi.org/10.1063/1.359709
Deep‐level transient spectroscopy and electrical characterization of ion‐implanted p‐n junctions into undoped InP
J. Appl. Phys. 78, 5325–5330 (1995)
https://doi.org/10.1063/1.359710
Observation of systematic deviations of period in W/Si and W/C multilayers
J. Appl. Phys. 78, 5331–5334 (1995)
https://doi.org/10.1063/1.359711
General shock wave equation of state for solids
J. Appl. Phys. 78, 5335–5344 (1995)
https://doi.org/10.1063/1.359712
Secondary‐ion‐mass spectrometry and near‐field studies of Ti:LiNbO3 optical waveguides
J. Appl. Phys. 78, 5345–5350 (1995)
https://doi.org/10.1063/1.359713
Diffusion of tin in germanium studied by secondary ion mass spectrometry
J. Appl. Phys. 78, 5351–5355 (1995)
https://doi.org/10.1063/1.359714
Study of the oxidation of gold‐tin preforms using x‐ray photoelectron spectroscopy
J. Appl. Phys. 78, 5356–5361 (1995)
https://doi.org/10.1063/1.359715
Deposition and hydrogen content of carbon films grown by CH+3 ion‐beam bombardment
J. Appl. Phys. 78, 5366–5372 (1995)
https://doi.org/10.1063/1.359717
Origin of compositional modulation of InGaAs in selective area metalorganic vapor phase epitaxy
J. Appl. Phys. 78, 5373–5386 (1995)
https://doi.org/10.1063/1.360698
Photoluminescence characterization of InGaP/GaAs heterostructures grown by metalorganic chemical vapor deposition
J. Appl. Phys. 78, 5387–5390 (1995)
https://doi.org/10.1063/1.359718
Formation of epitaxial Fe3−xSi1+x (0≤x≤1) silicides on Si(111)
J. Appl. Phys. 78, 5404–5411 (1995)
https://doi.org/10.1063/1.359721
Deep levels in indium selenide single crystals doped with iodine
J. Appl. Phys. 78, 5427–5430 (1995)
https://doi.org/10.1063/1.359724
Thermal hole emission from Si/Si1−xGex/Si quantum wells by deep level transient spectroscopy
J. Appl. Phys. 78, 5439–5447 (1995)
https://doi.org/10.1063/1.359658
The effect of strain on hot‐electron and hole longitudinal diffusion and noise in Si and Si0.9Ge0.1
J. Appl. Phys. 78, 5454–5459 (1995)
https://doi.org/10.1063/1.359660
Si80Ge20 thermoelectric alloys prepared with GaP additions
J. Appl. Phys. 78, 5474–5480 (1995)
https://doi.org/10.1063/1.359663
Analysis of nonideal Schottky and p‐n junction diodes—Extraction of parameters from I–V plots
J. Appl. Phys. 78, 5481–5489 (1995)
https://doi.org/10.1063/1.359664
Critical layer thickness in metal organic chemical vapor deposition grown InGaAs/GaAs strained quantum wells
J. Appl. Phys. 78, 5490–5492 (1995)
https://doi.org/10.1063/1.360695
Electrical properties of CdTe films prepared by close‐spaced sublimation with screen‐printed source layers
J. Appl. Phys. 78, 5493–5498 (1995)
https://doi.org/10.1063/1.359665
Preparation of self‐aligned in‐line tunnel junctions for applications in single‐charge electronics
M. Götz; K. Blüthner; W. Krech; A. Nowack; H.‐J. Fuchs; E.‐B. Kley; P. Thieme; Th. Wagner; G. Eska; K. Hecker; H. Hegger
J. Appl. Phys. 78, 5499–5502 (1995)
https://doi.org/10.1063/1.359666
Electron momentum relaxation time and mobility in a free‐standing quantum well
J. Appl. Phys. 78, 5503–5510 (1995)
https://doi.org/10.1063/1.359667
Metal–n‐6H–SiC surface barrier height—Experimental data and description in the traditional terms
J. Appl. Phys. 78, 5511–5514 (1995)
https://doi.org/10.1063/1.359668
Investigation of carrier transport effects in multiple‐quantum‐well lasers
J. Appl. Phys. 78, 5515–5517 (1995)
https://doi.org/10.1063/1.359669
Monte Carlo calculations of the temperature‐ and field‐dependent electron transport parameters for 4H‐SiC
