Charge transfer and accumulation at semiconductor devices can lead to device degradation. Understanding and controlling such a process is therefore important. Second harmonic generation has been shown to be a sensitive probe of charging of semiconductor interfaces, with the added advantages of high spatial and temporal resolution. We have investigated the use of self assembled monolayers (SAMs) as a means to control charging. Our results suggest that octadecylsiloxane SAMs, bound to the native oxide, significantly reduce charge accumulation at oxide interfaces.

1.
J. G.
Mihaychuk
,
J.
Bloch
,
Y.
Liu
, and
H. M.
van Driel
,
Opt. Lett.
20
,
2063
(
1995
).
2.
J. I.
Dadap
,
X. F.
Hu
,
N. M.
Russell
,
J. G.
Ekerdt
,
J. K.
Lowell
, and
M. C.
Downer
,
IEEE J. Sel. Top. Quantum Electron.
1
,
1145
(
1995
).
3.
J.
Bloch
,
J. G.
Mihaychuk
, and
H. M.
van Driel
,
Phys. Rev. Lett.
77
,
920
(
1996
).
4.
J. G.
Mihaychuk
,
N.
Shamir
, and
H. M.
van Driel
,
Phys. Rev. B
59
,
2164
(
1999
).
5.
N.
Shamir
,
J. G.
Mihaychuk
,
H. M.
van Driel
, and
H. J.
Kreuzer
,
Phys. Rev. Lett.
82
,
359
(
1999
).
6.
W.
Wang
et al.,
Phys. Rev. Lett.
81
,
4224
(
1998
).
7.
N.
Shamir
,
J. G.
Mihaychuk
, and
H. M.
van Driel
,
J. Appl. Phys.
88
,
896
(
2000
).
8.
N.
Shamir
,
J. G.
Mihaychuk
, and
H. M.
van Driel
,
J. Appl. Phys.
88
,
909
(
2000
).
9.
A. Ulman, Introduction to Ultrathin Organic Films: From Langmuir-Blodgett to Self-Assembly (Academic, San Diego, CA, 1991).
10.
C.
Boulas
,
J. V.
Davidovits
,
F.
Rondelez
, and
D.
Vuillaume
,
Phys. Rev. Lett.
76
,
4797
(
1996
).
11.
D.
Vuillaume
,
C.
Boulas
,
J.
Collet
,
J. V.
Davidovits
, and
F.
Rondelez
,
Appl. Phys. Lett.
69
,
1646
(
1996
).
12.
G.
Lüpke
,
Surf. Sci. Rep.
35
,
75
(
1999
).
13.
E. D. Palik, Handbook of Optical Constants of Solids, Part I (Academic, San Diego, CA, 1998).
14.
A. Y.
Fadeev
and
T. J.
McCarthy
,
Langmuir
16
,
7268
(
2000
).
15.
T.
Ye
,
D.
Wynn
,
R.
Dudek
, and
E.
Borguet
,
Langmuir
17
,
4497
(
2001
).
16.
J.
Sagiv
,
J. Am. Chem. Soc.
102
,
92
(
1980
).
17.
D. L.
Allara
,
A. N.
Parikh
, and
F.
Rondelez
,
Langmuir
11
,
2357
(
1995
).
18.
J. B.
Brzoska
,
I.
Benazouz
, and
F.
Rondelez
,
Langmuir
10
,
4367
(
1994
).
19.
R. W. P.
Fairbank
and
M. J.
Wirth
,
J. Chromatogr., A
830
,
285
(
1999
).
20.
S. R.
Wasserman
,
Y. T.
Tao
, and
G. M.
Whitesides
,
Langmuir
5
,
1074
(
1989
).
21.
R.
Williams
,
Phys. Rev.
140
,
A569
(
1965
).
22.
P.
Lautenschlager
,
M.
Garriga
,
L.
Vina
, and
M.
Cardona
,
Phys. Rev. B
36
,
4821
(
1987
).
23.
V.
Fomenko
,
J. F.
Lami
, and
E.
Borguet
,
Phys. Rev. B
63
,
121316
(
2001
).
24.
The Si-SiO2 System edited by P. Balk (Elseiver, Amsterdam, 1988), Vol. 32.
25.
R. W.
Kempf
,
P. T.
Wilson
,
J. D.
Canterbury
,
E. D.
Mishina
,
O. A.
Aktsipetrov
, and
M. C.
Downer
,
Appl. Phys. B: Lasers Opt.
68
,
325
(
1999
).
26.
O. A.
Aktsipetrov
,
A. A.
Fedyanin
,
V. N.
Golovkina
, and
T. V.
Murzina
,
Opt. Lett.
19
,
1450
(
1994
).
27.
J. I.
Dadap
,
P. T.
Wilson
,
M. H.
Anderson
, and
M. C.
Downer
,
Opt. Lett.
22
,
901
(
1997
).
28.
D. H.
Flinn
,
D. A.
Guzonas
, and
R.-H.
Yoon
,
Colloids Surf., A
87
,
163
(
1994
).
29.
A. N.
Parikh
,
D. L.
Allara
,
I. B.
Azouz
, and
F.
Rondelez
,
J. Phys. Chem.
98
,
7577
(
1994
).
30.
D. L.
Angst
and
G. W.
Simmons
,
Langmuir
7
,
2236
(
1991
).
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