The present article describes a novel application of capacitance–voltage measurements to determine simultaneously the band discontinuities and interface charge density of heterojunctions. The method, which we refer to as matching, complements the most versatile profiling technique proposed by Kroemer and successfully applied by others. In contrast to the profiling which is limited to isotype heterojunctions, the new method is applicable to heterojunctions as well. The methodology is based on three cardinal equations which are not controversial—the lineup of the bands relative to the common Fermi level (at equilibrium) or the quasi-Fermi levels (when voltage is applied), the charge neutrality and the expression for the total capacitance of the heterostructure. The three equations are formulated for equilibrium as well as nonequilibrium conditions, using quasi-Fermi levels and the quasi-equilibrium approximation. The three cardinal equations are defined by the two constant (albeit unknown) interface parameters which are assumed to be independent of the voltage and two variables , , which describe the total band bending on each side of the heterointerface and vary with the applied voltage. The actual interface parameters are determined by matching between the calculated and the measured curve. The metric for the optimal match between calculated and measured capacitance vectors is discussed. The methodology presented in this study is general and can be applied to semiconductor-semiconductor and semimetal-semiconductor heterojunctions. It is illustrated here for the HgTe-CdTe semimetal-semiconductor heterojunction, which cannot be evaluated by the profiling. The significance of the simultaneous determination of the band discontinuities and interface charges of heterojunctions is also discussed. In addition, the methodology presented in this article models the behavior of biased heterojunctions under nonequilibrium conditions, taking into consideration the values of band offset and interface charge density of an actual heterointerface.
Skip Nav Destination
,
,
Article navigation
15 July 1998
Research Article|
July 15 1998
Measurement of band offsets and interface charges by the matching method Available to Purchase
Y. Nemirovsky;
Y. Nemirovsky
Kidron Microelectronics Research Center, Faculty of Electrical Engineering, Technion-Israel Institute of Technology, Haifa 32000, Israel
Search for other works by this author on:
G. Gordon;
G. Gordon
Kidron Microelectronics Research Center, Faculty of Electrical Engineering, Technion-Israel Institute of Technology, Haifa 32000, Israel
Search for other works by this author on:
D. Goren
D. Goren
Kidron Microelectronics Research Center, Faculty of Electrical Engineering, Technion-Israel Institute of Technology, Haifa 32000, Israel
Search for other works by this author on:
Y. Nemirovsky
G. Gordon
D. Goren
Kidron Microelectronics Research Center, Faculty of Electrical Engineering, Technion-Israel Institute of Technology, Haifa 32000, Israel
J. Appl. Phys. 84, 1113–1120 (1998)
Article history
Received:
January 06 1998
Accepted:
April 04 1998
Citation
Y. Nemirovsky, G. Gordon, D. Goren; Measurement of band offsets and interface charges by the matching method. J. Appl. Phys. 15 July 1998; 84 (2): 1113–1120. https://doi.org/10.1063/1.368111
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
A step-by-step guide to perform x-ray photoelectron spectroscopy
Grzegorz Greczynski, Lars Hultman
Piezoelectric thin films and their applications in MEMS: A review
Jinpeng Liu, Hua Tan, et al.
Tutorial: Simulating modern magnetic material systems in mumax3
Jonas J. Joos, Pedram Bassirian, et al.
Related Content
Thermal stability of the anodic oxide/Hg1−xCdxTe interface
J. Vac. Sci. Technol. B (July 1987)
Molecular beam epitaxial growth of a novel strained layer type III superlattice system: HgTe‐ZnTe
Appl. Phys. Lett. (March 1986)