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Novel target configurations for selective ionization state studies in molybdenum
J. Appl. Phys. 68, 5422–5427 (1990)
https://doi.org/10.1063/1.347192
Energy analysis of neutral atoms in broad oxygen ion beams by Doppler‐shift measurements
J. Appl. Phys. 68, 5428–5434 (1990)
https://doi.org/10.1063/1.346998
Experimental study of optical waveguides with absorption induced by metallic electrodes
J. Appl. Phys. 68, 5447–5450 (1990)
https://doi.org/10.1063/1.347000
Fabrication of low‐loss zinc‐selenide coated silver hollow waveguides for CO2 laser light
J. Appl. Phys. 68, 5463–5466 (1990)
https://doi.org/10.1063/1.347003
Hyperbolic heat conduction due to axisymmetric continuous or pulsed surface heat sources
J. Appl. Phys. 68, 5478–5485 (1990)
https://doi.org/10.1063/1.347006
Investigation of the creation process in dc pulsed discharges
J. Appl. Phys. 68, 5507–5510 (1990)
https://doi.org/10.1063/1.347009
Internal energy distributions in a shielded plasma device
J. Appl. Phys. 68, 5540–5548 (1990)
https://doi.org/10.1063/1.347014
Surface order transition in nematic liquid crystals induced by the flexoelectric polarization
J. Appl. Phys. 68, 5549–5554 (1990)
https://doi.org/10.1063/1.347015
Annealing characteristics and electrical properties of 1‐MeV arsenic‐ion‐implanted layers in silicon
J. Appl. Phys. 68, 5555–5563 (1990)
https://doi.org/10.1063/1.347193
Impurity effect on the creation of Ga vacancies in a Si‐doped layer grown on Be‐doped GaAs by molecular‐beam epitaxy
J. Appl. Phys. 68, 5571–5575 (1990)
https://doi.org/10.1063/1.346992
Synchrotron‐radiation‐induced decomposition of thin native oxide films on Si(100)
J. Appl. Phys. 68, 5576–5583 (1990)
https://doi.org/10.1063/1.346993
Suppression of the dominant recombination center in n‐type GaAs by proximity annealing of wafers
J. Appl. Phys. 68, 5588–5594 (1990)
https://doi.org/10.1063/1.346995
Influence of ball‐forming conditions on the hardness of copper balls
J. Appl. Phys. 68, 5610–5614 (1990)
https://doi.org/10.1063/1.346972
Layer intermixing in heavily carbon‐doped AlGaAs/GaAs superlattices
J. Appl. Phys. 68, 5615–5620 (1990)
https://doi.org/10.1063/1.346973
Amorphization and regrowth in Si/CoSi2/Si heterostructures
J. Appl. Phys. 68, 5641–5647 (1990)
https://doi.org/10.1063/1.346977
Pulsed laser deposition of diamondlike hydrogenated amorphous carbon films
J. Appl. Phys. 68, 5648–5652 (1990)
https://doi.org/10.1063/1.346978
Sb doping and electrical characteristics of ultrathin SinGem superlattices
J. Appl. Phys. 68, 5653–5659 (1990)
https://doi.org/10.1063/1.346979
Epitaxial growth of ZnS grown at low temperatures by atmospheric pressure metalorganic vapor phase epitaxy
J. Appl. Phys. 68, 5674–5681 (1990)
https://doi.org/10.1063/1.346982
Hole transport in mixtures of 1,1‐bis(di‐4‐tolylaminophenyl) cyclohexane and bisphenol‐A‐polycarbonate
J. Appl. Phys. 68, 5682–5686 (1990)
https://doi.org/10.1063/1.346983
Anisotropy of piezoresistance in n‐channel inversion layers of metal‐oxide‐semiconductor transistors on (001)Si
J. Appl. Phys. 68, 5687–5691 (1990)
https://doi.org/10.1063/1.346984
Orientation analysis of the anisotropic galvanomagnetism of sintered Bi2Te3
J. Appl. Phys. 68, 5692–5695 (1990)
https://doi.org/10.1063/1.346985
Formation and behavior of BGaVAs complex defects in gallium arsenide grown by liquid‐encapsulated Czochralski method
J. Appl. Phys. 68, 5696–5699 (1990)
https://doi.org/10.1063/1.346986
Thermally stimulated current studies of bismuth silicon oxide crystal. II. Trapping kinetics
J. Appl. Phys. 68, 5700–5703 (1990)
https://doi.org/10.1063/1.346987
Comparison and origin of electronic states of the free GaAs (100) surface and the GaAs/CaF2 interface
J. Appl. Phys. 68, 5709–5713 (1990)
https://doi.org/10.1063/1.346989
Nonspiking ohmic contact to p‐GaAs by solid‐phase regrowth
C. C. Han; X. Z. Wang; L. C. Wang; E. D. Marshall; S. S. Lau; S. A. Schwarz; C. J. Palmstro/m; J. P. Harbison; L. T. Florez; R. M. Potemski; M. A. Tischler; T. F. Kuech
J. Appl. Phys. 68, 5714–5718 (1990)
https://doi.org/10.1063/1.346990
Formation and properties of In‐doped high‐conductivity CdSe evaporated film
J. Appl. Phys. 68, 5719–5723 (1990)
https://doi.org/10.1063/1.346965
