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A reinvestigation of the etch products of silicon and XeF2: Doping and pressure effects
J. Appl. Phys. 60, 3018–3027 (1986)
https://doi.org/10.1063/1.337756
Microstructurally engineered, optically transmissive, electrically conductive metal films
J. Appl. Phys. 60, 3028–3034 (1986)
https://doi.org/10.1063/1.337757
Preparation and characteristics of the TlBr‐TlI fiber for a high power CO2 laser beam
J. Appl. Phys. 60, 3035–3039 (1986)
https://doi.org/10.1063/1.337758
Compressional wave propagation in liquid and/or gas saturated elastic porous media
J. Appl. Phys. 60, 3045–3055 (1986)
https://doi.org/10.1063/1.337760
Inertial confinement fusion ion temperature measurements using a single‐hit detector array
J. Appl. Phys. 60, 3068–3071 (1986)
https://doi.org/10.1063/1.337762
Application of the physics of plasma sheaths to the modeling of rf plasma reactors
J. Appl. Phys. 60, 3081–3087 (1986)
https://doi.org/10.1063/1.337764
Electron density measurements in a photoinitiated, impulse‐enhanced, electrically excited laser gas discharge
J. Appl. Phys. 60, 3088–3092 (1986)
https://doi.org/10.1063/1.337765
Audio frequency dielectric response of the liquid‐crystal CE8 in chiral and racemic forms
J. Appl. Phys. 60, 3093–3099 (1986)
https://doi.org/10.1063/1.337766
Backscattering analysis of AuGe‐Ni ohmic contacts of n‐GaAs
J. Appl. Phys. 60, 3100–3104 (1986)
https://doi.org/10.1063/1.337767
Time response of a nematic liquid‐crystal cell in a switched dc electric field
J. Appl. Phys. 60, 3111–3113 (1986)
https://doi.org/10.1063/1.337721
Cross‐sectional transmission electron microscope study of residual defects in BF+2‐implanted (001)Si
J. Appl. Phys. 60, 3114–3119 (1986)
https://doi.org/10.1063/1.337722
Thickness dependence of the critical solution temperature of hydrogen in Pd films
J. Appl. Phys. 60, 3125–3130 (1986)
https://doi.org/10.1063/1.337724
Characteristics of laser metalorganic vapor‐phase epitaxy in GaAs
J. Appl. Phys. 60, 3131–3135 (1986)
https://doi.org/10.1063/1.337725
Low‐temperature deposition of high‐quality silicon dioxide by plasma‐enhanced chemical vapor deposition
J. Appl. Phys. 60, 3136–3145 (1986)
https://doi.org/10.1063/1.337726
Deposition of the reactive metals Al and In onto sputtered and cleaved Hg1−xCdxTe surfaces
J. Appl. Phys. 60, 3150–3156 (1986)
https://doi.org/10.1063/1.337802
Deposition of the unreactive metal Au onto sputtered and cleaved Hg1−xCdxTe surfaces
J. Appl. Phys. 60, 3157–3161 (1986)
https://doi.org/10.1063/1.337728
Local epitaxy of TiSi2 on (111)Si: Effects due to rapid thermal annealing and to the annealing atmosphere
J. Appl. Phys. 60, 3172–3175 (1986)
https://doi.org/10.1063/1.337731
The localized density of states in amorphous silicon determined by electrophotography
J. Appl. Phys. 60, 3176–3181 (1986)
https://doi.org/10.1063/1.337732
Carrier surface generation and recombination effects in photoconduction of HgI2 single crystals
J. Appl. Phys. 60, 3182–3187 (1986)
https://doi.org/10.1063/1.337733
Ionization of methane and ethane by x rays: Effect of fluid density on energy absorption (dosimetry)
J. Appl. Phys. 60, 3188–3191 (1986)
https://doi.org/10.1063/1.337734
‘‘New donors’’ in silicon: An interface effect due to internal oxidation
J. Appl. Phys. 60, 3192–3195 (1986)
https://doi.org/10.1063/1.337735
