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Space‐charge‐limited current density as a function of electron flow duration in an emissive diode
J. Appl. Phys. 65, 2889–2895 (1989)
https://doi.org/10.1063/1.342734
Near‐zone fields behind circular apertures in thick, perfectly conducting screens
J. Appl. Phys. 65, 2896–2899 (1989)
https://doi.org/10.1063/1.342735
Deep‐level trap model of diode laser modulation: Significance of spontaneous emission and gain saturation
J. Appl. Phys. 65, 2912–2917 (1989)
https://doi.org/10.1063/1.343413
Three‐dimensional transient thermal analysis for laser chemical vapor deposition on uniformly moving finite slabs
J. Appl. Phys. 65, 2923–2934 (1989)
https://doi.org/10.1063/1.342739
Generalized criteria for microwave breakdown in air‐filled waveguides
J. Appl. Phys. 65, 2935–2945 (1989)
https://doi.org/10.1063/1.342740
Modeling of time‐dependent laser‐induced plasma spectra formed on a carbon surface
J. Appl. Phys. 65, 2946–2950 (1989)
https://doi.org/10.1063/1.342741
A photoemission investigation of surface processes affecting the reactive ion etching of TiSi2 in CF4
J. Appl. Phys. 65, 2951–2956 (1989)
https://doi.org/10.1063/1.342742
Vacancy supersaturation in Si under SiO2 caused by SiO formation during annealing in Ar
J. Appl. Phys. 65, 2957–2963 (1989)
https://doi.org/10.1063/1.343412
Atomic and carrier profiles of 1‐, 2‐, 4‐, and 6‐MeV 30Si implanted into GaAs
J. Appl. Phys. 65, 2986–2990 (1989)
https://doi.org/10.1063/1.342715
Generalized expressions for the calculation of elastic constants by computer simulation
J. Appl. Phys. 65, 2991–2997 (1989)
https://doi.org/10.1063/1.342716
Tantalum nitride as a diffusion barrier between Pd2Si or CoSi2 and aluminum
J. Appl. Phys. 65, 3017–3022 (1989)
https://doi.org/10.1063/1.342693
A real time ellipsometry study of the growth of amorphous silicon on transparent conducting oxides
J. Appl. Phys. 65, 3023–3034 (1989)
https://doi.org/10.1063/1.342694
Molybdenum deposition from the decomposition of molybdenum hexacarbonyl
J. Appl. Phys. 65, 3035–3043 (1989)
https://doi.org/10.1063/1.342695
An annealing study of relaxation and interface quality in Si‐Si1−xGex strained‐layer superlattices
J. Appl. Phys. 65, 3049–3055 (1989)
https://doi.org/10.1063/1.342697
Island films resulting from ion bombardment: Spectroscopic ellipsometry and Auger electron spectroscopy
J. Appl. Phys. 65, 3056–3060 (1989)
https://doi.org/10.1063/1.342698
Hydrogenation kinetics and defect termination of post‐plasma‐treated chemical‐vapor‐deposited amorphous silicon film
J. Appl. Phys. 65, 3061–3068 (1989)
https://doi.org/10.1063/1.342699
An electron trap related to phosphorus deficiency in high‐purity InP grown by metalorganic chemical vapor deposition
J. Appl. Phys. 65, 3072–3075 (1989)
https://doi.org/10.1063/1.342701
Annealing behavior of undoped Hg0.8Cd0.2Te epitaxial films at low temperatures
J. Appl. Phys. 65, 3080–3088 (1989)
https://doi.org/10.1063/1.342703
Impurity scattering with semiclassical screening in multiband quasi‐one‐dimensional systems
J. Appl. Phys. 65, 3089–3095 (1989)
https://doi.org/10.1063/1.342704
Electronic structures of In1−xGaxAs‐InP strained‐layer quantum wells
J. Appl. Phys. 65, 3096–3100 (1989)
https://doi.org/10.1063/1.342705
Investigation of high‐quality GaAs:In layers grown by molecular‐beam epitaxy
J. Appl. Phys. 65, 3101–3106 (1989)
https://doi.org/10.1063/1.342706
The role of hydrogen in altering the electrical properties of gold, titanium, and tungsten films
J. Appl. Phys. 65, 3107–3117 (1989)
https://doi.org/10.1063/1.342707
Electrical behavior of a static hole inversion layer at the i‐AlAs/n‐GaAs heterojunction
J. Appl. Phys. 65, 3118–3126 (1989)
https://doi.org/10.1063/1.342708
Wentzel–Kramers–Brillouin approximation for a quantum well with internal and external fields
J. Appl. Phys. 65, 3127–3129 (1989)
https://doi.org/10.1063/1.343400
Single‐crystal YBa2Cu3O7−x and Bi2Ca1+xSr2−xCu2O8+y surfaces and Ag adatom‐induced modification
