This article has two objectives. First, we determine the indices of refraction n of a series of molecular beam epitaxy-grown epilayers using a technique based on coupling of evanescent waves via a prism into a semiconductor film. Highly precise values of , and their dependence on the alloy composition , are obtained for photon energies below the band gap of the alloy material. And second, we use these results to demonstrate the usefulness of the prism coupler method as a very reliable, convenient, and accurate tool for simultaneous determination of composition of semiconductor alloys in thin film form (since n depends on composition), and the film thickness. This method determines the film thickness with typical uncertainty of less than 0.5%.
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1 November 1998
Research Article|
November 01 1998
A prism coupler technique for characterizing thin film II–VI semiconductor systems
F. C. Peiris;
F. C. Peiris
Department of Physics, University of Notre Dame, Notre Dame, Indiana 46556
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S. Lee;
S. Lee
Department of Physics, University of Notre Dame, Notre Dame, Indiana 46556
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U. Bindley;
U. Bindley
Department of Physics, University of Notre Dame, Notre Dame, Indiana 46556
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J. K. Furdyna
J. K. Furdyna
Department of Physics, University of Notre Dame, Notre Dame, Indiana 46556
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Journal of Applied Physics 84, 5194–5197 (1998)
Article history
Received:
May 20 1998
Accepted:
July 23 1998
Citation
F. C. Peiris, S. Lee, U. Bindley, J. K. Furdyna; A prism coupler technique for characterizing thin film II–VI semiconductor systems. Journal of Applied Physics 1 November 1998; 84 (9): 5194–5197. https://doi.org/10.1063/1.368770
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