The commonly used value of the intrinsic carrier density of crystalline silicon at is It was experimentally determined by Sproul and Green, J. Appl. Phys. 70, 846 (1991), using specially designed solar cells. In this article, we demonstrate that the Sproul and Green experiment was influenced by band-gap narrowing, even though the dopant density of their samples was low to We reinterpret their measurements by numerical simulations with a random-phase approximation model for band-gap narrowing, thereby obtaining at This value is consistent with results obtained by Misiakos and Tsamakis, J. Appl. Phys. 74, 3293 (1993), using capacitance measurements. In this way, long-prevailing inconsistencies between independent measurement techniques for the determination of are resolved.
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1 February 2003
Research Article|
February 01 2003
Reassessment of the intrinsic carrier density in crystalline silicon in view of band-gap narrowing
Pietro P. Altermatt;
Pietro P. Altermatt
University of NSW, Centre for Photovoltaic Engineering, Sydney 2052, Australia
Inianga Consulting, 92/125 Oxford Street, Bondi Junction NSW 2022, Australia
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Andreas Schenk;
Andreas Schenk
Integrated Systems Laboratory, ETH Zurich, Gloriastr. 35, 8092 Zurich, Switzerland
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Frank Geelhaar;
Frank Geelhaar
Integrated Systems Laboratory, ETH Zurich, Gloriastr. 35, 8092 Zurich, Switzerland
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Gernot Heiser
Gernot Heiser
University of NSW, Centre for Photovoltaic Engineering, Sydney 2052, Australia
University of NSW, School of Computer Science & Engineering, Sydney 2052, Australia
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J. Appl. Phys. 93, 1598–1604 (2003)
Article history
Received:
February 27 2002
Accepted:
October 24 2002
Citation
Pietro P. Altermatt, Andreas Schenk, Frank Geelhaar, Gernot Heiser; Reassessment of the intrinsic carrier density in crystalline silicon in view of band-gap narrowing. J. Appl. Phys. 1 February 2003; 93 (3): 1598–1604. https://doi.org/10.1063/1.1529297
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