Change in density of states in a resonant tunneling structure due to a scattering center in the well
J. Appl. Phys. 68, 5724–5728 (1990)
https://doi.org/10.1063/1.346966
Electrical properties of grain boundaries in Ba1−xKxBiO3 polycrystalline thin films
J. Appl. Phys. 68, 5735–5740 (1990)
https://doi.org/10.1063/1.346968
Hysteresis properties of ultrathin ferromagnetic films
J. Appl. Phys. 68, 5759–5766 (1990)
https://doi.org/10.1063/1.346944
Fatigue and switching in ferroelectric memories: Theory and experiment
H. M. Duiker; P. D. Beale; J. F. Scott; C. A. Paz de Araujo; B. M. Melnick; J. D. Cuchiaro; L. D. McMillan
J. Appl. Phys. 68, 5783–5791 (1990)
https://doi.org/10.1063/1.346948
The influence of spontaneous electrochemical effects on dielectric measurements
J. Appl. Phys. 68, 5792–5795 (1990)
https://doi.org/10.1063/1.346949
Photoluminescence spectroscopy of CdTe epilayers grown by rf magnetron sputtering
J. Appl. Phys. 68, 5796–5803 (1990)
https://doi.org/10.1063/1.346950
Nondestructive characterization of silicon‐on‐insulator structures using infrared spectroscopic ellipsometry
J. Appl. Phys. 68, 5810–5813 (1990)
https://doi.org/10.1063/1.346952
X‐ray photoemission studies of reactions of arsine with platinum, palladium, and nickel metals and metal oxides
J. Appl. Phys. 68, 5827–5834 (1990)
https://doi.org/10.1063/1.346955
Determination of spin‐polarized secondary‐electron escape depth through oxidation of iron
J. Appl. Phys. 68, 5835–5839 (1990)
https://doi.org/10.1063/1.346956
On the calculation of the electromagnetic force field in the circular stirring of metallic melts
J. Appl. Phys. 68, 5845–5850 (1990)
https://doi.org/10.1063/1.346958
A thermionic energy converter with a molybdenum‐alumina cermet emitter
J. Appl. Phys. 68, 5856–5865 (1990)
https://doi.org/10.1063/1.346960
Hydrogenation of Si‐ and Be‐doped InGaP
J. M. Dallesasse; I. Szafranek; J. N. Baillargeon; N. El‐Zein; N. Holonyak, Jr.; G. E. Stillman; K. Y. Cheng
J. Appl. Phys. 68, 5866–5870 (1990)
https://doi.org/10.1063/1.346961
Computerized tomographic imaging for space plasma physics
J. Appl. Phys. 68, 5883–5889 (1990)
https://doi.org/10.1063/1.346964
Temperature dependence of intersubband absorption in InGaAs/InAlAs multiquantum wells
J. Appl. Phys. 68, 5890–5892 (1990)
https://doi.org/10.1063/1.346936
Growth of (100) Al/Fe and Fe/Al/Fe layers using the technique of metal‐metal epitaxy on silicon
J. Appl. Phys. 68, 5893–5895 (1990)
https://doi.org/10.1063/1.346937
Effect of light soaking on the short‐wavelength photoresponse in hydrogenated amorphous silicon
J. Appl. Phys. 68, 5896–5898 (1990)
https://doi.org/10.1063/1.346938
Thin‐film Al/diamond Schottky diode over 400‐V breakdown voltage
J. Appl. Phys. 68, 5902–5904 (1990)
https://doi.org/10.1063/1.346940
Independence of peak current from emitter spacer layer width in AlGaAs/GaAs resonant tunneling diodes
J. Appl. Phys. 68, 5905–5907 (1990)
https://doi.org/10.1063/1.347190
Effects of using the more accurate intrinsic concentration on bipolar transistor modeling
J. Appl. Phys. 68, 5911–5912 (1990)
https://doi.org/10.1063/1.346942
Phonon‐drag thermopower in semiconducting quantum well structures in a quantizing magnetic field
J. Appl. Phys. 68, 5919–5921 (1990)
https://doi.org/10.1063/1.346919
Modeling AlxGa1−xAs optical constants as functions of composition
J. Appl. Phys. 68, 5925–5926 (1990)
https://doi.org/10.1063/1.346921
Probe beam heating of AlGaAs single‐quantum‐well laser facets in Raman microprobe spectroscopy
J. Appl. Phys. 68, 5930–5932 (1990)
https://doi.org/10.1063/1.346923
Is Tc(P) for lead suitable as a low‐temperature manometer?
J. Appl. Phys. 68, 5933–5935 (1990)
https://doi.org/10.1063/1.346924
2.5 μm GaInAsSb lattice‐matched to GaSb by liquid phase epitaxy
J. Appl. Phys. 68, 5936–5938 (1990)
https://doi.org/10.1063/1.346925
BiPbSrCaCuO superconductors prepared by the multiple pressing and sintering process
J. Appl. Phys. 68, 5939–5940 (1990)
https://doi.org/10.1063/1.346926
Re-examination of important defect complexes in silicon: From microelectronics to quantum computing
P. P. Filippatos, A. Chroneos, et al.
Tutorial: Simulating modern magnetic material systems in mumax3
Jonas J. Joos, Pedram Bassirian, et al.
Piezoelectric thin films and their applications in MEMS: A review
Jinpeng Liu, Hua Tan, et al.