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Elastic wave scattering by a flaw in an isotropic, homogeneous solid
J. Appl. Phys. 52, 3729–3737 (1981)
https://doi.org/10.1063/1.329833
Optimal heating of the working fluid in a cylinder equipped with a moving piston
J. Appl. Phys. 52, 3745–3749 (1981)
https://doi.org/10.1063/1.329836
An injector based on electric insulation for the controlled ballistic focusing of light ion beams
J. Appl. Phys. 52, 3761–3768 (1981)
https://doi.org/10.1063/1.329839
Pressure measurement at high temperatures in the diamond anvil cell
J. Appl. Phys. 52, 3772–3775 (1981)
https://doi.org/10.1063/1.329841
Electron collision quenching of CO(v) chemiluminescence in CS2/O2 and CS2/O2/N2O flames
J. Appl. Phys. 52, 3776–3779 (1981)
https://doi.org/10.1063/1.329215
Ion beam extraction from a plasma with aberration reduction by method of mutual exclusion
J. Appl. Phys. 52, 3787–3790 (1981)
https://doi.org/10.1063/1.329217
The picosecond ultrashort cavity dye laser: Giant pulse analogy and active étalon model
J. Appl. Phys. 52, 3800–3820 (1981)
https://doi.org/10.1063/1.329843
Assignment of the 7Li2 optically pumped laser transitions pumped by Ar+ and Kr+ laser lines
J. Appl. Phys. 52, 3821–3826 (1981)
https://doi.org/10.1063/1.329844
Method for determining effective nonradiative lifetime and leakage losses in double‐heterostructure lasers
J. Appl. Phys. 52, 3827–3839 (1981)
https://doi.org/10.1063/1.329845
Very low threshold‐current temperature sensitivity in constricted double‐heterojunction AlGaAs lasers
J. Appl. Phys. 52, 3840–3844 (1981)
https://doi.org/10.1063/1.329846
On the spatial mode stability of oxide stripe cw lasers during accelerated aging at 70 °C
J. Appl. Phys. 52, 3845–3848 (1981)
https://doi.org/10.1063/1.329847
Extremely low‐loss glass thin‐film optical waveguides utilizing surface coating and laser annealing
J. Appl. Phys. 52, 3873–3875 (1981)
https://doi.org/10.1063/1.329854
Heat regeneration in Malone‐type liquid engines using a parallel‐plate thermodynamic pile geometry
J. Appl. Phys. 52, 3876–3883 (1981)
https://doi.org/10.1063/1.329855
Dynamic computer simulation of viscous flow sintering kinetics
J. Appl. Phys. 52, 3884–3888 (1981)
https://doi.org/10.1063/1.329235
Effects of dispersion on the radiation of ion acoustic waves
J. Appl. Phys. 52, 3902–3904 (1981)
https://doi.org/10.1063/1.329238
Breakdown field strength of SF6, N2O, SF6+N2, and SF6+N2O
J. Appl. Phys. 52, 3912–3920 (1981)
https://doi.org/10.1063/1.329240
Theoretical quantities of some parameters in the cathode‐fall region of a copper vacuum arc
J. Appl. Phys. 52, 3924–3928 (1981)
https://doi.org/10.1063/1.329196
Modelling strain distributions in ion‐implanted magnetic bubble materials
J. Appl. Phys. 52, 3935–3940 (1981)
https://doi.org/10.1063/1.329198
A nondestructive method to determine the stress distributions of neon‐implanted garnet layers
J. Appl. Phys. 52, 3969–3973 (1981)
https://doi.org/10.1063/1.329203
Characterization of polished (111) silicon crystal surface by diffuse x‐ray scattering
J. Appl. Phys. 52, 3989–3991 (1981)
https://doi.org/10.1063/1.329206
Structural and photoluminescent properties of GaxIn1−xP(x≊0.5) grown on GaAs by molecular beam epitaxy
