Modifications of -thick polycrystalline films by magnetic-field-assisted implantation of , , and ions have been investigated. For magnetic characterization, the longitudinal magneto-optic Kerr effect and magnetic force microscopy (MFM) in the remanent state have been used, while structural information has been gained from glancing-angle x-ray diffraction and Rutherford backscattering spectroscopy. The irradiated films show a soft-magnetic behavior with large magnetic anisotropy. The ions initially induce an increasing coercivity, possibly due to radiation defects accumulated during the ion implantation, while higher fluences anneal out the defects and reduce the coercivity. For the heavy ions the deposited energy density is high enough to reduce the coercivity at small fluences and then to increase it slightly for increasing fluence. Correlations between the magnetic anisotropy, coercivity and the ion species and fluence have been established. The MFM pictures feature the largest changes in the case of ions. The magnetic anisotropy reflects the interplay between magnetocrystalline and magnetostrictive forces. For heavier ions and large fluences, the direction of the in-plane magnetic easy axis follows the orientation of the external magnetic field present during implantation.
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1 April 2005
Research Article|
March 25 2005
Influence of ion implantation on the magnetic properties of thin films
Ratnesh Gupta;
II. Physikalisches Institut and SFB 602, Universität Göttingen
, Friedrich-Hund-Platz 1, D-37077 Göttingen, Germany
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K.-H. Han;
Superconductivity and Magnetism Division, Institute for Experimental Physics-II, University of Leipzig
, Linnéstrasse 5, D-04103, Leipzig, Germany
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K. P. Lieb;
II. Physikalisches Institut and SFB 602, Universität Göttingen
, Friedrich-Hund-Platz 1, D-37077 Göttingen, Germany
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G. A. Müller;
G. A. Müller
II. Physikalisches Institut and SFB 602, Universität Göttingen
, Friedrich-Hund-Platz 1, D-37077 Göttingen, Germany
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P. Schaaf;
P. Schaaf
II. Physikalisches Institut and SFB 602, Universität Göttingen
, Friedrich-Hund-Platz 1, D-37077 Göttingen, Germany
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K. Zhang
K. Zhang
II. Physikalisches Institut and SFB 602, Universität Göttingen
, Friedrich-Hund-Platz 1, D-37077 Göttingen, Germany
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J. Appl. Phys. 97, 073911 (2005)
Article history
Received:
October 25 2004
Accepted:
January 31 2005
Citation
Ratnesh Gupta, K.-H. Han, K. P. Lieb, G. A. Müller, P. Schaaf, K. Zhang; Influence of ion implantation on the magnetic properties of thin films. J. Appl. Phys. 1 April 2005; 97 (7): 073911. https://doi.org/10.1063/1.1875737
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