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Broadband nuclear magnetic resonance pulses with two‐dimensional spatial selectivity
J. Appl. Phys. 66, 1513–1516 (1989)
https://doi.org/10.1063/1.344411
Optical plasma resonance in semiconductors: Novel concepts for modulating far‐infrared light
J. Appl. Phys. 66, 1544–1548 (1989)
https://doi.org/10.1063/1.344414
Radio‐frequency linac‐driven free‐electron laser configurations
J. Appl. Phys. 66, 1549–1555 (1989)
https://doi.org/10.1063/1.344415
Bleustein–Gulyaev waves in gallium arsenide and other piezoelectric cubic crystals
J. Appl. Phys. 66, 1556–1564 (1989)
https://doi.org/10.1063/1.344416
The characterization of high‐frequency ultrasonic fields using a polarimetric optical fiber sensor
J. Appl. Phys. 66, 1565–1570 (1989)
https://doi.org/10.1063/1.344417
Characterization of sub‐10‐μm 30‐ps flash duration point sources for x radiography
J. Appl. Phys. 66, 1571–1578 (1989)
https://doi.org/10.1063/1.344398
A theory of abrupt termination and spontaneous restart of electrical current in surface flashover arcs
J. Appl. Phys. 66, 1579–1593 (1989)
https://doi.org/10.1063/1.344372
Electrode breakdown in magnetohydrodynamic plasmas: Stability analysis
J. Appl. Phys. 66, 1610–1617 (1989)
https://doi.org/10.1063/1.344374
Cavity perturbation measurement of plasma density in complex geometry rf discharges
J. Appl. Phys. 66, 1618–1621 (1989)
https://doi.org/10.1063/1.344375
Enhancement of the negative ion flux to surfaces from radio‐frequency processing discharges
J. Appl. Phys. 66, 1622–1631 (1989)
https://doi.org/10.1063/1.344376
A theoretical study of a laser‐irradiated capillary discharge
J. Appl. Phys. 66, 1632–1640 (1989)
https://doi.org/10.1063/1.344377
Modeling of a plasma column produced and sustained by a traveling electromagnetic surface wave
J. Appl. Phys. 66, 1641–1650 (1989)
https://doi.org/10.1063/1.344378
Pressure‐induced changes in the crystal structure and electrical properties of bulk InP
J. Appl. Phys. 66, 1658–1661 (1989)
https://doi.org/10.1063/1.344381
Free‐surface velocity measurement of shock‐compressed alumina powder compact using a Fabry–Perot interferometer
J. Appl. Phys. 66, 1662–1666 (1989)
https://doi.org/10.1063/1.344382
Single‐stage calculation of the total energy of compositionally modulated III‐V alloys
J. Appl. Phys. 66, 1667–1670 (1989)
https://doi.org/10.1063/1.344383
Mössbauer study of the crystallization of Fe100−xBx amorphous alloys (14≤x≤25)
J. Appl. Phys. 66, 1671–1675 (1989)
https://doi.org/10.1063/1.344384
Modulated optical reflectance measurements on bulk metals and thin metallic layers
J. Appl. Phys. 66, 1676–1679 (1989)
https://doi.org/10.1063/1.344385
Growth of BaF2 and of BaF2/SrF2 layers on (001)‐oriented GaAs
J. Appl. Phys. 66, 1680–1686 (1989)
https://doi.org/10.1063/1.344386
Growth studies of molecular‐beam epitaxial ZnSe using reflection high‐energy electron diffraction oscillations
J. Appl. Phys. 66, 1695–1698 (1989)
https://doi.org/10.1063/1.344388
Overlapping electron traps in n‐type silicon studied by capacitance transient spectroscopy
J. Appl. Phys. 66, 1699–1704 (1989)
https://doi.org/10.1063/1.344389
The excess carrier lifetime in p‐type HgCdTe measured by photoconductive decay
J. Appl. Phys. 66, 1705–1710 (1989)
https://doi.org/10.1063/1.344390
Influence of dislocations on electrical properties of large grained polycrystalline silicon cells. I. Model
J. Appl. Phys. 66, 1717–1722 (1989)
https://doi.org/10.1063/1.344392
Edge effect in near‐intrinsic germanium observed with a novel method for resistivity measurements
J. Appl. Phys. 66, 1727–1738 (1989)
https://doi.org/10.1063/1.344394
