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Measurements of swarm parameters and derived electron collision cross sections in methane
J. Appl. Phys. 65, 3311–3323 (1989)
https://doi.org/10.1063/1.342642
The equilibrium charge distribution and electric field at a vacuum/dielectric interface
J. Appl. Phys. 65, 3329–3334 (1989)
https://doi.org/10.1063/1.342644
Transient analysis of a step wave propagating in a lossy dielectric
J. Appl. Phys. 65, 3335–3339 (1989)
https://doi.org/10.1063/1.342645
High‐power conversion efficiency in a strained InGaAs/AlGaAs quantum well laser
J. Appl. Phys. 65, 3340–3343 (1989)
https://doi.org/10.1063/1.342646
Spatial‐frequency selection using downconversion optical parametric amplification
J. Appl. Phys. 65, 3347–3350 (1989)
https://doi.org/10.1063/1.342648
Influence of Hall current on the stability properties of a self‐pinched intense electron beam
J. Appl. Phys. 65, 3356–3368 (1989)
https://doi.org/10.1063/1.342650
Ionization and current growth in N2 at very high electric field to gas density ratios
J. Appl. Phys. 65, 3369–3380 (1989)
https://doi.org/10.1063/1.342651
Bistability and hysteresis in a laser beatwave excited relativistic Langmuir wave
J. Appl. Phys. 65, 3381–3384 (1989)
https://doi.org/10.1063/1.342652
Material properties determining the resistance of ceramics to high velocity penetration
J. Appl. Phys. 65, 3417–3424 (1989)
https://doi.org/10.1063/1.342659
The effect of Ar+ sputtering on the x‐ray photoelectron spectra of plasma‐deposited silicon nitride films
J. Appl. Phys. 65, 3430–3434 (1989)
https://doi.org/10.1063/1.342661
Effects of Al and Ti interlayers on Sb/(HgCd)Te interface behavior
J. Appl. Phys. 65, 3435–3440 (1989)
https://doi.org/10.1063/1.342662
Nozzleless droplet formation with focused acoustic beams
S. A. Elrod; B. Hadimioglu; B. T. Khuri‐Yakub; E. G. Rawson; E. Richley; C. F. Quate; N. N. Mansour; T. S. Lundgren
J. Appl. Phys. 65, 3441–3447 (1989)
https://doi.org/10.1063/1.342663
On the role of oxygen and hydrogen in diamond‐forming discharges
J. Appl. Phys. 65, 3448–3452 (1989)
https://doi.org/10.1063/1.342635
Electronic and optical properties of Ti‐doped GaAs and InP; semi‐insulating InP
J. Appl. Phys. 65, 3459–3469 (1989)
https://doi.org/10.1063/1.342614
Dopant‐dependent formation and annealing of the dominant native deep‐level defect in liquid‐phase epitaxial AlGaAs
J. Appl. Phys. 65, 3470–3476 (1989)
https://doi.org/10.1063/1.342615
Selection criteria for AlGaAs‐GaAs heterostructures in view of their use as a quantum Hall resistance standard
W. van der Wel; E. G. Haanappel; J. E. Mooij; C. J. P. M. Harmans; J. P. André; G. Weimann; K. Ploog; C. T. Foxon; J. J. Harris
J. Appl. Phys. 65, 3487–3497 (1989)
https://doi.org/10.1063/1.342619
Effects of irradiation‐induced lattice defects on the quantum Hall effect in GaAs‐AlxGa1−xAs heterostructures
J. Appl. Phys. 65, 3498–3500 (1989)
https://doi.org/10.1063/1.342620
Study of the direct‐indirect band‐gap transition in GaAs/AlAs short‐period superlattices using photocurrent spectroscopy
J. Barrau; K. Khirouni; Th. Amand; J. C. Brabant; B. Brousseau; M. Brousseau; Phi Hoa Binh; F. Mollot; R. Planel
J. Appl. Phys. 65, 3501–3504 (1989)
https://doi.org/10.1063/1.342621
Anomalous electron‐beam‐induced‐current collection in denuded‐zone‐treated low‐doped silicon
J. Appl. Phys. 65, 3505–3509 (1989)
https://doi.org/10.1063/1.342622
Scattering effects on resonant tunneling in double‐barrier heterostructures
J. Appl. Phys. 65, 3510–3514 (1989)
https://doi.org/10.1063/1.342623
Stability of a ferroelectric copolymer‐induced inversion layer in silicon
J. Appl. Phys. 65, 3519–3525 (1989)
https://doi.org/10.1063/1.342625
Characterization of Si/CoSi2/Si(111) heterostructures using Auger plasmon losses
