Nanomechanical resonators can be fabricated to achieve high natural resonance frequencies, approaching 1 GHz, with quality factors in excess of These resonators are candidates for use as highly selective rf filters and as precision on-chip clocks. Some fundamental and some nonfundamental noise processes will present limits to the performance of such resonators. These include thermomechanical noise, Nyquist–Johnson noise, and adsorption–desorption noise; other important noise sources include those due to thermal fluctuations and defect motion-induced noise. In this article, we develop a self-contained formalism for treating these noise sources, and use it to estimate the impact that these noise processes will have on the noise of a model nanoscale resonator, consisting of a doubly clamped beam of single-crystal Si with a natural resonance frequency of 1 GHz.
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1 September 2002
Research Article|
September 01 2002
Noise processes in nanomechanical resonators
A. N. Cleland;
A. N. Cleland
Department of Physics and iQUEST, University of California at Santa Barbara, Santa Barbara, California 93106
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M. L. Roukes
M. L. Roukes
Department of Physics, California Institute of Technology, Pasadena, California 91125
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J. Appl. Phys. 92, 2758–2769 (2002)
Article history
Received:
February 15 2002
Accepted:
June 18 2002
Citation
A. N. Cleland, M. L. Roukes; Noise processes in nanomechanical resonators. J. Appl. Phys. 1 September 2002; 92 (5): 2758–2769. https://doi.org/10.1063/1.1499745
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