J. Appl. Phys. 65, 3130–3135 (1989)
https://doi.org/10.1063/1.342709
Mechanical and high‐temperature (920 °C) magnetic field grain alignment of polycrystalline (Ho,Y)Ba2Cu3O7−δ
J. Appl. Phys. 65, 3136–3141 (1989)
https://doi.org/10.1063/1.342710
Preparation and microstructure of La‐containing R‐Fe‐B permanent magnets
J. Appl. Phys. 65, 3142–3145 (1989)
https://doi.org/10.1063/1.342711
Magnetic properties of Fe/Co, Fe/CoFe, and (Fe/Co)/SiO2 multilayer films
J. Appl. Phys. 65, 3151–3156 (1989)
https://doi.org/10.1063/1.342690
Magnetic properties of multilayer films consisting of Fe and nonmagnetic layers
J. Appl. Phys. 65, 3157–3160 (1989)
https://doi.org/10.1063/1.342691
Domain structure and microstructure of CoNi oblique incidence thin films
J. Appl. Phys. 65, 3161–3166 (1989)
https://doi.org/10.1063/1.342692
The cooling rate dependence of cation distributions in CoFe2O4
J. Appl. Phys. 65, 3167–3172 (1989)
https://doi.org/10.1063/1.342667
Picosecond time evolution of photoexcited hot‐electron mobility in GaAs and the speed of photoresponse
J. Appl. Phys. 65, 3189–3196 (1989)
https://doi.org/10.1063/1.342670
Selective titanium disilicide by low‐pressure chemical vapor deposition
J. Appl. Phys. 65, 3212–3218 (1989)
https://doi.org/10.1063/1.342673
The etching mechanism of titanium polycide in a mixture of SF6 and O2
J. Appl. Phys. 65, 3226–3235 (1989)
https://doi.org/10.1063/1.342675
Minimum dc electric field requirements for removing powder layers from a conductive surface
J. Appl. Phys. 65, 3242–3247 (1989)
https://doi.org/10.1063/1.342677
rf‐sputtered tungsten‐amorphous silicon Schottky barrier diodes
J. Appl. Phys. 65, 3248–3252 (1989)
https://doi.org/10.1063/1.342678
Advantages of an indirect semiconductor quantum well system for infrared detection
J. Appl. Phys. 65, 3253–3258 (1989)
https://doi.org/10.1063/1.342679
Deuterium magnetic resonance and permeability in porous media
J. Appl. Phys. 65, 3259–3263 (1989)
https://doi.org/10.1063/1.342680
Determination of shallow minority‐acceptor concentration in multiply doped silicon
J. Appl. Phys. 65, 3270–3271 (1989)
https://doi.org/10.1063/1.342683
Radiation‐induced carbon‐related defects in p‐type silicon
J. Appl. Phys. 65, 3272–3274 (1989)
https://doi.org/10.1063/1.343411
Scanning tunneling microscope investigation of (100) and (001) faces of YBa2Cu3O7−δ
J. Appl. Phys. 65, 3274–3276 (1989)
https://doi.org/10.1063/1.342684
Sol‐gel preparation of high‐Tc Bi‐Ca‐Sr‐Cu‐O and Y‐Ba‐Ca‐O superconductors
J. Appl. Phys. 65, 3277–3279 (1989)
https://doi.org/10.1063/1.342685
Lattice vibration spectra of GaP1−xSbx and InP1−xSbx
J. Appl. Phys. 65, 3285–3288 (1989)
https://doi.org/10.1063/1.342688
Acousto‐optic performance of monomode dilute melt proton exchange waveguiding Bragg cells
J. Appl. Phys. 65, 3288–3290 (1989)
https://doi.org/10.1063/1.342689
Electro‐optical response characteristics of rare‐earth‐doped alkaline‐earth‐sulfide electroluminescent devices
J. Appl. Phys. 65, 3290–3292 (1989)
https://doi.org/10.1063/1.342664
Optical modulation of light transmission in GaAs doping superlattices
J. Appl. Phys. 65, 3293–3295 (1989)
https://doi.org/10.1063/1.342665
Temperature‐dependent transmission extended electron energy‐loss fine structure of aluminum
J. Appl. Phys. 65, 3295–3297 (1989)
https://doi.org/10.1063/1.343410
Effects of deuterium plasmas on silicon near‐surface properties
J. Appl. Phys. 65, 3297–3300 (1989)
https://doi.org/10.1063/1.342666
Raman scattering evaluation of Pb2CrO5 thin film on a glass substrate
J. Appl. Phys. 65, 3300–3302 (1989)
https://doi.org/10.1063/1.342641
A step-by-step guide to perform x-ray photoelectron spectroscopy
Grzegorz Greczynski, Lars Hultman
Distinct deformation mechanisms of silicate glasses under nanoindentation: The critical role of structure
Ziming Yan, Ranran Lu, et al.
Tutorial: Simulating modern magnetic material systems in mumax3
Jonas J. Joos, Pedram Bassirian, et al.