Strain effects and band offsets in GaAs/InGaAs strained layered quantum structures
J. Appl. Phys. 66, 1739–1747 (1989)
https://doi.org/10.1063/1.344395
Electrical conduction in a tin‐oxide–silicon interface prepared by spray pyrolysis
J. Appl. Phys. 66, 1748–1752 (1989)
https://doi.org/10.1063/1.344396
dc and ac transport in molecular‐beam‐epitaxy‐grown metal/ZnSe/GaAs heterojunction structures
J. Appl. Phys. 66, 1753–1758 (1989)
https://doi.org/10.1063/1.344397
Liquid junctions for characterization of electronic materials. II. Photoreflectance and electroreflectance of n‐Si
J. Appl. Phys. 66, 1759–1764 (1989)
https://doi.org/10.1063/1.344492
Analysis of the capacitive coupling of Josephson transmission lines
J. Appl. Phys. 66, 1772–1776 (1989)
https://doi.org/10.1063/1.344368
Preparation of a single‐phase (Bi0.9Pb0.1)2Sr2Ca2Cu3Oy ceramic superconductor
J. Appl. Phys. 66, 1777–1781 (1989)
https://doi.org/10.1063/1.344347
Melt‐spun Nd2(CoxFe1−x)14B systems: Optimization of the hard magnetic properties
J. Appl. Phys. 66, 1782–1788 (1989)
https://doi.org/10.1063/1.344348
Modeling magneto‐optical domain erasure without cylindrical symmetry
J. Appl. Phys. 66, 1789–1792 (1989)
https://doi.org/10.1063/1.344349
Concentration profiling using x‐ray reflectivity: Application to Cu‐Al interfaces
J. Appl. Phys. 66, 1793–1799 (1989)
https://doi.org/10.1063/1.344350
Ion‐assisted deposition of mixed TiO2‐SiO2 films
J. Appl. Phys. 66, 1805–1809 (1989)
https://doi.org/10.1063/1.344352
Low‐cost technique for preparing Cd1−xZnxTe films and solar cells
J. Appl. Phys. 66, 1816–1821 (1989)
https://doi.org/10.1063/1.344353
Thermal hysteresis during phase transition in Ag2Te thin films: Thickness effect
J. Appl. Phys. 66, 1822–1825 (1989)
https://doi.org/10.1063/1.344354
Numerical simulation of dynamic consolidation of a SiC fiber‐reinforced aluminum composite
J. Appl. Phys. 66, 1826–1831 (1989)
https://doi.org/10.1063/1.344355
Effect of macroscopic stress on accelerated aging of GaInAsP channeled substrate buried heterostructure lasers
J. Appl. Phys. 66, 1849–1854 (1989)
https://doi.org/10.1063/1.344358
A model for the oxidation‐enhanced diffusion of boron in extrinsic silicon
J. Appl. Phys. 66, 1858–1860 (1989)
https://doi.org/10.1063/1.344360
Rapid thermal annealing of YBaCuO thin films deposited on SiO2 substrates
J. Appl. Phys. 66, 1866–1868 (1989)
https://doi.org/10.1063/1.344363
Influence of stresses on the thermal parameters of chromium‐doped GaAs
J. Appl. Phys. 66, 1868–1871 (1989)
https://doi.org/10.1063/1.344364
Electrical properties of B‐ion‐implanted Si layer preamorphized by Ge ions
J. Appl. Phys. 66, 1876–1878 (1989)
https://doi.org/10.1063/1.344366
Preparation and properties of Pb‐doped Bi‐Sr‐Ca‐Cu‐O superconductors
H. K. Lee; K. W. Lee; K. Park; N. M. Huang; O. K. Oh; J. S. Kim; K. H. Yoo; Y. B. Kim; C. S. Kim; Y. K. Cho; J. C. Park; S. I. Suck
J. Appl. Phys. 66, 1881–1883 (1989)
https://doi.org/10.1063/1.344370
Morphological changes of the surface structure of polymers due to excimer laser radiation: A synergetic effect?
J. Appl. Phys. 66, 1884–1886 (1989)
https://doi.org/10.1063/1.344371
Theoretical issues for critical currents of bulk polycrystalline YBa2Cu3O7−δ superconductors
J. Appl. Phys. 66, 1886–1888 (1989)
https://doi.org/10.1063/1.344346
A step-by-step guide to perform x-ray photoelectron spectroscopy
Grzegorz Greczynski, Lars Hultman
Celebrating notable advances in compound semiconductors: A tribute to Dr. Wladyslaw Walukiewicz
Kirstin Alberi, Junqiao Wu, et al.
GaN-based power devices: Physics, reliability, and perspectives
Matteo Meneghini, Carlo De Santi, et al.