J. Appl. Phys. 52, 4018–4026 (1981)
https://doi.org/10.1063/1.329211
The effect of phosphorus ion implantation on molybdenum/silicon contacts
J. Appl. Phys. 52, 4027–4032 (1981)
https://doi.org/10.1063/1.329268
GaInAs‐AlInAs structures grown by molecular beam epitaxy
J. Appl. Phys. 52, 4033–4037 (1981)
https://doi.org/10.1063/1.329212
Ion implantation and low‐temperature epitaxial regrowth of GaAs
J. Appl. Phys. 52, 4038–4046 (1981)
https://doi.org/10.1063/1.329213
Gold‐aluminum thin‐film interactions and compound formation
J. Appl. Phys. 52, 4047–4054 (1981)
https://doi.org/10.1063/1.329214
Compounds in the Pd‐Si and Pt‐Si system obtained by electron bombardment and post‐thermal annealing
J. Appl. Phys. 52, 4055–4061 (1981)
https://doi.org/10.1063/1.329253
A study of Ge/GaAs interfaces grown by molecular beam epitaxy
J. Appl. Phys. 52, 4062–4069 (1981)
https://doi.org/10.1063/1.329254
Disappearance of impurity levels in silicon and germanium due to screening
J. Appl. Phys. 52, 4075–4080 (1981)
https://doi.org/10.1063/1.329256
Characterization of electron traps in SiO2 as influenced by processing parameters
J. Appl. Phys. 52, 4090–4094 (1981)
https://doi.org/10.1063/1.329259
Electrical transport properties of p‐type Pb1−xCdxTe thin films
J. Appl. Phys. 52, 4095–4097 (1981)
https://doi.org/10.1063/1.329260
Electron transport across the abrupt Ge‐GaAs n‐n heterojunction
J. Appl. Phys. 52, 4098–4103 (1981)
https://doi.org/10.1063/1.329261
Current instability phenomena in ZnO varistors under a continuous ac stress
J. Appl. Phys. 52, 4104–4111 (1981)
https://doi.org/10.1063/1.329262
The behavior of dislocations in GaAs substrates during the growth of GaxAl1−xAs epitaxial layers
J. Appl. Phys. 52, 4112–4114 (1981)
https://doi.org/10.1063/1.329263
An oxygen‐sensitive electrode impedance in Sr‐doped LaCrO3
J. Appl. Phys. 52, 4115–4117 (1981)
https://doi.org/10.1063/1.329219
Influence of oxidation parameters on atomic roughness at the Si‐SiO2 interface
J. Appl. Phys. 52, 4122–4127 (1981)
https://doi.org/10.1063/1.329221
Conduction mechanisms and 1/f noise in thick‐film resistors with Pb3Rh7O15and Pb 2Ru2O7
J. Appl. Phys. 52, 4128–4134 (1981)
https://doi.org/10.1063/1.329222
Voltage locking between superconducting weak links via impedance coupling
J. Appl. Phys. 52, 4135–4144 (1981)
https://doi.org/10.1063/1.329223
Simulation of I‐V curves of small Josephson tunnel junctions with finite capacitance
J. Appl. Phys. 52, 4145–4149 (1981)
https://doi.org/10.1063/1.329224
Analysis on dc characteristics of Josephson structures by the one‐dimensional Green’s function method
J. Appl. Phys. 52, 4150–4155 (1981)
https://doi.org/10.1063/1.329225
A study of the magnetic, thermal, and optical absorption properties in Ho(OH)3 crystal
J. Appl. Phys. 52, 4156–4161 (1981)
https://doi.org/10.1063/1.329226
Magnetic properties and electrical resistivity of Ho‐Sm alloys at low temperatures
J. Appl. Phys. 52, 4162–4164 (1981)
https://doi.org/10.1063/1.329227
Experimental observation of surface modes along two parallel‐axially magnetized ferrite rods
J. Appl. Phys. 52, 4165–4169 (1981)
https://doi.org/10.1063/1.329228
Measurement of Fe‐Ga ion interchange by pulsed laser heating and fast cooling of magnetic bubble films
