nanobridges were fabricated by e-beam lithography and Ar-ion beam milling. Nanobridges of widths ranging from 60 nm to and in length were realized by Ar-ion beam milling using amorphous carbon as etching mask. The processing did not harm the superconducting properties appreciably. High values of the critical current density, more than , were measured for bridges with widths down to 60 nm. Current-voltage characteristics showed a behavior typical of a bridge going normal, after the critical current is exceeded, and remaining normal as the current is decreased to a lower switch back value due to Joule heating. We could also observe switching behavior in some bridges indicating formation of normal hotspots in the bridges before they returned to their superconducting state. Alternative explanations may include natural grain boundaries in the film or the movement of Abrikosov vortices. The current-voltage characteristics showing critical current densities up to indicates excellent film properties in the nanobridges.
Skip Nav Destination
Article navigation
15 December 2005
Research Article|
December 20 2005
Magnesium diboride nanobridges fabricated by electron-beam lithography
A. Malisa;
A. Malisa
a)
Department of Microtechnology and Nanoscience, Quantum Device Physics Laboratory,
Chalmers University of Technology
, SE-412 96 Göteborg, Sweden
Search for other works by this author on:
S. Charlebois;
S. Charlebois
Department of Microtechnology and Nanoscience, Quantum Device Physics Laboratory,
Chalmers University of Technology
, SE-412 96 Göteborg, Sweden and Département de Génie Electrique et de Génie Informatique, Faculté de Génie, Universitè de Sherbrooke
, Sherbrooke (Québec) J1K 2R1, Canada
Search for other works by this author on:
T. Lindström
T. Lindström
Department of Microtechnology and Nanoscience, Quantum Device Physics Laboratory,
Chalmers University of Technology
, SE-412 96 Göteborg, Sweden
Search for other works by this author on:
a)
Author to whom correspondence should be addressed; electronic mail: Anayesu.Malisa@mc2.chalmers.se
J. Appl. Phys. 98, 124305 (2005)
Article history
Received:
February 22 2005
Accepted:
November 07 2005
Citation
A. Malisa, S. Charlebois, T. Lindström; Magnesium diboride nanobridges fabricated by electron-beam lithography. J. Appl. Phys. 15 December 2005; 98 (12): 124305. https://doi.org/10.1063/1.2142095
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
A step-by-step guide to perform x-ray photoelectron spectroscopy
Grzegorz Greczynski, Lars Hultman
Selecting alternative metals for advanced interconnects
Jean-Philippe Soulié, Kiroubanand Sankaran, et al.
Defects in semiconductors
Cyrus E. Dreyer, Anderson Janotti, et al.
Related Content
MgB 2 grain boundary nanobridges prepared by focused ion beam
J. Appl. Phys. (January 2009)
Josephson effects in weakly coupled MgB 2 intergrain nanobridges prepared by focused ion beam
Appl. Phys. Lett. (November 2009)
Transport properties in FeSe0.5Te0.5 nanobridges
Appl. Phys. Lett. (June 2013)
Transition properties of a YBa2Cu3O7 nanobridge patterned across a twin boundary of a LaAlO3 substrate
J. Appl. Phys. (March 2012)
Formation of nanostructure in magnesium diboride based materials with high superconducting characteristics
Low Temp. Phys. (May 2016)