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Low‐energy elastic scattering of electrons by bound silicon and germanium atoms
J. Appl. Phys. 68, 4937–4941 (1990)
https://doi.org/10.1063/1.347078
Modal analysis of wake fields and its application to elliptical pill‐box cavity with finite aperture
J. Appl. Phys. 68, 4942–4951 (1990)
https://doi.org/10.1063/1.347079
Dependent scattering of an obliquely incident plane wave by a collection of parallel cylinders
J. Appl. Phys. 68, 4952–4957 (1990)
https://doi.org/10.1063/1.347080
Electron‐beam confinement by rotational stabilization in a linear wiggler free electron laser
J. Appl. Phys. 68, 4958–4963 (1990)
https://doi.org/10.1063/1.347081
Simulation studies of silicon electro‐optic waveguide devices
J. Appl. Phys. 68, 4964–4970 (1990)
https://doi.org/10.1063/1.347082
Phase matched noncollinear second harmonic generation in 2‐methyl‐4‐nitroaniline single‐crystal film waveguide
J. Appl. Phys. 68, 4990–4992 (1990)
https://doi.org/10.1063/1.347085
Forced thickness‐extensional trapped energy vibrations of polarized ceramic plates
J. Appl. Phys. 68, 4998–5008 (1990)
https://doi.org/10.1063/1.347087
An analysis of thickness‐extensional trapped energy mode polarized ceramic transducers
J. Appl. Phys. 68, 5009–5015 (1990)
https://doi.org/10.1063/1.347088
Time‐dependent collisional‐radiative model for quantitative study of nonequilibrium plasma
J. Appl. Phys. 68, 5016–5027 (1990)
https://doi.org/10.1063/1.347089
Study of a cesium plasma as a selective emitter for thermophotovoltaic applications
J. Appl. Phys. 68, 5033–5035 (1990)
https://doi.org/10.1063/1.347090
Numerical modeling of effects of power imbalance on irradiation nonuniformities
J. Appl. Phys. 68, 5036–5043 (1990)
https://doi.org/10.1063/1.347091
Electrical conductivity and thermodynamic functions of weakly nonideal plasma
J. Appl. Phys. 68, 5044–5051 (1990)
https://doi.org/10.1063/1.347092
Vacancy formation and extraction energies in semiconductor compounds and alloys
J. Appl. Phys. 68, 5064–5076 (1990)
https://doi.org/10.1063/1.347069
Electric‐field‐enhanced dissociation of the hydrogen‐Si donor complex in GaAs
J. Appl. Phys. 68, 5077–5080 (1990)
https://doi.org/10.1063/1.347070
Radiation‐induced frequency offsets and acoustic loss in AT‐cut quartz crystals
J. Appl. Phys. 68, 5095–5104 (1990)
https://doi.org/10.1063/1.347046
Thermal conductivity of GaSb and InSb in solid and liquid states
J. Appl. Phys. 68, 5125–5127 (1990)
https://doi.org/10.1063/1.347051
Improved analysis of ionic conductivity relaxation using the electric modulus with a Cole–Davidson distribution
J. Appl. Phys. 68, 5128–5132 (1990)
https://doi.org/10.1063/1.347052
Oxidation of titanium, manganese, iron, and niobium silicides: Marker experiments
J. Appl. Phys. 68, 5133–5139 (1990)
https://doi.org/10.1063/1.347053
Electron beam defined delamination and ablation of carbon‐diamond thin films on silicon
J. Appl. Phys. 68, 5140–5145 (1990)
https://doi.org/10.1063/1.347054
Thermal evolution of X/C multilayers (with X=W, Ni, or SiWSi): A systematic study
J. Appl. Phys. 68, 5146–5154 (1990)
https://doi.org/10.1063/1.347055
Structural stability of heat‐treated W/C and W/B4C multilayers
J. Appl. Phys. 68, 5162–5168 (1990)
https://doi.org/10.1063/1.347057
Formation of MoS2 phase in Al2O3, ZrO2, and SiO2 through ion implantation of constituent elements
J. Appl. Phys. 68, 5169–5175 (1990)
https://doi.org/10.1063/1.347058
Reactively sputtered TiN as a diffusion barrier between Cu and Si
J. Appl. Phys. 68, 5176–5187 (1990)
https://doi.org/10.1063/1.347059