J. Appl. Phys. 78, 5518–5521 (1995)
https://doi.org/10.1063/1.359670
Optimization of the slow‐mode plasmon polariton in light‐emitting tunnel junctions
J. Appl. Phys. 78, 5522–5533 (1995)
https://doi.org/10.1063/1.359671
Positron annihilation measurements of Pr‐containing superconductor compounds
J. Appl. Phys. 78, 5534–5539 (1995)
https://doi.org/10.1063/1.359672
Grain orientation in thick laser‐deposited Y1Ba2Cu3O7−δ films: Adjustment of c‐axis orientation
J. Appl. Phys. 78, 5545–5548 (1995)
https://doi.org/10.1063/1.359674
Magnetic anisotropy and interlayer exchange coupling in the sputtered Co/Ag multilayers
J. Appl. Phys. 78, 5549–5553 (1995)
https://doi.org/10.1063/1.359675
Magnetization reversal mechanisms in NiFe/Cu/NiFe/FeMn spin‐valve structures
J. Appl. Phys. 78, 5554–5562 (1995)
https://doi.org/10.1063/1.359676
Structural and magnetic properties of Co‐Nb/Pd multilayers
J. Appl. Phys. 78, 5563–5567 (1995)
https://doi.org/10.1063/1.359677
Raman investigation of undoped, niobium‐doped, and lanthanum‐doped lead zirconate‐titanate ceramics
J. Appl. Phys. 78, 5581–5591 (1995)
https://doi.org/10.1063/1.359680
Structural characterization of epitaxial BaTiO3 thin films grown by sputter deposition on MgO(100)
J. Appl. Phys. 78, 5604–5608 (1995)
https://doi.org/10.1063/1.360696
Photoluminescence analysis of Er‐doped GaAs under host photoexcitation and direct intra‐4f‐shell photoexcitation
J. Appl. Phys. 78, 5614–5618 (1995)
https://doi.org/10.1063/1.359684
Photoluminescence of CdTe doped with arsenic and antimony acceptors
J. Appl. Phys. 78, 5626–5632 (1995)
https://doi.org/10.1063/1.359686
On the mechanism of emission from the ferroelectric ceramic cathode
J. Appl. Phys. 78, 5633–5637 (1995)
https://doi.org/10.1063/1.359687
Influence of the interface bond type on the far‐infrared reflectivity of InAs/GaSb superlattices
J. Appl. Phys. 78, 5642–5644 (1995)
https://doi.org/10.1063/1.359689
Hypersound anomalies and elastic constants in single‐crystal PbMg1/3Nb2/3O3 by Brillouin scattering
J. Appl. Phys. 78, 5665–5668 (1995)
https://doi.org/10.1063/1.359622
Donor‐acceptor pair luminescence involving the iodine A center in CdTe
J. Appl. Phys. 78, 5669–5674 (1995)
https://doi.org/10.1063/1.359623
Electrical and optical properties of thermally evaporated LiBO2–LiF composite films
J. Appl. Phys. 78, 5675–5679 (1995)
https://doi.org/10.1063/1.359624
In situ laser reflectometry study of the morphology of Ge/GaAs layers during their heteroepitaxial growth
J. Appl. Phys. 78, 5680–5685 (1995)
https://doi.org/10.1063/1.359625
Temporal evolution of the physical response during photorefractive grating formation and erasure for BSO
J. Appl. Phys. 78, 5686–5690 (1995)
https://doi.org/10.1063/1.359626
Photoluminescence properties of ZnGa2O4:Mn powder phosphors
T. K. Tran; W. Park; J. W. Tomm; B. K. Wagner; S. M. Jacobsen; C. J. Summers; P. N. Yocom; S. K. McClelland
J. Appl. Phys. 78, 5691–5695 (1995)
https://doi.org/10.1063/1.359627
Photoluminescence of quaternary GaInAsSb/AlGaAsSb strained multiple quantum wells
J. Appl. Phys. 78, 5696–5700 (1995)
https://doi.org/10.1063/1.359628
Photoemission study of CdS heterojunction formation with binary selenide semiconductors
J. Appl. Phys. 78, 5701–5705 (1995)
https://doi.org/10.1063/1.359629
Development of highly conductive n‐type μc‐Si:H films at low power for device applications
J. Appl. Phys. 78, 5713–5720 (1995)
https://doi.org/10.1063/1.359631