Ohmic, superconducting, shallow AuGe/Nb contacts to GaAs
J. Appl. Phys. 60, 3204–3210 (1986)
https://doi.org/10.1063/1.337738
Calculated quasi‐eigenstates and quasi‐eigenenergies of quantum well superlattices in an applied electric field
J. Appl. Phys. 60, 3211–3213 (1986)
https://doi.org/10.1063/1.337739
Origin of persistent photoconductivity in n‐InP/GaInAs two‐dimensional electron gas
J. Appl. Phys. 60, 3224–3226 (1986)
https://doi.org/10.1063/1.337741
Surface chemistry of HF passivated silicon: X‐ray photoelectron and ion scattering spectroscopy results
J. Appl. Phys. 60, 3232–3234 (1986)
https://doi.org/10.1063/1.337743
Schottky barrier degradation of the W/GaAs system after high‐temperature annealing
J. Appl. Phys. 60, 3235–3242 (1986)
https://doi.org/10.1063/1.337744
Aspects of thermal activation theory and applications to the Josephson effect
J. Appl. Phys. 60, 3243–3246 (1986)
https://doi.org/10.1063/1.337745
Modeling a voltage‐locked Josephson junction array amplifier: Gain, input impedance, and bandwidth
J. Appl. Phys. 60, 3247–3257 (1986)
https://doi.org/10.1063/1.337746
A study of the aftereffect of the magnetic permeability in Co‐rich amorphous ferromagnetic alloys
J. Appl. Phys. 60, 3258–3262 (1986)
https://doi.org/10.1063/1.337714
Hydrogen out‐diffusion suppression effect of overlayers in H+2 ‐implanted magnetic bubble garnet
J. Appl. Phys. 60, 3269–3274 (1986)
https://doi.org/10.1063/1.337717
Optics of twisted nematic and supertwisted nematic liquid‐crystal displays
J. Appl. Phys. 60, 3275–3281 (1986)
https://doi.org/10.1063/1.337718
Finite‐size effects on Raman scattering from GaAs‐AlAs superlattices
J. Appl. Phys. 60, 3289–3292 (1986)
https://doi.org/10.1063/1.337720
Variable angle of incidence spectroscopic ellipsometry: Application to GaAs‐AlxGa1−xAs multiple heterostructures
J. Appl. Phys. 60, 3293–3302 (1986)
https://doi.org/10.1063/1.337695
Time‐resolved Raman scattering measurement of photoexcited plasmon in GaP crystals
J. Appl. Phys. 60, 3303–3308 (1986)
https://doi.org/10.1063/1.337696
Eddy current test of steel tube employing electromagnet technique for dc magnetization
J. Appl. Phys. 60, 3327–3334 (1986)
https://doi.org/10.1063/1.337700
Effects of dopants and excess silicon on the oxidation of TaSi2/polycrystalline silicon structures
J. Appl. Phys. 60, 3335–3342 (1986)
https://doi.org/10.1063/1.337701
Photochemical vapor deposition of hydrogenated amorphous silicon films from hydrogen diluted monosilane
J. Appl. Phys. 60, 3364–3366 (1986)
https://doi.org/10.1063/1.337705
Effects of Joule heating and transpiration on heat transfer in magnetohydrodynamic boundary layers
J. Appl. Phys. 60, 3366–3368 (1986)
https://doi.org/10.1063/1.337706
Determination of dynamic release curves of manganin stress gauges from their resistive hysteresis
J. Appl. Phys. 60, 3369–3371 (1986)
https://doi.org/10.1063/1.337707
Layered magnetic domains in Fe‐Cu multilayer films imaged by Schlieren–Lorentz microscopy
J. Appl. Phys. 60, 3381–3383 (1986)
https://doi.org/10.1063/1.337712
A step-by-step guide to perform x-ray photoelectron spectroscopy
Grzegorz Greczynski, Lars Hultman
Distinct deformation mechanisms of silicate glasses under nanoindentation: The critical role of structure
Ziming Yan, Ranran Lu, et al.
Tutorial: Simulating modern magnetic material systems in mumax3
Jonas J. Joos, Pedram Bassirian, et al.