A systematic experimental evaluation of the thermal stability of Ru metal gate electrodes in direct contact with and Hf-based dielectric layers was performed and correlated with electrical device measurements. The distinctly different interfacial reactions in the , , and film systems were observed through cross-sectional high-resolution transmission electron microscopy, high angle annular dark field scanning transmission electron microscopy with electron-energy-loss spectra, and energy dispersive x-ray spectra analysis. Ru interacted with , but remained stable on at . The onset of interfacial interactions is identified via silicon substrate pitting possibly from Ru diffusion into the dielectric in samples exposed to a anneal. The dependence of capacitor device degradation with decreasing thickness suggests Ru diffuses through , followed by an abrupt, rapid, nonuniform interaction of ruthenium silicide as Ru contacts the Si substrate. Local interdiffusion detected on samples may be due to phase separation of into grains within a matrix, suggesting that provides a diffusion pathway for Ru. Detailed evidence consistent with a dual reaction mechanism for the system at is presented.
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15 August 2005
Research Article|
August 24 2005
Thermal response of Ru electrodes in contact with and Hf-based high- gate dielectrics
H.-C. Wen;
H.-C. Wen
a)
SEMATECH
, 2706 Montopolis Drive, Austin, Texas 78741 and The University of Texas at Austin
, Pickle Research Campus-Microelectronics and Engineering Research (PRC-MER) Building 2.606A/R9950, Austin, Texas 78712
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P. Lysaght;
P. Lysaght
SEMATECH
, 2706 Montopolis Drive, Austin, Texas 78741
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H. N. Alshareef;
H. N. Alshareef
SEMATECH
, 2706 Montopolis Drive, Austin, Texas 78741
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C. Huffman;
C. Huffman
SEMATECH
, 2706 Montopolis Drive, Austin, Texas 78741
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H. R. Harris;
H. R. Harris
SEMATECH
, 2706 Montopolis Drive, Austin, Texas 78741
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K. Choi;
K. Choi
SEMATECH
, 2706 Montopolis Drive, Austin, Texas 78741
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Y. Senzaki;
Y. Senzaki
SEMATECH
, 2706 Montopolis Drive, Austin, Texas 78741
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H. Luan;
H. Luan
SEMATECH
, 2706 Montopolis Drive, Austin, Texas 78741
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P. Majhi;
P. Majhi
SEMATECH
, 2706 Montopolis Drive, Austin, Texas 78741
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B. H. Lee;
B. H. Lee
SEMATECH
, 2706 Montopolis Drive, Austin, Texas 78741
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M. J. Campin;
M. J. Campin
Advanced Technology Development Facility (ATDF) Inc.
, 2706 Montopolis Drive, Austin, Texas 78741
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B. Foran;
B. Foran
Advanced Technology Development Facility (ATDF) Inc.
, 2706 Montopolis Drive, Austin, Texas 78741
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G. D. Lian;
G. D. Lian
Advanced Technology Development Facility (ATDF) Inc.
, 2706 Montopolis Drive, Austin, Texas 78741
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D.-L. Kwong
D.-L. Kwong
The University of Texas at Austin
, Pickle Research Campus-Microelectronics and Engineering Research (PRC-MER) Building 2.606A/R9950, Austin, Texas 78712
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a)
Electronic mail: [email protected]
J. Appl. Phys. 98, 043520 (2005)
Article history
Received:
April 11 2005
Accepted:
July 13 2005
Citation
H.-C. Wen, P. Lysaght, H. N. Alshareef, C. Huffman, H. R. Harris, K. Choi, Y. Senzaki, H. Luan, P. Majhi, B. H. Lee, M. J. Campin, B. Foran, G. D. Lian, D.-L. Kwong; Thermal response of Ru electrodes in contact with and Hf-based high- gate dielectrics. J. Appl. Phys. 15 August 2005; 98 (4): 043520. https://doi.org/10.1063/1.2012510
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