Photoluminescence (PL) and photoluminescence excitation (PLE) spectroscopies have been carried out at 6 K on the ∼1540 nm emissions of in Er-implanted and annealed GaN. These studies revealed the existence of multiple centers and associated PL spectra in Er-implanted GaN films grown by metalorganic chemical vapor deposition, hydride vapor phase epitaxy, and molecular beam epitaxy. The results demonstrate that the multiple centers and below-gap defect-related absorption bands by which they are selectively excited are universal features of Er-implanted GaN grown by different techniques. It is suggested that implantation-induced defects common to all the GaN samples are responsible for the Er site distortions that give rise to the distinctive, selectively excited spectra. The investigations of selectively excited and PLE spectra have also been extended to Er-implanted samples of Mg-doped GaN grown by various techniques. In each of these samples, the so-called violet-pumped band and its associated broad violet PLE band are significantly enhanced relative to the PL and PLE of the other selectively excited centers. More importantly, the violet-pumped spectrum dominates the above-gap excited spectrum of Er-implanted Mg-doped GaN, whereas it was unobservable under above-gap excitation in Er-implanted undoped GaN. These results confirm the hypothesis that appropriate codopants can increase the efficiency of trap-mediated above-gap excitation of emission in Er-implanted GaN.
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1 July 2001
Research Article|
July 01 2001
Effects of material growth technique and Mg doping on photoluminescence in Er-implanted GaN
S. Kim;
S. Kim
Department of Electrical Engineering, Korea University, Seoul 136-701, Korea
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R. L. Henry;
R. L. Henry
Naval Research Laboratory, Washington, DC 20375
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A. E. Wickenden;
A. E. Wickenden
Naval Research Laboratory, Washington, DC 20375
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D. D. Koleske;
D. D. Koleske
Naval Research Laboratory, Washington, DC 20375
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S. J. Rhee;
S. J. Rhee
Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana–Champaign, Urbana, Illinois 61801
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J. O. White;
J. O. White
Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana–Champaign, Urbana, Illinois 61801
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J. M. Myoung;
J. M. Myoung
Department of Electrical and Computer Engineering, University of Illinois at Urbana–Champaign, Urbana, Illinois 61801
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K. Kim;
K. Kim
Department of Electrical and Computer Engineering, University of Illinois at Urbana–Champaign, Urbana, Illinois 61801
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X. Li;
X. Li
Department of Electrical and Computer Engineering, University of Illinois at Urbana–Champaign, Urbana, Illinois 61801
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J. J. Coleman;
J. J. Coleman
Department of Electrical and Computer Engineering, University of Illinois at Urbana–Champaign, Urbana, Illinois 61801
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S. G. Bishop
S. G. Bishop
Department of Electrical and Computer Engineering, University of Illinois at Urbana–Champaign, Urbana, Illinois 61801
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J. Appl. Phys. 90, 252–259 (2001)
Article history
Received:
June 14 2000
Accepted:
April 13 2001
Citation
S. Kim, R. L. Henry, A. E. Wickenden, D. D. Koleske, S. J. Rhee, J. O. White, J. M. Myoung, K. Kim, X. Li, J. J. Coleman, S. G. Bishop; Effects of material growth technique and Mg doping on photoluminescence in Er-implanted GaN. J. Appl. Phys. 1 July 2001; 90 (1): 252–259. https://doi.org/10.1063/1.1378058
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