Sulfur incorporated nanocrystalline carbon thin films were grown on molybdenum substrates by a hot-filament chemical vapor deposition technique using gas mixtures of methane, hydrogen, and a range of hydrogen sulfide concentrations (100–500 ppm with an interval of 100 ppm) at a fixed substrate temperature of 900 °C. They were optically characterized using Raman spectroscopy (RS) and ex situ spectroscopic phase modulated ellipsometry from near-infrared to near UV (1.5–5.0 eV) obtaining their vibrational frequencies and pseudodielectric function, respectively, as a function of The ellipsometry data were modeled using Bruggeman effective-medium theory and dispersion relations for the amorphous semiconductors: Forouhi and Bloomer (FB) parameterization model. A simplified two-layer model consisting of a top layer comprising an aggregate mixture of and a bulk layer defined as a dense amorphized FB-modeled material, was found to simulate the data reasonably well. Through these simulations, it was possible to estimate the dielectric function of our material, along with the optical band gap film thickness (d), void fraction and roughness layer (σ) as a function of concentration. The physical interpretation of the five modeling parameters obtained in the amorphous dispersion model applied to the case of thin films is discussed. The Raman and ellipsometry results indicate that the average size of nanocrystallites in the sulfur-incorporated carbon thin films becomes smaller with increasing concentration, consistent with atomic force microscopy measurements where the distribution of grain size yielded a gamma around 20 nm. The band gap was found to decrease systematically with increasing concentration, indicating an enhancement of π-bonded carbon in agreement with RS results. These results are compared to those obtained for films grown without sulfur in order to study the influence of sulfur addition on film microstructure. These analyses led to a correlation between the film microstructure and its electronic properties.
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1 November 2002
Research Article|
November 01 2002
Ex situ spectroscopic ellipsometry and Raman spectroscopy investigations of chemical vapor deposited sulfur incorporated nanocrystalline carbon thin films Available to Purchase
S. Gupta;
S. Gupta
Department of Physics, University of Puerto Rico, P.O. Box 23343, San Juan, Puerto Rico 00931
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B. R. Weiner;
B. R. Weiner
Department of Chemistry, University of Puerto Rico, P.O. Box 23346, San Juan, Puerto Rico 00931
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G. Morell
G. Morell
Department of Physics and Physical Sciences, University of Puerto Rico, P.O. Box 23323, San Juan, Puerto Rico 00931
Search for other works by this author on:
S. Gupta
Department of Physics, University of Puerto Rico, P.O. Box 23343, San Juan, Puerto Rico 00931
B. R. Weiner
Department of Chemistry, University of Puerto Rico, P.O. Box 23346, San Juan, Puerto Rico 00931
G. Morell
Department of Physics and Physical Sciences, University of Puerto Rico, P.O. Box 23323, San Juan, Puerto Rico 00931
J. Appl. Phys. 92, 5457–5462 (2002)
Article history
Received:
March 11 2002
Accepted:
August 08 2002
Citation
S. Gupta, B. R. Weiner, G. Morell; Ex situ spectroscopic ellipsometry and Raman spectroscopy investigations of chemical vapor deposited sulfur incorporated nanocrystalline carbon thin films. J. Appl. Phys. 1 November 2002; 92 (9): 5457–5462. https://doi.org/10.1063/1.1511269
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