Growth of epitaxial AlN(0001) on Si(111) by reactive magnetron sputter deposition
J. Appl. Phys. 78, 5721–5726 (1995)
https://doi.org/10.1063/1.359632
Atomic scale etching processes of n‐Si(111) in NH4F solutions: In situ scanning tunneling microscopy
J. Appl. Phys. 78, 5727–5733 (1995)
https://doi.org/10.1063/1.359633
Low ion energy electron cyclotron resonance etching of InP using a Cl2/N2 mixture
J. Appl. Phys. 78, 5734–5738 (1995)
https://doi.org/10.1063/1.359634
The effect of ultrasonic pre‐treatment on nucleation density of chemical vapor deposition diamond
J. Appl. Phys. 78, 5745–5749 (1995)
https://doi.org/10.1063/1.359636
Two‐dimensional numerical simulation of the pulse response of a semi‐insulating InGaAs:Fe photodetector
J. Appl. Phys. 78, 5756–5764 (1995)
https://doi.org/10.1063/1.359638
Space charge generation in ZnS:Mn alternating‐current thin‐film electroluminescent devices
J. Appl. Phys. 78, 5775–5781 (1995)
https://doi.org/10.1063/1.359640
Modification of the adhesion and contact resistance of the Ag/YBa2Cu3O7 interface with keV electron irradiation
J. Appl. Phys. 78, 5782–5786 (1995)
https://doi.org/10.1063/1.359641
Electrodeposition and characterization of magnetic Ni‐Fe thin films on InP(100) surfaces
J. Appl. Phys. 78, 5795–5799 (1995)
https://doi.org/10.1063/1.359643
Theory of ‘‘supercurrents’’ and their influence on field quality and stability of superconducting magnets
J. Appl. Phys. 78, 5800–5810 (1995)
https://doi.org/10.1063/1.360694
Observation and analysis of conductance oscillations in scanning tunneling microscopy of clean InP(110) surfaces
J. Appl. Phys. 78, 5820–5821 (1995)
https://doi.org/10.1063/1.359645
Optical band gap of the α−mercuric iodide
A. Ferreira da Silva; N. Veissid; C. Y. An; J. Caetano de Souza; A. V. Batista da Silva; P. César Farias; M. T. F. da Cruz
J. Appl. Phys. 78, 5822–5823 (1995)
https://doi.org/10.1063/1.359646
Persistent photoconductivity and DX centers in Cd0.8Zn0.2Te:Cl
J. Appl. Phys. 78, 5827–5829 (1995)
https://doi.org/10.1063/1.359648
Efficient electroluminescence of distyrylarylene with hole transporting ability
J. Appl. Phys. 78, 5831–5833 (1995)
https://doi.org/10.1063/1.359650
Atomic layer epitaxy of GaAs from tertiarybutylarsine and triethylgallium
J. Appl. Phys. 78, 5834–5836 (1995)
https://doi.org/10.1063/1.359651
Positive nonlinear index of refraction in tellurium dioxide single crystals above the two‐photon absorption edge
J. Appl. Phys. 78, 5840–5841 (1995)
https://doi.org/10.1063/1.359653
An analytical approximation for the free electron density of the Hg1−xCdxTe alloy system for 0<x<1
J. Appl. Phys. 78, 5845–5847 (1995)
https://doi.org/10.1063/1.360735
Depressed photoemission from Görlich cathodes at high laser light intensities
J. Appl. Phys. 78, 5848–5850 (1995)
https://doi.org/10.1063/1.359655
Modeling of YBa2Cu3O7 weak links produced by oxygen‐ion modification
J. Appl. Phys. 78, 5851–5853 (1995)
https://doi.org/10.1063/1.359656
Comment on ‘‘Equation of state of aluminum nitride and its shock response’’ [J. Appl. Phys. 76, 4077 (1994)]
J. Appl. Phys. 78, 5854–5856 (1995)
https://doi.org/10.1063/1.359620
A step-by-step guide to perform x-ray photoelectron spectroscopy
Grzegorz Greczynski, Lars Hultman
GaN-based power devices: Physics, reliability, and perspectives
Matteo Meneghini, Carlo De Santi, et al.
Celebrating notable advances in compound semiconductors: A tribute to Dr. Wladyslaw Walukiewicz
Kirstin Alberi, Junqiao Wu, et al.