J. Appl. Phys. 52, 4170–4175 (1981)
https://doi.org/10.1063/1.329229
Dynamic Bloch‐line stacking—A new domain‐wall structure at high drives
J. Appl. Phys. 52, 4176–4180 (1981)
https://doi.org/10.1063/1.329230
Internal breakdown in a dielectric target at high laser irradiance
J. Appl. Phys. 52, 4186–4188 (1981)
https://doi.org/10.1063/1.329232
Electroreflectance studies in Cd1−xMnxTe solid solutions
J. Appl. Phys. 52, 4189–4193 (1981)
https://doi.org/10.1063/1.329233
Radiative cooling to low temperatures: General considerations and application to selectively emitting SiO films
J. Appl. Phys. 52, 4205–4220 (1981)
https://doi.org/10.1063/1.329270
Radiative transfer theory for active remote sensing of a homogenous layer containing spherical scatterers
J. Appl. Phys. 52, 4221–4230 (1981)
https://doi.org/10.1063/1.329271
Absorption of high‐intensity CO2 laser light in p‐type semiconductors with small spin‐orbit splittings
J. Appl. Phys. 52, 4238–4240 (1981)
https://doi.org/10.1063/1.329273
Thermoluminescence studies of LiF (TLD‐100) in the temperature interval 10–300 K
J. Appl. Phys. 52, 4244–4247 (1981)
https://doi.org/10.1063/1.329275
A molecular dynamics simulation study of the influence of the ion mass upon atom ejection processes
J. Appl. Phys. 52, 4251–4258 (1981)
https://doi.org/10.1063/1.329277
The theoretical treatment of range distributions of energetic light ions injected into a semi‐infinite random target
J. Appl. Phys. 52, 4259–4265 (1981)
https://doi.org/10.1063/1.329278
The dynamic effects of a thin metal plate during pulse heating and expansion into the liquid‐vapor region
J. Appl. Phys. 52, 4266–4275 (1981)
https://doi.org/10.1063/1.329279
The role of plasma diffusion in heat dissipation during laser annealing
J. Appl. Phys. 52, 4276–4280 (1981)
https://doi.org/10.1063/1.329280
Tunneling solar cell under concentrated light illumination
J. Appl. Phys. 52, 4288–4296 (1981)
https://doi.org/10.1063/1.329282
Thermal stability of titanium nitride for shallow junction solar cell contacts
J. Appl. Phys. 52, 4297–4299 (1981)
https://doi.org/10.1063/1.329283
Sensitivity analysis of a resonant mass gravitational wave antenna with resonant transducer
J. Appl. Phys. 52, 4313–4319 (1981)
https://doi.org/10.1063/1.329244
The radius and the electric field of a free‐burning discharge in argon
J. Appl. Phys. 52, 4320–4321 (1981)
https://doi.org/10.1063/1.329245
Channeling effect measurements in Si by using resonant nuclear backscattering of 18–19‐MeV α particles
J. Appl. Phys. 52, 4322–4324 (1981)
https://doi.org/10.1063/1.329246
Peltier‐induced liquid phase epitaxy and compositional control of mm‐thick layers of (Al,Ga)As
J. Appl. Phys. 52, 4325–4327 (1981)
https://doi.org/10.1063/1.329247
Misfit dislocations and the morphology of gallium aluminum arsenide epitaxial layers grown on gallium arsenide
J. Appl. Phys. 52, 4328–4329 (1981)
https://doi.org/10.1063/1.329248
Comments on ’’Raman scattering from boron‐implanted laser annealed silicon’’
J. Appl. Phys. 52, 4337–4339 (1981)
https://doi.org/10.1063/1.329251
Reply to ’’Comments on ’Raman scattering from boron‐implanted laser annealed silicon’ ’’
J. Appl. Phys. 52, 4340 (1981)
https://doi.org/10.1063/1.329252
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