Epitaxial (BTO) thin films were deposited on MgO(001) substrates using Pt layers as top and bottom electrodes. In spite of the apparently symmetric capacitor structure, polarization–voltage measurements revealed strong imprint failures and current–voltage measurements showed rectifying behaviors. Imprint pulse tests with a 5 V dc bias and post-annealing treatments suggested that the asymmetric behaviors should be due to interfacial states induced by thermal processes. To probe the interfacial states, capacitance–voltage measurements were performed. By fitting the data with a model which describes the Pt/BTO/Pt structure as a series circuit composed of three capacitors, built-in voltages at the top and the bottom interfaces could be determined. Difference in the built-in voltages could explain the imprint failures and the rectifying behaviors. The interfacial states in the BTO capacitors were controlled by varying electrode materials.
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15 October 1998
Research Article|
October 15 1998
Imprint failures and asymmetric electrical properties induced by thermal processes in epitaxial thin films Available to Purchase
B. H. Park;
B. H. Park
Department of Physics and Condensed Matter Research Institute, Seoul National University, Seoul 151-742, Korea
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S. J. Hyun;
S. J. Hyun
Department of Physics and Condensed Matter Research Institute, Seoul National University, Seoul 151-742, Korea
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C. R. Moon;
C. R. Moon
Department of Physics and Condensed Matter Research Institute, Seoul National University, Seoul 151-742, Korea
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Byung-Doo Choe;
Byung-Doo Choe
Department of Physics and Condensed Matter Research Institute, Seoul National University, Seoul 151-742, Korea
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J. Lee;
J. Lee
Department of Materials Engineering, Sung Kyun Kwan University, Suwon 440-746, Korea
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C. Y. Kim;
C. Y. Kim
LG Corporate Institute of Technology, 16 Woomyeon-dong, Seocho-gu, Seoul 137-140, Korea
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W. Jo;
W. Jo
LG Corporate Institute of Technology, 16 Woomyeon-dong, Seocho-gu, Seoul 137-140, Korea
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T. W. Noh
T. W. Noh
LG Corporate Institute of Technology, 16 Woomyeon-dong, Seocho-gu, Seoul 137-140, Korea
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B. H. Park
S. J. Hyun
C. R. Moon
Byung-Doo Choe
J. Lee
C. Y. Kim
W. Jo
T. W. Noh
Department of Physics and Condensed Matter Research Institute, Seoul National University, Seoul 151-742, Korea
J. Appl. Phys. 84, 4428–4435 (1998)
Article history
Received:
May 19 1998
Accepted:
July 14 1998
Citation
B. H. Park, S. J. Hyun, C. R. Moon, Byung-Doo Choe, J. Lee, C. Y. Kim, W. Jo, T. W. Noh; Imprint failures and asymmetric electrical properties induced by thermal processes in epitaxial thin films. J. Appl. Phys. 15 October 1998; 84 (8): 4428–4435. https://doi.org/10.1063/1.368666
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