Minority‐carrier lifetime in p‐type (111)B HgCdTe grown by molecular‐beam epitaxy
J. Appl. Phys. 68, 5195–5199 (1990)
https://doi.org/10.1063/1.347061
Low‐frequency noise in small InGaAs/InP p‐i‐n diodes under different bias and illumination conditions
J. Appl. Phys. 68, 5200–5204 (1990)
https://doi.org/10.1063/1.347062
Spatial profiling of electron traps in silicon nitride thin films
J. Appl. Phys. 68, 5212–5221 (1990)
https://doi.org/10.1063/1.347064
Observation of hysteresis, transients, and photoeffects in the electrical properties of ZnSe/GaAs heterojunctions
J. Appl. Phys. 68, 5226–5233 (1990)
https://doi.org/10.1063/1.347066
Selective interdiffusion of GaInAs/AlInAs quantum wells by SiO2 encapsulation and rapid thermal annealing
J. Appl. Phys. 68, 5256–5261 (1990)
https://doi.org/10.1063/1.347194
An investigation of Si‐SiO2 interface charges in thermally oxidized (100), (110), (111), and (511) silicon
J. Appl. Phys. 68, 5262–5272 (1990)
https://doi.org/10.1063/1.347042
Modeling of pulsed laser etching of high‐Tc superconductors
J. Appl. Phys. 68, 5273–5277 (1990)
https://doi.org/10.1063/1.347043
Superconducting HoBa2Cu3Ox films on Si without a buffer layer
J. Appl. Phys. 68, 5278–5282 (1990)
https://doi.org/10.1063/1.347044
Transmission electron microscopy study of the environmental degradation in Ba2YCu3O7−y
J. Appl. Phys. 68, 5283–5288 (1990)
https://doi.org/10.1063/1.347045
Domain erasure and formation in direct overwrite magneto‐optic recording
J. Appl. Phys. 68, 5293–5299 (1990)
https://doi.org/10.1063/1.347021
Photoreflectance characterization of surface Fermi level in as‐grown GaAs(100)
J. Appl. Phys. 68, 5309–5313 (1990)
https://doi.org/10.1063/1.347023
Photoluminescent properties and optical absorption of AlAs/GaAs disordered superlattices
J. Appl. Phys. 68, 5318–5323 (1990)
https://doi.org/10.1063/1.347025
Chemical sputtering of Al2O3 by fluorine‐containing plasmas excited by electron cyclotron resonance
J. Appl. Phys. 68, 5329–5336 (1990)
https://doi.org/10.1063/1.347027
Absorptive electro‐optic spatial light modulators with different quantum well profiles
J. Appl. Phys. 68, 5348–5356 (1990)
https://doi.org/10.1063/1.347030
Field‐induced anisotropic distribution functions and semiconductor transport equations with tensor‐form coefficients
J. Appl. Phys. 68, 5360–5362 (1990)
https://doi.org/10.1063/1.347032
Resonance Raman scattering from epitaxial InSb films grown by metalorganic magnetron sputtering
J. Appl. Phys. 68, 5363–5365 (1990)
https://doi.org/10.1063/1.347033
Generalization of Bragg reflector geometry: Application to (Ga,Al)As‐(Ca,Sr)F2 reflectors
J. Appl. Phys. 68, 5366–5368 (1990)
https://doi.org/10.1063/1.347034
Lateral confinement in generalized strip‐loaded optical waveguides
J. Appl. Phys. 68, 5375–5377 (1990)
https://doi.org/10.1063/1.347037
A novel test structure for grating pitch determination with near‐Angstrom accuracy
J. Appl. Phys. 68, 5381–5382 (1990)
https://doi.org/10.1063/1.347039
Background impurity dependence of redistributions of implanted gallium in silicon during annealing
J. Appl. Phys. 68, 5385–5387 (1990)
https://doi.org/10.1063/1.347018
Phototransmission study of strained‐layer InxGa1−x As/GaAs single quantum well structures
J. Appl. Phys. 68, 5388–5390 (1990)
https://doi.org/10.1063/1.347019
A step-by-step guide to perform x-ray photoelectron spectroscopy
Grzegorz Greczynski, Lars Hultman
Distinct deformation mechanisms of silicate glasses under nanoindentation: The critical role of structure
Ziming Yan, Ranran Lu, et al.
Flexible and broadband microwave-absorbing metastructure with wide-angle stability
Feihong Lin, Yu Bai, et al.