Lead selenide layers were obtained by thermal evaporation in vacuum on thermally oxidized silicon. As-deposited layers present no response to infrared radiation and an activation procedure is mandatory. The sensitization process described in this work consists of a thermal treatment developed in two different stages: The first step in an iodine and oxygen rich atmosphere at 220 °C, and the second one at a higher temperature (450 °C) on air. After this treatment, the developed photodetectors show high sensitivity to medium wavelength infrared radiation at room temperature. We have analyzed the structural, compositional, electrical, and morphological changes of the films occurred during the activation process. After processing many films, we conclude that iodine plays a key role in the PbSe sensitization. This halogen behaves as a transport agent during the PbSe recrystallization process, and promotes a fast growth of PbSe microcrystals. Oxygen is trapped into the PbSe lattice during the recrystallization process, as it happens in chemically deposited PbSe films. The introduction of halogens in the PbSe sensitization procedure is a highly efficient technique for the incorporation of oxygen to the semiconductor lattice in electrically active positions.

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