J. Appl. Phys. 65, 3531–3538 (1989)
https://doi.org/10.1063/1.342627
Thermally stable ohmic contacts to n‐type GaAs. IV. Role of Ni on NiInW contacts
J. Appl. Phys. 65, 3539–3545 (1989)
https://doi.org/10.1063/1.342628
Properties of metal‐semiconductor and metal‐insulator‐semiconductor junctions on CdTe single crystals
J. Appl. Phys. 65, 3552–3559 (1989)
https://doi.org/10.1063/1.342630
The effect of sputter cleaning on Au/GaAs contacts and the role of doping
J. Appl. Phys. 65, 3568–3573 (1989)
https://doi.org/10.1063/1.342632
Influence of the tank circuit noise on the dc impedance of the rf‐biased R‐SQUID
J. Appl. Phys. 65, 3579–3582 (1989)
https://doi.org/10.1063/1.342634
The effect of mass and pole strength on the levitation height of a magnet over a superconductor
J. Appl. Phys. 65, 3583–3585 (1989)
https://doi.org/10.1063/1.342636
Photoluminescence decay time studies of type II GaAs/AlAs quantum‐well structures
J. Appl. Phys. 65, 3606–3609 (1989)
https://doi.org/10.1063/1.342640
Surface photovoltage spectroscopy in hydrogenated amorphous silicon
J. Appl. Phys. 65, 3617–3630 (1989)
https://doi.org/10.1063/1.342610
Formation of polycrystalline silicon grains in Si+‐preamorphized, BF+2‐implanted (111)Si
J. Appl. Phys. 65, 3631–3635 (1989)
https://doi.org/10.1063/1.342611
In situ measurement of ion‐beam‐induced deposition of gold
J. Appl. Phys. 65, 3636–3643 (1989)
https://doi.org/10.1063/1.342612
The effect of rapid thermal annealing on the precipitation of oxygen in silicon
J. Appl. Phys. 65, 3644–3654 (1989)
https://doi.org/10.1063/1.342589
Shallow melting of thin heavily doped silicon layers by pulsed CO2 laser irradiation
J. Appl. Phys. 65, 3655–3661 (1989)
https://doi.org/10.1063/1.342590
Melting and solidification behavior of YBa2Cu3O7−x
J. Appl. Phys. 65, 3662–3666 (1989)
https://doi.org/10.1063/1.342591
Determination of interfacial stress during thermal oxidation of silicon
J. Appl. Phys. 65, 3667–3670 (1989)
https://doi.org/10.1063/1.342592
Monte Carlo calculation of the thermalization of atoms sputtered from the cathode of a sputtering discharge
J. Appl. Phys. 65, 3671–3679 (1989)
https://doi.org/10.1063/1.342593
Total dose effect on soft error rate for dynamic metal‐oxide‐semiconductor memory cells
J. Appl. Phys. 65, 3694–3697 (1989)
https://doi.org/10.1063/1.342596
Electron emission from glow‐discharge cathode materials due to neon and argon ion bombardment
J. Appl. Phys. 65, 3713–3716 (1989)
https://doi.org/10.1063/1.342600
High‐power, diffraction‐limited‐beam operation from interferometric, phase‐locked arrays of AlGaAs/GaAs diode lasers
J. Appl. Phys. 65, 3716–3718 (1989)
https://doi.org/10.1063/1.342601
Selective epitaxial growth in silicon on insulator: Planarity and mass flow
J. Appl. Phys. 65, 3718–3721 (1989)
https://doi.org/10.1063/1.342602
The hole photoionization cross section of EL2 in GaAs1−xPx
J. Appl. Phys. 65, 3721–3723 (1989)
https://doi.org/10.1063/1.342603
Doping of InP and GaInAs with S during metalorganic vapor‐phase epitaxy
J. Appl. Phys. 65, 3723–3725 (1989)
https://doi.org/10.1063/1.342604
Photoinduced current transient spectroscopy in silicon‐on‐insulator films formed by oxygen implantation
J. Appl. Phys. 65, 3725–3727 (1989)
https://doi.org/10.1063/1.342605
Nuclear magnetic resonance imaging as a tool to characterize defect densities in solids
J. Appl. Phys. 65, 3728–3730 (1989)
https://doi.org/10.1063/1.342606
Impulse coupling enhancement of aluminum targets under laser irradiation in a soft polymer confined geometry
C. Le Bras, E. Lescoute, et al.
A step-by-step guide to perform x-ray photoelectron spectroscopy
Grzegorz Greczynski, Lars Hultman
GaN-based power devices: Physics, reliability, and perspectives
Matteo Meneghini, Carlo De Santi, et al.