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Production of relativistic, rotating electron beams by gyroresonant rf acceleration in a TE111 cavity
J. Appl. Phys. 58, 4501–4508 (1985)
https://doi.org/10.1063/1.336262
Low‐threshold disorder‐defined buried‐heterostructure AlxGa1−xAs‐GaAs quantum well lasers
J. Appl. Phys. 58, 4515–4520 (1985)
https://doi.org/10.1063/1.336265
Strain and surface damage induced by proton exchange in Y‐cut LiNbO3
A. Campari; C. Ferrari; G. Mazzi; C. Summonte; S. M. Al‐Shukri; A. Dawar; R. M. De La Rue; A. C. G. Nutt
J. Appl. Phys. 58, 4521–4524 (1985)
https://doi.org/10.1063/1.336266
Scattering of ultrasonic waves by oblate spheroidal voids of high aspect ratios
J. Appl. Phys. 58, 4525–4530 (1985)
https://doi.org/10.1063/1.336267
Instability of the heat flux in a laser‐produced plasma in the presence of an ion acoustic instability
J. Appl. Phys. 58, 4539–4543 (1985)
https://doi.org/10.1063/1.336269
Ion implantation of Si by 12C, 29Si, and 120Sn: Amorphization and annealing effects
J. Appl. Phys. 58, 4553–4564 (1985)
https://doi.org/10.1063/1.336271
Differential scanning calorimetry studies of amorphous Zr2PdHx and Zr3RhHx
J. Appl. Phys. 58, 4573–4581 (1985)
https://doi.org/10.1063/1.336273
Measurements of the diffusion rate of lithium in aluminum at low temperature by elastic recoil detection analysis
J. Appl. Phys. 58, 4582–4586 (1985)
https://doi.org/10.1063/1.336250
Study of molybdenum‐aluminum interdiffusion kinetics and contact resistance for VLSI applications
J. Appl. Phys. 58, 4598–4604 (1985)
https://doi.org/10.1063/1.336227
Electron and hole impact ionization coefficients in (100) and in (111) Si
J. Appl. Phys. 58, 4614–4617 (1985)
https://doi.org/10.1063/1.336229
Decay kinetics of photoconductivity of PbSnTe doped with indium
J. Appl. Phys. 58, 4618–4620 (1985)
https://doi.org/10.1063/1.336230
Effects of deep Fe acceptors on the impedance of a semi‐insulating n‐type Fe‐doped InP Schottky barrier
J. Appl. Phys. 58, 4626–4632 (1985)
https://doi.org/10.1063/1.336232
Artificial oxide barriers for NbN tunnel junctions
J. Appl. Phys. 58, 4638–4642 (1985)
https://doi.org/10.1063/1.336234
High Tc superconducting NbN films deposited at room temperature
J. Appl. Phys. 58, 4643–4648 (1985)
https://doi.org/10.1063/1.336235
Simulation of thermally stimulated currents in dielectrics: Effect of thermal expansion
J. Appl. Phys. 58, 4654–4657 (1985)
https://doi.org/10.1063/1.336237
Vibrational spectra of polysilane alloys
J. Appl. Phys. 58, 4658–4661 (1985)
https://doi.org/10.1063/1.336238
Cryogenic‐pressure response of optical transitions in quantum well and bulk GaAs: A direct comparative study
J. Appl. Phys. 58, 4662–4665 (1985)
https://doi.org/10.1063/1.336239
Investigation of the kinetic mechanism for the ion‐assisted etching of GaAs in Cl2 using a modulated ion beam
J. Appl. Phys. 58, 4670–4678 (1985)
https://doi.org/10.1063/1.336241
Characterization of high‐purity Si‐doped molecular beam epitaxial GaAs
B. J. Skromme; S. S. Bose; B. Lee; T. S. Low; T. R. Lepkowski; R. Y. DeJule; G. E. Stillman; J. C. M. Hwang
J. Appl. Phys. 58, 4685–4702 (1985)
https://doi.org/10.1063/1.336243
Response of lithographic mask structures of intense repetitively pulsed x rays: Thermal stress analysis
J. Appl. Phys. 58, 4717–4725 (1985)
https://doi.org/10.1063/1.336245
Response of lithographic mask structures to intense repetitively pulsed x rays: Dynamic response analysis
J. Appl. Phys. 58, 4726–4729 (1985)
https://doi.org/10.1063/1.336246
InGaAsP p‐i‐n photodiodes for optical communication at the 1.3‐μm wavelength
J. Appl. Phys. 58, 4730–4732 (1985)
https://doi.org/10.1063/1.336247
Experimental study of the ion emission from a 0.53‐μm laser‐produced plasma
J. C. Kieffer; Y. Quemener; J. Briand; A. Gomes; V. Adrian; J. P. Dinguirard; M. Armengaud; J. P. Thoron; N. Fournier; M. El Tamer; C. Arnas; A. Poquérusse
J. Appl. Phys. 58, 4736–4739 (1985)
https://doi.org/10.1063/1.336249
A step-by-step guide to perform x-ray photoelectron spectroscopy
Grzegorz Greczynski, Lars Hultman
Tutorial: Simulating modern magnetic material systems in mumax3
Jonas J. Joos, Pedram Bassirian, et al.
Piezoelectric thin films and their applications in MEMS: A review
Jinpeng Liu, Hua Tan, et al.